Inventor · disambiguated record
Shi You
Also filed as: YOU SHI
6 granted patents·7 pending applications·3 citations·filing 2019–2024
69Inventor score
Files withAPPLIED MATERIALS INC13
Top patents by PatentIndex Score
13 records- 0180US11164780B2Process integration approach for selective metal via fillAPPLIED MATERIALS INC·Filed 2019·Granted Nov 2, 2021·3 cites·15 claims
- 0277US12046508B2Method of dielectric material fill and treatmentAPPLIED MATERIALS INC·Filed 2023·Granted Jul 23, 2024·0 cites·20 claims
- 0372US2024213088A1Subtractive metals and subtractive metal semiconductor structuresAPPLIED MATERIALS INC·Filed 2024·Application pending·0 cites
- 0467US11615984B2Method of dielectric material fill and treatmentAPPLIED MATERIALS INC·Filed 2020·Granted Mar 28, 2023·0 cites·20 claims
- 0566US11923244B2Subtractive metals and subtractive metal semiconductor structuresAPPLIED MATERIALS INC·Filed 2021·Granted Mar 5, 2024·0 cites·20 claims
- 0659US11515200B2Selective tungsten deposition within trench structuresAPPLIED MATERIALS INC·Filed 2020·Granted Nov 29, 2022·0 cites·20 claims
- 0759US2025294832A1Contact formation for back side power distributionAPPLIED MATERIALS INC·Filed 2024·Application pending·0 cites
- 0857US2024363354A1Low-temperature selective epitaxy contact approachAPPLIED MATERIALS INC·Filed 2024·Application pending·0 cites
- 0956US2024234209A1Contact resistance reduction by integration of molybdenum with titaniumAPPLIED MATERIALS INC·Filed 2023·Application pending·0 cites
- 1052US11094588B2Interconnection structure of selective deposition processAPPLIED MATERIALS INC·Filed 2019·Granted Aug 17, 2021·0 cites·20 claims
- 1151US2024038541A1Methods for removing molybdenum oxides from substratesAPPLIED MATERIALS INC·Filed 2022·Application pending·0 cites
- 1250US2023187204A1Tungsten Fluoride Soak And Treatment For Tungsten Oxide RemovalAPPLIED MATERIALS INC·Filed 2022·Application pending·0 cites
- 1345US2021066064A1Methods and apparatus for cleaning metal contactsAPPLIED MATERIALS INC·Filed 2020·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →