Inventor · disambiguated record
Soonwook Jung
Also filed as: JUNG SOONWOOK
14 granted patents·3 pending applications·34 citations·filing 2014–2023
87Inventor score
Top patents by PatentIndex Score
17 records- 0194US10504754B2Systems and methods for improved semiconductor etching and component protectionAPPLIED MATERIALS INC·Filed 2016·Granted Dec 10, 2019·16 cites·13 claims
- 0283US11587765B2Plasma ignition optimization in semiconductor processing chambersAPPLIED MATERIALS INC·Filed 2020·Granted Feb 21, 2023·1 cites·19 claims
- 0382US10593560B2Magnetic induction plasma source for semiconductor processes and equipmentAPPLIED MATERIALS INC·Filed 2018·Granted Mar 17, 2020·3 cites·20 claims
- 0481US10541184B2Optical emission spectroscopic techniques for monitoring etchingAPPLIED MATERIALS INC·Filed 2017·Granted Jan 21, 2020·3 cites·18 claims
- 0579US9293336B2Semiconductor device and method of fabricating the sameSAMSUNG ELECTRONICS CO LTD·Filed 2014·Granted Mar 22, 2016·7 cites·18 claims
- 0678US9874524B2In-situ spatially resolved plasma monitoring by using optical emission spectroscopyAPPLIED MATERIALS INC·Filed 2016·Granted Jan 23, 2018·2 cites·19 claims
- 0774US10522371B2Systems and methods for improved semiconductor etching and component protectionAPPLIED MATERIALS INC·Filed 2016·Granted Dec 31, 2019·2 cites·19 claims
- 0872US11894217B2Plasma ignition optimization in semiconductor processing chambersAPPLIED MATERIALS INC·Filed 2023·Granted Feb 6, 2024·0 cites·20 claims
- 0958US12476094B2Model-based characterization of plasmas in semiconductor processing systemsAPPLIED MATERIALS INC·Filed 2021·Granted Nov 18, 2025·0 cites·17 claims
- 1057US12310055B2Semiconductor device and method of fabricating the sameSAMSUNG ELECTRONICS CO LTD·Filed 2022·Granted May 20, 2025·0 cites·20 claims
- 1157US11735441B2Systems and methods for improved semiconductor etching and component protectionAPPLIED MATERIALS INC·Filed 2019·Granted Aug 22, 2023·0 cites·20 claims
- 1249US2023059169A1Semiconductor device including a field effect transistor and method for manufacturing the sameSAMSUNG ELECTRONICS CO LTD·Filed 2022·Application pending·0 cites
- 1348US2021005435A1Methods, apparatus, and systems for processing a substrateAPPLIED MATERIALS INC·Filed 2019·Application pending·0 cites
- 1440US12340979B2Semiconductor processing chamber for improved precursor flowAPPLIED MATERIALS INC·Filed 2018·Granted Jun 24, 2025·0 cites·20 claims
- 1539US10607832B2Method and apparatus for forming a thin layerSAMSUNG ELECTRONICS CO LTD·Filed 2018·Granted Mar 31, 2020·0 cites·18 claims
- 1638US9922840B2Adjustable remote dissociationAPPLIED MATERIALS INC·Filed 2015·Granted Mar 20, 2018·0 cites·11 claims
- 1737US2018366300A1Plasma power tool matching using dc voltage feedbackAPPLIED MATERIALS INC·Filed 2017·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →