Inventor · disambiguated record
Soonam Park
Also filed as: PARK SOONAM
78 granted patents·22 pending applications·3,729 citations·filing 2006–2024
99Inventor score
Top patents by PatentIndex Score
100 records- 0198US10354843B2Chemical control features in wafer process equipmentAPPLIED MATERIALS INC·Filed 2017·Granted Jul 16, 2019·40 cites·20 claims
- 0298US10032606B2Semiconductor processing with DC assisted RF power for improved controlAPPLIED MATERIALS INC·Filed 2016·Granted Jul 24, 2018·94 cites·13 claims
- 0398US9978564B2Chemical control features in wafer process equipmentAPPLIED MATERIALS INC·Filed 2015·Granted May 22, 2018·106 cites·13 claims
- 0498US9947549B1Cobalt-containing material removalAPPLIED MATERIALS INC·Filed 2016·Granted Apr 17, 2018·103 cites·20 claims
- 0598US9892888B2Particle generation suppresor by DC bias modulationAPPLIED MATERIALS INC·Filed 2017·Granted Feb 13, 2018·26 cites·12 claims
- 0698US9837249B2Radial waveguide systems and methods for post-match control of microwavesAPPLIED MATERIALS INC·Filed 2016·Granted Dec 5, 2017·111 cites·20 claims
- 0798US9773648B2Dual discharge modes operation for remote plasmaAPPLIED MATERIALS INC·Filed 2014·Granted Sep 26, 2017·114 cites·20 claims
- 0898US9728437B2High temperature chuck for plasma processing systemsAPPLIED MATERIALS INC·Filed 2015·Granted Aug 8, 2017·123 cites·14 claims
- 0998US9711366B2Selective etch for metal-containing materialsAPPLIED MATERIALS INC·Filed 2016·Granted Jul 18, 2017·115 cites·13 claims
- 1098US9593421B2Particle generation suppressor by DC bias modulationAPPLIED MATERIALS INC·Filed 2014·Granted Mar 14, 2017·63 cites·10 claims
- 1198US9564296B2Radial waveguide systems and methods for post-match control of microwavesAPPLIED MATERIALS INC·Filed 2016·Granted Feb 7, 2017·129 cites·20 claims
- 1298US9472417B2Plasma-free metal etchAPPLIED MATERIALS INC·Filed 2014·Granted Oct 18, 2016·138 cites·9 claims
- 1398US9384997B2Dry-etch selectivityAPPLIED MATERIALS INC·Filed 2015·Granted Jul 5, 2016·146 cites·20 claims
- 1498US9373517B2Semiconductor processing with DC assisted RF power for improved controlAPPLIED MATERIALS INC·Filed 2013·Granted Jun 21, 2016·137 cites·20 claims
- 1598US9355922B2Systems and methods for internal surface conditioning in plasma processing equipmentAPPLIED MATERIALS INC·Filed 2014·Granted May 31, 2016·150 cites·17 claims
- 1698US9299537B2Radial waveguide systems and methods for post-match control of microwavesAPPLIED MATERIALS INC·Filed 2014·Granted Mar 29, 2016·160 cites·15 claims
- 1798US9299582B2Selective etch for metal-containing materialsAPPLIED MATERIALS INC·Filed 2014·Granted Mar 29, 2016·154 cites·8 claims
- 1898US9299538B2Radial waveguide systems and methods for post-match control of microwavesAPPLIED MATERIALS INC·Filed 2014·Granted Mar 29, 2016·154 cites·15 claims
- 1998US9132436B2Chemical control features in wafer process equipmentAPPLIED MATERIALS INC·Filed 2013·Granted Sep 15, 2015·198 cites·19 claims
- 2098US9117855B2Polarity control for remote plasmaAPPLIED MATERIALS INC·Filed 2014·Granted Aug 25, 2015·184 cites·15 claims
- 2198US8969212B2Dry-etch selectivityAPPLIED MATERIALS INC·Filed 2013·Granted Mar 3, 2015·184 cites·20 claims
- 2297US10504697B2Particle generation suppresor by DC bias modulationAPPLIED MATERIALS INC·Filed 2017·Granted Dec 10, 2019·8 cites·13 claims
- 2397US9966240B2Systems and methods for internal surface conditioning assessment in plasma processing equipmentAPPLIED MATERIALS INC·Filed 2014·Granted May 8, 2018·101 cites·12 claims
- 2497US9659753B2Grooved insulator to reduce leakage currentAPPLIED MATERIALS INC·Filed 2014·Granted May 23, 2017·123 cites·12 claims
- 2597US7989365B2Remote plasma source seasoningAPPLIED MATERIALS INC·Filed 2009·Granted Aug 2, 2011·621 cites·23 claims
- 2696US11728139B2Process chamber for cyclic and selective material removal and etchingAPPLIED MATERIALS INC·Filed 2021·Granted Aug 15, 2023·3 cites·18 claims
- 2796US8894767B2Flow control features of CVD chambersCHUC KIEN N·Filed 2010·Granted Nov 25, 2014·107 cites·16 claims
- 2895US11834744B2Ceramic showerheads with conductive electrodesAPPLIED MATERIALS INC·Filed 2023·Granted Dec 5, 2023·2 cites·20 claims
- 2994US10504754B2Systems and methods for improved semiconductor etching and component protectionAPPLIED MATERIALS INC·Filed 2016·Granted Dec 10, 2019·16 cites·13 claims
- 3094US10319649B2Optical emission spectroscopy (OES) for remote plasma monitoringAPPLIED MATERIALS INC·Filed 2017·Granted Jun 11, 2019·8 cites·18 claims
- 3193US11594428B2Low temperature chuck for plasma processing systemsAPPLIED MATERIALS INC·Filed 2017·Granted Feb 28, 2023·9 cites·16 claims
- 3293US11562890B2Corrosion resistant ground shield of processing chamberAPPLIED MATERIALS INC·Filed 2018·Granted Jan 24, 2023·4 cites·20 claims
- 3393US11195696B2Electron beam generator, plasma processing apparatus having the same and plasma processing method using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2020·Granted Dec 7, 2021·4 cites·17 claims
- 3493US9460898B2Plasma generation chamber with smooth plasma resistant coatingAPPLIED MATERIALS INC·Filed 2015·Granted Oct 4, 2016·10 cites·20 claims
- 3593US7799704B2Gas baffle and distributor for semiconductor processing chamberAPPLIED MATERIALS INC·Filed 2008·Granted Sep 21, 2010·15 cites·10 claims
- 3691US10153133B2Plasma reactor having digital control over rotation frequency of a microwave field with direct up-conversionAPPLIED MATERIALS INC·Filed 2015·Granted Dec 11, 2018·6 cites·20 claims
- 3791US7740706B2Gas baffle and distributor for semiconductor processing chamberAPPLIED MATERIALS INC·Filed 2006·Granted Jun 22, 2010·19 cites·19 claims
- 3890US11972930B2Cylindrical cavity with impedance shifting by irises in a power-supplying waveguideAPPLIED MATERIALS INC·Filed 2021·Granted Apr 30, 2024·1 cites·20 claims
- 3989US11915950B2Multi-zone semiconductor substrate supportsAPPLIED MATERIALS INC·Filed 2022·Granted Feb 27, 2024·1 cites·20 claims
- 4089US11538697B2Substrate processing apparatusSAMSUNG ELECTRONICS CO LTD·Filed 2020·Granted Dec 27, 2022·2 cites·20 claims
- 4189US11049755B2Semiconductor substrate supports with embedded RF shieldAPPLIED MATERIALS INC·Filed 2018·Granted Jun 29, 2021·8 cites·17 claims
- 4287US12288675B2Cylindrical cavity with impedance shifting by irises in a power-supplying waveguideAPPLIED MATERIALS INC·Filed 2024·Granted Apr 29, 2025·0 cites·13 claims
- 4387US10340124B2Generalized cylindrical cavity system for microwave rotation and impedance shifting by irises in a power-supplying waveguideAPPLIED MATERIALS INC·Filed 2016·Granted Jul 2, 2019·3 cites·19 claims
- 4486US11195699B2Generalized cylindrical cavity system for microwave rotation and impedance shifting by irises in a power-supplying waveguideAPPLIED MATERIALS INC·Filed 2019·Granted Dec 7, 2021·2 cites·18 claims
- 4586US10550472B2Flow control features of CVD chambersAPPLIED MATERIALS INC·Filed 2014·Granted Feb 4, 2020·2 cites·4 claims
- 4683US11276559B2Semiconductor processing chamber for multiple precursor flowAPPLIED MATERIALS INC·Filed 2017·Granted Mar 15, 2022·3 cites·18 claims
- 4782US10593560B2Magnetic induction plasma source for semiconductor processes and equipmentAPPLIED MATERIALS INC·Filed 2018·Granted Mar 17, 2020·3 cites·20 claims
- 4882US10504700B2Plasma etching systems and methods with secondary plasma injectionAPPLIED MATERIALS INC·Filed 2015·Granted Dec 10, 2019·3 cites·20 claims
- 4981US10541184B2Optical emission spectroscopic techniques for monitoring etchingAPPLIED MATERIALS INC·Filed 2017·Granted Jan 21, 2020·3 cites·18 claims
- 5078US11004661B2Process chamber for cyclic and selective material removal and etchingAPPLIED MATERIALS INC·Filed 2016·Granted May 11, 2021·2 cites·23 claims
Showing the top 50 of 100 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →