Inventor · disambiguated record
Sonja Schneider
Also filed as: SCHNEIDER SONJA
23 granted patents·3 pending applications·46 citations·filing 2010–2024
93Inventor score
Top patents by PatentIndex Score
26 records- 0193US9939730B2Optical assemblyZEISS CARL SMT GMBH·Filed 2015·Granted Apr 10, 2018·7 cites·31 claims
- 0290US10401540B2Optical element having a coating for influencing heating radiation and optical arrangementZEISS CARL SMT GMBH·Filed 2017·Granted Sep 3, 2019·3 cites·21 claims
- 0390US10048592B2Projection lens, projection exposure apparatus and projection exposure method for EUV microlithographyZEISS CARL SMT GMBH·Filed 2017·Granted Aug 14, 2018·4 cites·22 claims
- 0489US11112543B2Optical element having a coating for influencing heating radiation and optical arrangementZEISS CARL SMT GMBH·Filed 2019·Granted Sep 7, 2021·2 cites·20 claims
- 0586US10061206B2Projection lens with wave front manipulator and related method and apparatusZEISS CARL SMT GMBH·Filed 2017·Granted Aug 28, 2018·3 cites·18 claims
- 0685US9910364B2Projection exposure apparatus including at least one mirrorZEISS CARL SMT GMBH·Filed 2016·Granted Mar 6, 2018·3 cites·15 claims
- 0782US11489590B1Optical link and coherent receiver noise characterizationCISCO TECH INC·Filed 2021·Granted Nov 1, 2022·2 cites·20 claims
- 0879US10001631B2Projection lens for EUV microlithography, film element and method for producing a projection lens comprising a film elementZEISS CARL SMT GMBH·Filed 2014·Granted Jun 19, 2018·6 cites·40 claims
- 0979US9134613B2Illumination and displacement device for a projection exposure apparatusZEISS CARL SMT GMBH·Filed 2014·Granted Sep 15, 2015·3 cites·25 claims
- 1078US8228483B2Projection objective for microlithography, projection exposure apparatus, projection exposure method and optical correction plateLOERING ULRICH·Filed 2010·Granted Jul 24, 2012·6 cites·20 claims
- 1176US11415894B2Projection exposure system for semiconductor lithography having an optical arrangementZEISS CARL SMT GMBH·Filed 2021·Granted Aug 16, 2022·1 cites·20 claims
- 1274US10018907B2Method of operating a microlithographic projection apparatusZEISS CARL SMT GMBH·Filed 2016·Granted Jul 10, 2018·2 cites·18 claims
- 1373US9817316B2Projection exposure method and projection exposure apparatus for microlithographyZEISS CARL SMT GMBH·Filed 2016·Granted Nov 14, 2017·1 cites·34 claims
- 1472US12025818B2Optical element having a coating for influencing heating radiation and optical arrangementZEISS CARL SMT GMBH·Filed 2021·Granted Jul 2, 2024·0 cites·20 claims
- 1569US2025068089A1Optical element, and assembly and optical system therewithZEISS CARL SMT GMBH·Filed 2024·Application pending·0 cites
- 1666US9348234B2Microlithographic apparatusZEISS CARL SMT GMBH·Filed 2015·Granted May 24, 2016·1 cites·22 claims
- 1764US12436473B2Optical element, optical system, lithography system, and method for operating an optical elementZEISS CARL SMT GMBH·Filed 2022·Granted Oct 7, 2025·0 cites·20 claims
- 1860US10591825B2Projection lens, projection exposure apparatus and projection exposure method for EUV microlithographyZEISS CARL SMT GMBH·Filed 2018·Granted Mar 17, 2020·0 cites·30 claims
- 1959US9372411B2Projection objective of a microlithographic projection exposure apparatusZEISS CARL SMT GMBH·Filed 2014·Granted Jun 21, 2016·1 cites·34 claims
- 2058US9470872B2Reflective optical elementZEISS CARL SMT GMBH·Filed 2014·Granted Oct 18, 2016·1 cites·21 claims
- 2157US12115841B2Ground milling machineBOMAG GMBH·Filed 2022·Granted Oct 15, 2024·0 cites·17 claims
- 2255US2018136565A1Projection exposure method and projection exposure apparatus for microlithographyZEISS CARL SMT GMBH·Filed 2017·Application pending·0 cites
- 2354US9709770B2Mirror arrangement for an EUV projection exposure apparatus, method for operating the same, and EUV projection exposure apparatusZEISS CARL SMT GMBH·Filed 2014·Granted Jul 18, 2017·0 cites·14 claims
- 2450US9829800B2System correction from long timescalesZEISS CARL SMT GMBH·Filed 2014·Granted Nov 28, 2017·0 cites·20 claims
- 2545US10754132B2Imaging optical system for microlithographyZEISS CARL SMT GMBH·Filed 2013·Granted Aug 25, 2020·0 cites·31 claims
- 2633US2016161852A1Mirror for a microlithographic projection exposure system and method for processing a mirrorZEISS CARL SMT GMBH·Filed 2016·Application pending·0 cites
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