Inventor · disambiguated record
Soichi Inoue
Also filed as: INOUE SOICHI
120 granted patents·11 pending applications·3,361 citations·filing 1982–2024
99Inventor score
Top patents by PatentIndex Score
131 records- 0199US7120882B2Method of setting process parameter and method of setting process parameter and/or design ruleTOSHIBA KK·Filed 2005·Granted Oct 10, 2006·225 cites·11 claims
- 0297US6077310AOptical proximity correction systemTOSHIBA KK·Filed 1999·Granted Jun 20, 2000·534 cites·27 claims
- 0397US5879844AOptical proximity correction methodTOSHIBA KK·Filed 1996·Granted Mar 9, 1999·262 cites·11 claims
- 0496US7230680B2Wafer flatness evaluation method, wafer flatness evaluation apparatus carrying out the evaluation method, wafer manufacturing method using the evaluation method, wafer quality assurance method using the evaluation method, semiconductor device manufacturing method using the evaluation method and semiconductor device manufacturing method using a wafer evaluated by the evaluation methodNIKON CORP·Filed 2003·Granted Jun 12, 2007·109 cites·20 claims
- 0596US5429730AMethod of repairing defect of structureTOSHIBA KK·Filed 1993·Granted Jul 4, 1995·114 cites·54 claims
- 0695US6376139B1Control method for exposure apparatus and control method for semiconductor manufacturing apparatusTOSHIBA KK·Filed 2000·Granted Apr 23, 2002·70 cites·4 claims
- 0795US5673103AExposure apparatus and methodTOSHIBA KK·Filed 1996·Granted Sep 30, 1997·199 cites·27 claims
- 0894US7526748B2Design pattern data preparing method, mask pattern data preparing method, mask manufacturing method, semiconductor device manufacturing method, and program recording mediumTOSHIBA KK·Filed 2005·Granted Apr 28, 2009·19 cites·19 claims
- 0994US7482661B2Pattern forming method and semiconductor device manufactured by using said pattern forming methodTOSHIBA KK·Filed 2005·Granted Jan 27, 2009·16 cites·20 claims
- 1094US6440616B1Mask and method for focus monitoringTOSHIBA KK·Filed 2000·Granted Aug 27, 2002·63 cites·26 claims
- 1194US5627626AProjectin exposure apparatusTOSHIBA KK·Filed 1995·Granted May 6, 1997·102 cites·12 claims
- 1294US5621498AProjection exposure apparatusTOSHIBA KK·Filed 1995·Granted Apr 15, 1997·101 cites·5 claims
- 1393US5707501AFilter manufacturing apparatusTOSHIBA KK·Filed 1995·Granted Jan 13, 1998·81 cites·5 claims
- 1492US9922991B2Semiconductor memory device and method for manufacturing sameTOSHIBA MEMORY CORP·Filed 2016·Granted Mar 20, 2018·8 cites·13 claims
- 1592US7396621B2Exposure control method and method of manufacturing a semiconductor deviceTOSHIBA KK·Filed 2007·Granted Jul 8, 2008·13 cites·5 claims
- 1692US6567972B1Method and apparatus for correcting mask pattern, mask having corrected mask pattern, and storage medium storing program for executing the method for correcting mask patternTOSHIBA KK·Filed 2000·Granted May 20, 2003·47 cites·20 claims
- 1791US7474386B2Wafer flatness evaluation method, wafer flatness evaluation apparatus carrying out the evaluation method, wafer manufacturing method using the evaluation method, wafer quality assurance method using the evaluation method, semiconductor device manufacturing method using the evaluation method and semiconductor device manufacturing method using a wafer evaluated by the evaluation methodTOSHIBA KK·Filed 2007·Granted Jan 6, 2009·14 cites·12 claims
- 1891US7194704B2Design layout preparing methodTOSHIBA KK·Filed 2004·Granted Mar 20, 2007·61 cites·16 claims
- 1991US6226074B1Exposure monitor mask, exposure adjusting method and method of manufacturing semiconductor devicesTOSHIBA KK·Filed 2000·Granted May 1, 2001·41 cites·15 claims
- 2088US7506301B2Method for correcting a mask pattern, system for correcting a mask pattern, program, method for manufacturing a photomask and method for manufacturing a semiconductor deviceTOSHIBA KK·Filed 2005·Granted Mar 17, 2009·8 cites·12 claims
- 2188US6701512B2Focus monitoring method, exposure apparatus, and exposure maskTOSHIBA KK·Filed 2002·Granted Mar 2, 2004·43 cites·43 claims
- 2288US5639699AFocused ion beam deposition using TMCTSTOSHIBA KK·Filed 1995·Granted Jun 17, 1997·62 cites·11 claims
- 2387US7353145B2Method for correcting a mask pattern, a computer program product, a method for producing a photomask, and method for manufacturing a semiconductor deviceTOSHIBA KK·Filed 2002·Granted Apr 1, 2008·38 cites·20 claims
- 2486US7248349B2Exposure method for correcting a focal point, and a method for manufacturing a semiconductor deviceTOSHIBA KK·Filed 2005·Granted Jul 24, 2007·10 cites·15 claims
- 2586US7181707B2Method of setting process parameter and method of setting process parameter and/or design ruleTOSHIBA KK·Filed 2003·Granted Feb 20, 2007·28 cites·12 claims
- 2685USRE43659EMethod for making a design layout of a semiconductor integrated circuitKOTANI TOSHIYA·Filed 2010·Granted Sep 11, 2012·6 cites·13 claims
- 2785US6316163B1Pattern forming methodTOSHIBA KK·Filed 1998·Granted Nov 13, 2001·57 cites·29 claims
- 2885US5422205AMicropattern forming methodTOSHIBA KK·Filed 1994·Granted Jun 6, 1995·91 cites·17 claims
- 2984US8046722B2Method for correcting a mask pattern, system for correcting a mask pattern, program, method for manufacturing a photomask and method for manufacturing a semiconductor deviceTOSHIBA KK·Filed 2009·Granted Oct 25, 2011·5 cites·14 claims
- 3084US7788626B2Pattern data correction method, pattern checking method, pattern check program, photo mask producing method, and semiconductor device manufacturing methodTOSHIBA KK·Filed 2005·Granted Aug 31, 2010·7 cites·7 claims
- 3184US6536032B1Method of processing exposure mask-pattern data, simulation using this method, and recording mediumTOSHIBA KK·Filed 2000·Granted Mar 18, 2003·23 cites·15 claims
- 3283US6853743B2Mask pattern correction method, mask pattern creation system using the correction method, and computer-readable recording mediumTOSHIBA KK·Filed 2000·Granted Feb 8, 2005·23 cites·1 claims
- 3382US7934175B2Parameter adjustment method, semiconductor device manufacturing method, and recording mediumTOSHIBA KK·Filed 2008·Granted Apr 26, 2011·8 cites·20 claims
- 3482US6990225B2Inspection method of photo mask for use in manufacturing semiconductor deviceTOSHIBA KK·Filed 2002·Granted Jan 24, 2006·20 cites·10 claims
- 3582US6317198B1Method of examining an exposure toolTOSHIBA KK·Filed 1999·Granted Nov 13, 2001·48 cites·17 claims
- 3680US6507931B2Semiconductor integrated circuit designing method and systemTOSHIBA KK·Filed 2001·Granted Jan 14, 2003·20 cites·7 claims
- 3778US7365830B2Wafer flatness evaluation method, wafer flatness evaluation apparatus carrying out the evaluation method, wafer manufacturing method using the evaluation method, wafer quality assurance method using the evaluation method, semiconductor device manufacturing method using the evaluation method and semiconductor device manufacturing method using a wafer evaluated by the evaluation methodTOSHIBA KK·Filed 2007·Granted Apr 29, 2008·4 cites·6 claims
- 3878US6901577B2Pattern forming method and semiconductor device manufactured by using said pattern forming methodTOSHIBA KK·Filed 2002·Granted May 31, 2005·13 cites·44 claims
- 3977USRE42302EMethod for making a design layout and maskTOSHIBA KK·Filed 2007·Granted Apr 19, 2011·5 cites·12 claims
- 4077US6610448B2Alignment method, overlay deviation inspection method and photomaskTOSHIBA KK·Filed 2001·Granted Aug 26, 2003·25 cites·15 claims
- 4177US6340542B1Method of manufacturing a semiconductor device, method of manufacturing a photomask, and a master maskTOSHIBA KK·Filed 1999·Granted Jan 22, 2002·36 cites·15 claims
- 4276US7596776B2Light intensity distribution simulation method and computer program productTOSHIBA KK·Filed 2007·Granted Sep 29, 2009·7 cites·18 claims
- 4375US7473495B2Method of creating predictive model, method of managing process steps, method of manufacturing semiconductor device, method of manufacturing photo mask, and computer program productTOSHIBA KK·Filed 2004·Granted Jan 6, 2009·13 cites·24 claims
- 4475US7208423B2Semiconductor device fabrication method and semiconductor deviceTOSHIBA KK·Filed 2002·Granted Apr 24, 2007·13 cites·8 claims
- 4574US7794897B2Mask pattern correcting method, mask pattern inspecting method, photo mask manufacturing method, and semiconductor device manufacturing methodTOSHIBA KK·Filed 2005·Granted Sep 14, 2010·3 cites·14 claims
- 4674US7108945B2Photomask having a focus monitor patternTOSHIBA KK·Filed 2003·Granted Sep 19, 2006·16 cites·25 claims
- 4773US5514499APhase shifting mask comprising a multilayer structure and method of forming a pattern using the sameTOSHIBA KK·Filed 1994·Granted May 7, 1996·43 cites·13 claims
- 4872US10811252B2Pattern-forming methodTOSHIBA MEMORY CORP·Filed 2018·Granted Oct 20, 2020·1 cites·20 claims
- 4972US6423977B1Pattern size evaluation apparatusTOSHIBA KK·Filed 1998·Granted Jul 23, 2002·37 cites·13 claims
- 5072US6221539B1Mask pattern correction method and a recording medium which records a mask pattern correction programTOSHIBA KK·Filed 1999·Granted Apr 24, 2001·30 cites·14 claims
Showing the top 50 of 131 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →