Inventor · disambiguated record
Shinya Yoshimoto
Also filed as: YOSHIMOTO SHINYA
4 granted patents·10 pending applications·5 citations·filing 2020–2025
65Inventor score
Files withASM IP HOLDING BV14
Top patents by PatentIndex Score
14 records- 0195US11476109B2Method of forming an electronic structure using reforming gas, system for performing the method, and structure formed using the methodASM IP HOLDING BV·Filed 2020·Granted Oct 18, 2022·4 cites·24 claims
- 0291US11908684B2Method of forming an electronic structure using reforming gas, system for performing the method, and structure formed using the methodASM IP HOLDING BV·Filed 2022·Granted Feb 20, 2024·1 cites·20 claims
- 0383US12272548B2Method of forming an electronic structure using reforming gas, system for performing the method, and structure formed using the methodASM IP HOLDING BV·Filed 2024·Granted Apr 8, 2025·0 cites·20 claims
- 0475US2025011927A1Methods and apparatuses for flowable gap-fillASM IP HOLDING BV·Filed 2024·Application pending·0 cites
- 0570US2025266256A1Methods for Depositing Gap-Filling Fluids and Related Systems and DevicesASM IP HOLDING BV·Filed 2025·Application pending·0 cites
- 0667US12129546B2Methods and apparatuses for flowable gap-fillASM IP HOLDING BV·Filed 2021·Granted Oct 29, 2024·0 cites·20 claims
- 0760US2025391655A1Method of filling gap and processing system for sameASM IP HOLDING BV·Filed 2025·Application pending·0 cites
- 0859US2022122841A1Methods for depositing gap-filling fluids and related systems and devicesASM IP HOLDING BV·Filed 2021·Application pending·0 cites
- 0957US2025125142A1Substrate processing method for filling one or more gaps on a surface of a substrateASM IP HOLDING BV·Filed 2024·Application pending·0 cites
- 1056US2023399745A1Methods and apparatuses for flowable gap fillASM IP HOLDING BV·Filed 2023·Application pending·0 cites
- 1156US2025054753A1Substrate processing methodASM IP HOLDING BV·Filed 2024·Application pending·0 cites
- 1255US2023335392A1Deposition of flowable sicn films by plasma enhanced atomic layer depositionASM IP HOLDING BV·Filed 2023·Application pending·0 cites
- 1349US2024060174A1Method of forming material within a recessASM IP HOLDING BV·Filed 2023·Application pending·0 cites
- 1448US2023298885A1Methods for depositing gap-filling fluids and related systems and devicesASM IP HOLDING BV·Filed 2023·Application pending·0 cites
Join the waitlist — get patent alerts
Get an alert when Shinya Yoshimoto files or is granted a new patent.
We store only your email — no account needed. See our privacy policy.
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →