Inventor · disambiguated record
Sun Young Baik
Also filed as: BAIK SUN YOUNG
5 granted patents·6 pending applications·2 citations·filing 2021–2025
62Inventor score
Top patents by PatentIndex Score
11 records- 0187US11634441B2Group 5 metal compound for thin film deposition and method of forming group 5 metal-containing thin film using sameEGTM CO LTD·Filed 2021·Granted Apr 25, 2023·2 cites·2 claims
- 0265US12421605B2Method for areal selective forming of thin filmEGTM CO LTD·Filed 2024·Granted Sep 23, 2025·0 cites·13 claims
- 0362US2025305118A1Methods and systems for forming highly conformal and low resistivity vanadium nitride thin filmsEUGENUS INC·Filed 2025·Application pending·0 cites
- 0459US11926897B2Niobium precursor compound for thin film deposition and method for forming niobium-containing thin film using sameEGTM CO LTD·Filed 2022·Granted Mar 12, 2024·0 cites·17 claims
- 0558US2025257462A1Method of treating thin films and method of manufacturing memory deviceEGTM CO LTD·Filed 2025·Application pending·0 cites
- 0656US12281130B2Organometallic precursor compoundEGTM CO LTD·Filed 2021·Granted Apr 22, 2025·0 cites·3 claims
- 0756US11958874B2Organo tin compound for thin film deposition and method for forming tin-containing thin film using sameEGTM CO LTD·Filed 2022·Granted Apr 16, 2024·0 cites·9 claims
- 0856US2023339985A1Organometallic Compound For Thin Film Deposition And Method For Forming Group 4 Metal-Containing Thin Film Using SameEGTM CO LTD·Filed 2023·Application pending·0 cites
- 0956US2025376764A1Compound for forming molybdenum-containing thin film, molybdenum-containing thin film and manufacturing method thereofEGTM CO LTD·Filed 2025·Application pending·0 cites
- 1055US2025201549A1Precursor for forming silicon-containing thin film with high hardness and low dielectric constant and manufacturing method for silicon-containing thin film using thereofEGTM CO LTD·Filed 2024·Application pending·0 cites
- 1145US2025246438A1Method of treating thin films and method of manufacturing memory deviceEGTM CO LTD·Filed 2025·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →