Inventor · disambiguated record
Soichiro Okada
Also filed as: OKADA SOICHIRO
5 granted patents·6 pending applications·5 citations·filing 2013–2025
64Inventor score
Technology areasH10P
Top patents by PatentIndex Score
11 records- 0178US9165797B2Liquid processing apparatus, liquid processing method, and storage mediumTOKYO ELECTON LTD·Filed 2013·Granted Oct 20, 2015·5 cites·8 claims
- 0262US2025349519A1Substrate processing method and substrate processing systemTOKYO ELECTRON LTD·Filed 2025·Application pending·0 cites
- 0356US2024347354A1Heat-treating method, heat-treating apparatus, and storage mediumTOKYO ELECTRON LTD·Filed 2024·Application pending·0 cites
- 0454US2024248413A1Substrate treatment method and substrate treatment apparatusTOKYO ELECTRON LTD·Filed 2024·Application pending·0 cites
- 0553US2024120217A1Substrate treatment method, substrate treatment apparatus, and computer storage mediumTOKYO ELECTRON LTD·Filed 2023·Application pending·0 cites
- 0651US11205571B2Mask forming methodTOKYO ELECTRON LTD·Filed 2019·Granted Dec 21, 2021·0 cites·7 claims
- 0747US2024288775A1Substrate processing method, substrate processing apparatus and substrate processing systemTOKYO ELECTRON LTD·Filed 2022·Application pending·0 cites
- 0847US2024295821A1Substrate processing method and substrate processing apparatusTOKYO ELECTRON LTD·Filed 2022·Application pending·0 cites
- 0945US12197129B2Substrate treatment method and substrate treatment systemTOKYO ELECTRON LTD·Filed 2019·Granted Jan 14, 2025·0 cites·13 claims
- 1043US9748101B2Substrate treatment method, computer storage medium, and substrate treatment systemTOKYO ELECTRON LTD·Filed 2013·Granted Aug 29, 2017·0 cites·22 claims
- 1132US9911621B2Method for processing target objectTOKYO ELECTRON LTD·Filed 2015·Granted Mar 6, 2018·0 cites·6 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →