Inventor · disambiguated record
Srikanteswara Dakshina-Murthy
Also filed as: DAKSHINA MURTHY SRIKANTESWARA
79 granted patents·1 pending application·3,257 citations·filing 2000–2011
99Inventor score
Files withADVANCED MICRO DEVICES INC74GLOBALFOUNDRIES INC2DAKSHINA-MURTHY SRIKANTESWARA1HUANG RICHARD J1MOTOROLA INC1
Top patents by PatentIndex Score
80 records- 0199US6921963B2Narrow fin FinFETADVANCED MICRO DEVICES INC·Filed 2004·Granted Jul 26, 2005·273 cites·10 claims
- 0299US6835618B1Epitaxially grown fin for FinFETADVANCED MICRO DEVICES INC·Filed 2003·Granted Dec 28, 2004·229 cites·15 claims
- 0399US6645797B1Method for forming fins in a FinFET device using sacrificial carbon layerADVANCED MICRO DEVICES INC·Filed 2002·Granted Nov 11, 2003·273 cites·20 claims
- 0498US6803631B2Strained channel finfetADVANCED MICRO DEVICES INC·Filed 2003·Granted Oct 12, 2004·152 cites·30 claims
- 0598US6773998B1Modified film stack and patterning strategy for stress compensation and prevention of pattern distortion in amorphous carbon gate patterningADVANCED MICRO DEVICES INC·Filed 2003·Granted Aug 10, 2004·208 cites·22 claims
- 0697US6897527B2Strained channel FinFETADVANCED MICRO DEVICES INC·Filed 2004·Granted May 24, 2005·118 cites·28 claims
- 0797US6833588B2Semiconductor device having a U-shaped gate structureADVANCED MICRO DEVICES INC·Filed 2002·Granted Dec 21, 2004·116 cites·14 claims
- 0896US6787854B1Method for forming a fin in a finFET deviceADVANCED MICRO DEVICES INC·Filed 2003·Granted Sep 7, 2004·113 cites·5 claims
- 0996US6762483B1Narrow fin FinFETADVANCED MICRO DEVICES INC·Filed 2003·Granted Jul 13, 2004·110 cites·14 claims
- 1095US7186650B1Control of bottom dimension of tapered contact via variation(s) of etch processADVANCED MICRO DEVICES INC·Filed 2004·Granted Mar 6, 2007·84 cites·14 claims
- 1194US7105399B1Selective epitaxial growth for tunable channel thicknessADVANCED MICRO DEVICES INC·Filed 2004·Granted Sep 12, 2006·103 cites·19 claims
- 1294US6884733B1Use of amorphous carbon hard mask for gate patterning to eliminate requirement of poly re-oxidationADVANCED MICRO DEVICES INC·Filed 2002·Granted Apr 26, 2005·91 cites·25 claims
- 1394US6605514B1Planar finFET patterning using amorphous carbonADVANCED MICRO DEVICES INC·Filed 2002·Granted Aug 12, 2003·87 cites·20 claims
- 1493US6864164B1Finfet gate formation using reverse trim of dummy gateADVANCED MICRO DEVICES INC·Filed 2002·Granted Mar 8, 2005·76 cites·17 claims
- 1592US6855582B1FinFET gate formation using reverse trim and oxide polishADVANCED MICRO DEVICES INC·Filed 2003·Granted Feb 15, 2005·64 cites·19 claims
- 1692US6750127B1Method for fabricating a semiconductor device using amorphous carbon having improved etch resistanceADVANCED MICRO DEVICES INC·Filed 2003·Granted Jun 15, 2004·61 cites·9 claims
- 1792US6664154B1Method of using amorphous carbon film as a sacrificial layer in replacement gate integration processesADVANCED MICRO DEVICES INC·Filed 2002·Granted Dec 16, 2003·67 cites·20 claims
- 1891US6764949B2Method for reducing pattern deformation and photoresist poisoning in semiconductor device fabricationADVANCED MICRO DEVICES INC·Filed 2002·Granted Jul 20, 2004·53 cites·18 claims
- 1991US6673635B1Method for alignment mark formation for a shallow trench isolation processADVANCED MICRO DEVICES INC·Filed 2002·Granted Jan 6, 2004·55 cites·14 claims
- 2090US7158896B1Real time immersion medium control using scatterometryADVANCED MICRO DEVICES INC·Filed 2004·Granted Jan 2, 2007·35 cites·25 claims
- 2190US6875664B1Formation of amorphous carbon ARC stack having graded transition between amorphous carbon and ARC materialADVANCED MICRO DEVICES INC·Filed 2002·Granted Apr 5, 2005·47 cites·20 claims
- 2289US6696334B1Method for formation of a differential offset spacerADVANCED MICRO DEVICES INC·Filed 2002·Granted Feb 24, 2004·55 cites·19 claims
- 2387US7196372B1Flash memory deviceSPANSION LLC·Filed 2003·Granted Mar 27, 2007·42 cites·16 claims
- 2487US7183152B1Epitaxially grown fin for FinFETADVANCED MICRO DEVICES INC·Filed 2004·Granted Feb 27, 2007·34 cites·17 claims
- 2587US7148142B1System and method for imprint lithography to facilitate dual damascene integration in a single imprint actADVANCED MICRO DEVICES INC·Filed 2004·Granted Dec 12, 2006·39 cites·23 claims
- 2686US7084071B1Use of multilayer amorphous carbon ARC stack to eliminate line warpage phenomenonADVANCED MICRO DEVICES INC·Filed 2002·Granted Aug 1, 2006·34 cites·23 claims
- 2785US7029958B2Self aligned damascene gateADVANCED MICRO DEVICES INC·Filed 2003·Granted Apr 18, 2006·31 cites·17 claims
- 2885US6511911B1Metal gate stack with etch stop layerADVANCED MICRO DEVICES INC·Filed 2001·Granted Jan 28, 2003·30 cites·10 claims
- 2983US7235474B1System and method for imprint lithography to facilitate dual damascene integration with two imprint actsADVANCED MICRO DEVICES INC·Filed 2004·Granted Jun 26, 2007·23 cites·22 claims
- 3083US6989332B1Ion implantation to modulate amorphous carbon stressADVANCED MICRO DEVICES INC·Filed 2002·Granted Jan 24, 2006·26 cites·20 claims
- 3183US6596553B1Method of pinhole decoration and detectionADVANCED MICRO DEVICES INC·Filed 2002·Granted Jul 22, 2003·29 cites·20 claims
- 3282US6815268B1Method for forming a gate in a FinFET deviceADVANCED MICRO DEVICES INC·Filed 2002·Granted Nov 9, 2004·28 cites·19 claims
- 3381US7156925B1Using supercritical fluids to clean lenses and monitor defectsADVANCED MICRO DEVICES INC·Filed 2004·Granted Jan 2, 2007·15 cites·20 claims
- 3480US6960804B1Semiconductor device having a gate structure surrounding a finADVANCED MICRO DEVICES INC·Filed 2003·Granted Nov 1, 2005·22 cites·18 claims
- 3580US6787476B1Etch stop layer for etching FinFET gate over a large topographyADVANCED MICRO DEVICES INC·Filed 2003·Granted Sep 7, 2004·21 cites·20 claims
- 3679US7109101B1Capping layer for reducing amorphous carbon contamination of photoresist in semiconductor device manufacture; and process for making sameMOTOROLA INC·Filed 2003·Granted Sep 19, 2006·26 cites·15 claims
- 3779US7065427B1Optical monitoring and control of two layers of liquid immersion mediaADVANCED MICRO DEVICES INC·Filed 2004·Granted Jun 20, 2006·15 cites·20 claims
- 3879US6900139B1Method for photoresist trim endpoint detectionADVANCED MICRO DEVICES INC·Filed 2002·Granted May 31, 2005·25 cites·29 claims
- 3979US6797552B1Method for defect reduction and enhanced control over critical dimensions and profiles in semiconductor devicesADVANCED MICRO DEVICES INC·Filed 2002·Granted Sep 28, 2004·22 cites·8 claims
- 4078US7709373B1System and method for imprint lithography to facilitate dual damascene integration in a single imprint actADVANCED MICRO DEVICES INC·Filed 2006·Granted May 4, 2010·6 cites·20 claims
- 4178US7386162B1Post fabrication CD modification on imprint lithography maskADVANCED MICRO DEVICES INC·Filed 2004·Granted Jun 10, 2008·19 cites·18 claims
- 4277US6979651B1Method for forming alignment features and back-side contacts with fewer lithography and etch stepsADVANCED MICRO DEVICES INC·Filed 2002·Granted Dec 27, 2005·19 cites·15 claims
- 4377US6500755B2Resist trim process to define small openings in dielectric layersADVANCED MICRO DEVICES INC·Filed 2000·Granted Dec 31, 2002·18 cites·23 claims
- 4475US7052921B1System and method using in situ scatterometry to detect photoresist pattern integrity during the photolithography processADVANCED MICRO DEVICES INC·Filed 2004·Granted May 30, 2006·16 cites·12 claims
- 4575US6825114B1Selective stress-inducing implant and resulting pattern distortion in amorphous carbon patterningADVANCED MICRO DEVICES INC·Filed 2003·Granted Nov 30, 2004·16 cites·20 claims
- 4674US8007631B2System and method for imprint lithography to facilitate dual damascene integration with two imprint actsADVANCED MICRO DEVICES INC·Filed 2007·Granted Aug 30, 2011·3 cites·20 claims
- 4774US6579801B1Method for enhancing shallow trench top corner rounding using endpoint control of nitride layer etch process with appropriate etch frontADVANCED MICRO DEVICES INC·Filed 2001·Granted Jun 17, 2003·18 cites·26 claims
- 4874US6444513B1Metal gate stack with etch stop layer having implanted metal speciesADVANCED MICRO DEVICES INC·Filed 2001·Granted Sep 3, 2002·15 cites·9 claims
- 4972US7091106B2Method of reducing STI divot formation during semiconductor device fabricationADVANCED MICRO DEVICES INC·Filed 2004·Granted Aug 15, 2006·18 cites·7 claims
- 5070US6664604B1Metal gate stack with etch stop layerADVANCED MICRO DEVICES INC·Filed 2002·Granted Dec 16, 2003·12 cites·8 claims
Showing the top 50 of 80 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →