Inventor · disambiguated record
Si-Han Zeng
Also filed as: ZENG SI-HAN · Zeng si
7 granted patents·2 pending applications·8 citations·filing 2016–2023
75Inventor score
Files withASML NETHERLANDS BV6BEIJING INSTITUTE OF PREC MECHATRONICS AND CONTROLS1DONGGUAN POWERAMP TECH LIMITED1HUAWEI TECH CO LTD1
Top patents by PatentIndex Score
9 records- 0184US9869940B2Metrology method and apparatus, computer program and lithographic systemASML NETHERLANDS BV·Filed 2016·Granted Jan 16, 2018·3 cites·18 claims
- 0283US11796978B2Method for determining root causes of events of a semiconductor manufacturing process and for monitoring a semiconductor manufacturing processASML NETHERLANDS BV·Filed 2019·Granted Oct 24, 2023·3 cites·20 claims
- 0375US11949273B2Method for managing charging and discharging of parallel-connected battery pack, electronic device, and electrical systemDONGGUAN POWERAMP TECH LIMITED·Filed 2021·Granted Apr 2, 2024·1 cites·14 claims
- 0474US10261427B2Metrology method and apparatus, computer program and lithographic systemASML NETHERLANDS BV·Filed 2018·Granted Apr 16, 2019·1 cites·8 claims
- 0559US11774869B2Method and system for determining overlayASML NETHERLANDS BV·Filed 2020·Granted Oct 3, 2023·0 cites·14 claims
- 0659US2025237965A1Setup and control methods for a lithographic process and associated apparatusesASML NETHERLANDS BV·Filed 2023·Application pending·0 cites
- 0749US2025196336A1Fusion system of mechanical arm and dexterous hand, and motion control methodBEIJING INSTITUTE OF PREC MECHATRONICS AND CONTROLS·Filed 2022·Application pending·0 cites
- 0846US10474043B2Method of measuring a property of a substrate, inspection apparatus, lithographic system and device manufacturing methodASML NETHERLANDS BV·Filed 2017·Granted Nov 12, 2019·0 cites·17 claims
- 0945US12443733B2Safety isolation method and apparatus, and computer systemHUAWEI TECH CO LTD·Filed 2022·Granted Oct 14, 2025·0 cites·11 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →