Inventor · disambiguated record
Steve Sansoni
Also filed as: SANSONI STEVE
11 granted patents·1 pending application·223 citations·filing 1997–2023
91Inventor score
Top patents by PatentIndex Score
12 records- 0197US7480129B2Detachable electrostatic chuck for supporting a substrate in a process chamberAPPLIED MATERIALS INC·Filed 2005·Granted Jan 20, 2009·87 cites·31 claims
- 0292US8852348B2Heat exchange pedestal with coating of diamond-like materialPARKHE VIJAY D·Filed 2010·Granted Oct 7, 2014·15 cites·23 claims
- 0391US7907384B2Detachable electrostatic chuck for supporting a substrate in a process chamberAPPLIED MATERIALS INC·Filed 2008·Granted Mar 15, 2011·13 cites·25 claims
- 0489US7697260B2Detachable electrostatic chuckAPPLIED MATERIALS INC·Filed 2004·Granted Apr 13, 2010·35 cites·19 claims
- 0585US10053778B2Cooling pedestal with coating of diamond-like carbonAPPLIED MATERIALS INC·Filed 2014·Granted Aug 21, 2018·5 cites·20 claims
- 0685US7824498B2Coating for reducing contamination of substrates during processingAPPLIED MATERIALS INC·Filed 2004·Granted Nov 2, 2010·28 cites·20 claims
- 0782US5861086AMethod and apparatus for sputter etch conditioning a ceramic bodyAPPLIED MATERIALS INC·Filed 1997·Granted Jan 19, 1999·35 cites·21 claims
- 0880US12249494B2Remote plasma cleaning of chambers for electronics manufacturing systemsAPPLIED MATERIALS INC·Filed 2023·Granted Mar 11, 2025·0 cites·20 claims
- 0968US11854773B2Remote plasma cleaning of chambers for electronics manufacturing systemsAPPLIED MATERIALS INC·Filed 2021·Granted Dec 26, 2023·0 cites·20 claims
- 1064US8702918B2Apparatus for enabling concentricity of plasma dark spaceRITCHIE ALAN·Filed 2011·Granted Apr 22, 2014·1 cites·20 claims
- 1148US2005252454A1Contaminant reducing substrate transport and support systemAPPLIED MATERIALS INC·Filed 2005·Application pending·0 cites
- 1241US6395157B2Method and apparatus for sputter etch conditioning a ceramic bodyAPPLIED MATERIALS INC·Filed 1998·Granted May 28, 2002·4 cites·4 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →