Inventor · disambiguated record
Steve H. Chiao
Also filed as: CHIAO STEVE · CHIAO STEVE H
7 granted patents·4 pending applications·2,468 citations·filing 1998–2013
89Inventor score
Top patents by PatentIndex Score
11 records- 0198US6302964B1One-piece dual gas faceplate for a showerhead in a semiconductor wafer processing systemAPPLIED MATERIALS INC·Filed 2000·Granted Oct 16, 2001·986 cites·15 claims
- 0298US6086677ADual gas faceplate for a showerhead in a semiconductor wafer processing systemAPPLIED MATERIALS INC·Filed 1998·Granted Jul 11, 2000·1.1k cites·20 claims
- 0396US6364954B2High temperature chemical vapor deposition chamberAPPLIED MATERIALS INC·Filed 1998·Granted Apr 2, 2002·342 cites·16 claims
- 0494US7464917B2Ampoule splash guard apparatusAPPILED MATERIALS INC·Filed 2005·Granted Dec 16, 2008·26 cites·26 claims
- 0590US7699295B2Ampoule splash guard apparatusAPPLIED MATERIALS INC·Filed 2008·Granted Apr 20, 2010·9 cites·17 claims
- 0670US9593417B2Gas line weldment design and process for CVD aluminumAPPLIED MATERIALS INC·Filed 2013·Granted Mar 14, 2017·0 cites·5 claims
- 0766US8535443B2Gas line weldment design and process for CVD aluminumLEE WEI TI·Filed 2006·Granted Sep 17, 2013·3 cites·14 claims
- 0845US2007113783A1Band shield for substrate processing chamberAPPLIED MATERIALS INC·Filed 2005·Application pending·0 cites
- 0945US2006021703A1Dual gas faceplate for a showerhead in a semiconductor wafer processing systemAPPLIED MATERIALS INC·Filed 2004·Application pending·0 cites
- 1041US2003116087A1Chamber hardware design for titanium nitride atomic layer depositionFiled 2001·Application pending·0 cites
- 1139US2003017268A1.method of cvd titanium nitride film deposition for increased titanium nitride film uniformityAPPLIED MATERIALS INC·Filed 2001·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →