Inventor · disambiguated record
Stefan Hembacher
Also filed as: HEMBACHER STEFAN
29 granted patents·9 pending applications·64 citations·filing 2007–2025
94Inventor score
Top patents by PatentIndex Score
38 records- 0191US9316929B2EUV exposure apparatus with reflective elements having reduced influence of temperature variationZEISS CARL SMT GMBH·Filed 2013·Granted Apr 19, 2016·10 cites·22 claims
- 0290US10031423B2EUV exposure apparatus with reflective elements having reduced influence of temperature variationZEISS CARL SMT GMBH·Filed 2017·Granted Jul 24, 2018·4 cites·20 claims
- 0390US8169595B2Optical apparatus and method for modifying the imaging behavior of such apparatusSCHRIEVER MARTIN·Filed 2009·Granted May 1, 2012·23 cites·52 claims
- 0484US9696518B2Position manipulator for an optical componentZEISS CARL SMT GMBH·Filed 2013·Granted Jul 4, 2017·4 cites·21 claims
- 0578US9175948B2Optical module with a measuring deviceZEISS CARL SMT GMBH·Filed 2013·Granted Nov 3, 2015·4 cites·21 claims
- 0675US9046794B2Cleaning module, EUV lithography device and method for the cleaning thereofHEMBACHER STEFAN·Filed 2010·Granted Jun 2, 2015·3 cites·40 claims
- 0774US10416570B2Optical imaging arrangement with a piezoelectric deviceZEISS CARL SMT GMBH·Filed 2018·Granted Sep 17, 2019·3 cites·20 claims
- 0873US8902401B2Optical imaging device with thermal attenuationZEISS CARL SMT GMBH·Filed 2012·Granted Dec 2, 2014·1 cites·22 claims
- 0971US8363206B2Optical imaging device with thermal attenuationZEISS CARL SMT GMBH·Filed 2008·Granted Jan 29, 2013·2 cites·48 claims
- 1070US8027023B2Optical imaging device and method for reducing dynamic fluctuations in pressure differenceZEISS CARL SMT GMBH·Filed 2007·Granted Sep 27, 2011·2 cites·22 claims
- 1168US10684551B2EUV exposure apparatus with reflective elements having reduced influence of temperature variationZEISS CARL SMT GMBH·Filed 2019·Granted Jun 16, 2020·0 cites·9 claims
- 1268US7869147B2Holding device for optical elementZEISS CARL SMT GMBH·Filed 2007·Granted Jan 11, 2011·5 cites·47 claims
- 1367US9250417B2Optical arrangement in a microlithographic projection exposure apparatusSCHAFFER DIRK·Filed 2012·Granted Feb 2, 2016·2 cites·23 claims
- 1467US2025216794A1Mirror device, for example for a microlithographic projection exposure system, and method for measuring the temperature of a mirrorZEISS CARL SMT GMBH·Filed 2025·Application pending·0 cites
- 1565US8659745B2Optical system with an exchangeable, manipulable correction arrangement for reducing image aberrationsZEISS CARL SMT GMBH·Filed 2013·Granted Feb 25, 2014·1 cites·32 claims
- 1665US2023367227A1Optical system, lithography apparatus and methodZEISS CARL SMT GMBH·Filed 2023·Application pending·0 cites
- 1763US10317802B2EUV exposure apparatus with reflective elements having reduced influence of temperature variationZEISS CARL SMT GMBH·Filed 2018·Granted Jun 11, 2019·0 cites·21 claims
- 1862US12287587B2Damping arrangement for vibration damping of an element in an optical systemZEISS CARL SMT GMBH·Filed 2022·Granted Apr 29, 2025·0 cites·22 claims
- 1962US11092897B2Method for producing a mirror as an optical component for an optical system of a projection exposure apparatus for projection lithographyZEISS CARL SMT GMBH·Filed 2020·Granted Aug 17, 2021·0 cites·20 claims
- 2061US9810996B2Optical imaging device with thermal attenuationZEISS CARL SMT GMBH·Filed 2014·Granted Nov 7, 2017·0 cites·41 claims
- 2160US11281114B2Projection exposure apparatus for semiconductor lithographyZEISS CARL SMT GMBH·Filed 2020·Granted Mar 22, 2022·0 cites·29 claims
- 2260US2018181007A1Optical imaging device with thermal attenuationZEISS CARL SMT GMBH·Filed 2017·Application pending·0 cites
- 2359US10989897B2Optical element for the beam guidance of imaging light in projection lithographyZEISS CARL SMT GMBH·Filed 2020·Granted Apr 27, 2021·0 cites·20 claims
- 2458US10599051B2Projection exposure apparatus, and method for reducing deformations, resulting from dynamic accelerations, of components of the projection exposure apparatusZEISS CARL SMT GMBH·Filed 2019·Granted Mar 24, 2020·0 cites·19 claims
- 2558US9746778B2EUV exposure apparatus with reflective elements having reduced influence of temperature variationZEISS CARL SMT GMBH·Filed 2016·Granted Aug 29, 2017·0 cites·14 claims
- 2657US9766550B2Actuators and microlithography projection exposure systems and methods using the sameZEISS CARL SMT GMBH·Filed 2015·Granted Sep 19, 2017·0 cites·23 claims
- 2755US11526089B2Compensation of creep effects in an imaging deviceZEISS CARL SMT GMBH·Filed 2021·Granted Dec 13, 2022·0 cites·22 claims
- 2855US2024004160A1Optical element, optical arrangement and insert componentZEISS CARL SMT GMBH·Filed 2023·Application pending·0 cites
- 2954US2023185080A1Optical element, optical arrangement, and method for manufacturing an optical elementZEISS CARL SMT GMBH·Filed 2023·Application pending·0 cites
- 3052US2012147344A1Actuators and microlithography projection exposure systems and methods using the sameWEBER ULRICH·Filed 2012·Application pending·0 cites
- 3152US2008013063A1Optical imaging deviceZEISS CARL SMT AG·Filed 2007·Application pending·0 cites
- 3251US11169359B2Method for positioning a component of an optical systemZEISS CARL SMT GMBH·Filed 2019·Granted Nov 9, 2021·0 cites·20 claims
- 3351US9817322B2Optical imaging device and method for reducing dynamic fluctuations in pressure differenceHEMBACHER STEFAN·Filed 2011·Granted Nov 14, 2017·0 cites·57 claims
- 3451US2011128521A1Actuators and microlithography projection exposure systems and methods using the sameZEISS CARL SMT GMBH·Filed 2011·Application pending·0 cites
- 3551US2016147159A1Optical imaging deviceZEISS CARL SMT GMBH·Filed 2015·Application pending·0 cites
- 3645US9904175B2EUV imaging apparatusZEISS CARL SMT GMBH·Filed 2015·Granted Feb 27, 2018·0 cites·21 claims
- 3745US8542346B2Optical system with an exchangeable, manipulable correction arrangement for reducing image aberrationsLIMBACH GUIDO·Filed 2009·Granted Sep 24, 2013·0 cites·33 claims
- 3843US10890850B2Optical imaging arrangement with actively adjustable metrology support unitsZEISS CARL SMT GMBH·Filed 2018·Granted Jan 12, 2021·0 cites·21 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →