Inventor · disambiguated record
Susanne Beder
Also filed as: BEDER SUSANNE
32 granted patents·13 pending applications·170 citations·filing 2004–2024
96Inventor score
Top patents by PatentIndex Score
45 records- 0193US7570343B2Microlithographic projection exposure apparatusZEISS CARL SMT AG·Filed 2005·Granted Aug 4, 2009·14 cites·8 claims
- 0291US8208199B2Catadioptric projection objectiveSHAFER DAVID·Filed 2009·Granted Jun 26, 2012·7 cites·20 claims
- 0391US7466489B2Projection objective having a high aperture and a planar end surfaceBEDER SUSANNE·Filed 2005·Granted Dec 16, 2008·17 cites·98 claims
- 0490US10606048B2Imaging optical unit for a metrology system for examining a lithography maskZEISS CARL SMT GMBH·Filed 2017·Granted Mar 31, 2020·3 cites·21 claims
- 0590US8208198B2Catadioptric projection objectiveSHAFER DAVID·Filed 2007·Granted Jun 26, 2012·8 cites·4 claims
- 0690US7428105B2Objectives as a microlithography projection objective with at least one liquid lensZEISS CARL SMT AG·Filed 2007·Granted Sep 23, 2008·9 cites·26 claims
- 0788US7782440B2Projection lens system of a microlithographic projection exposure installationZEISS CARL SMT AG·Filed 2005·Granted Aug 24, 2010·8 cites·4 claims
- 0885US7061626B1Method of manufacturing an optical element using a hologramZEISS CARL SMT AG·Filed 2004·Granted Jun 13, 2006·29 cites·35 claims
- 0984US7589903B2Projection objective adapted for use with different immersion fluids or liquids, method of conversion of such and production methodZEISS CARL SMT AG·Filed 2006·Granted Sep 15, 2009·7 cites·51 claims
- 1084US7301707B2Projection optical system and methodZEISS CARL SMT AG·Filed 2005·Granted Nov 27, 2007·20 cites·40 claims
- 1180US7385764B2Objectives as a microlithography projection objective with at least one liquid lensZEISS CARL SMT AG·Filed 2004·Granted Jun 10, 2008·16 cites·24 claims
- 1279US11119413B2Imaging optical unit for imaging an object field into an image fieldZEISS CARL SMT GMBH·Filed 2020·Granted Sep 14, 2021·1 cites·19 claims
- 1379US7848031B2Hologram and method of manufacturing an optical element using a hologramZEISS CARL SMT AG·Filed 2006·Granted Dec 7, 2010·11 cites·8 claims
- 1469US2025068081A1Illumination system, projection illumination facility and projection illumination methodZEISS CARL SMT GMBH·Filed 2024·Application pending·0 cites
- 1569US2025130503A1Imaging euv optical unit for imaging an object field into an image fieldZEISS CARL SMT GMBH·Filed 2024·Application pending·0 cites
- 1669US2025068083A1Catadioptric projection objective, projection illumination system and projection illumination methodZEISS CARL SMT GMBH·Filed 2024·Application pending·0 cites
- 1767US8908269B2Immersion catadioptric projection objective having two intermediate imagesZEISS CARL SMT GMBH·Filed 2013·Granted Dec 9, 2014·0 cites·30 claims
- 1866US7719658B2Imaging system for a microlithographical projection light systemZEISS CARL SMT AG·Filed 2005·Granted May 18, 2010·2 cites·27 claims
- 1965US8319944B2Projection lens system of a microlithographic projection exposure installationBEIERL HELMUT·Filed 2010·Granted Nov 27, 2012·1 cites·20 claims
- 2065US2015055214A1Catadioptric projection objectiveZEISS CARL SMT GMBH·Filed 2014·Application pending·0 cites
- 2164US8031326B2Illumination system or projection lens of a microlithographic exposure systemZEISS CARL SMT GMBH·Filed 2008·Granted Oct 4, 2011·3 cites·35 claims
- 2263US8730572B2Catadioptric projection objectiveSHAFER DAVID·Filed 2012·Granted May 20, 2014·0 cites·26 claims
- 2362US8199400B2Catadioptric projection objectiveSHAFER DAVID·Filed 2009·Granted Jun 12, 2012·1 cites·1 claims
- 2462US7835073B2Projection objective for lithographyZEISS CARL SMT AG·Filed 2008·Granted Nov 16, 2010·2 cites·21 claims
- 2562US2024069453A1Heating arrangement and method for heating an optical elementZEISS CARL SMT GMBH·Filed 2023·Application pending·0 cites
- 2661US7728987B2Method of manufacturing an optical elementZEISS CARL SMT AG·Filed 2004·Granted Jun 1, 2010·10 cites·18 claims
- 2758US9164396B2Projection lens system of a microlithographic projection exposure installationZEISS CARL SMT GMBH·Filed 2012·Granted Oct 20, 2015·0 cites·20 claims
- 2858US7782538B2Projection objective having a high aperture and a planar end surfaceZEISS CARL SMT AG·Filed 2008·Granted Aug 24, 2010·0 cites·9 claims
- 2958US2016274343A1Catadioptric projection objectiveZEISS CARL SMT GMBH·Filed 2015·Application pending·0 cites
- 3057US12085780B2Optical system, heating arrangement, and method for heating an optical element in an optical systemZEISS CARL SMT GMBH·Filed 2022·Granted Sep 10, 2024·0 cites·20 claims
- 3157US7982969B2Projection objective of a microlithographic projection exposure apparatusZEISS CARL SMT GMBH·Filed 2008·Granted Jul 19, 2011·1 cites·47 claims
- 3257US2008304033A1Projection objective for a microlithographic projection exposure apparatusZEISS CARL SMT AG·Filed 2008·Application pending·0 cites
- 3356US8355201B2Catadioptric projection objectiveZEISS CARL SMT GMBH·Filed 2011·Granted Jan 15, 2013·0 cites·12 claims
- 3454US8416490B2Catadioptric projection objectiveSHAFER DAVID·Filed 2010·Granted Apr 9, 2013·0 cites·13 claims
- 3553US2008068705A1Projection optical system and methodZEISS CARL SMT AG·Filed 2007·Application pending·0 cites
- 3653US2011228246A1Projection objective for a microlithographic projection exposure apparatusZEISS CARL SMT AG·Filed 2011·Application pending·0 cites
- 3751US8325426B2Projection objective of a microlithographic projection exposure apparatusSCHUSTER KARL-HEINZ·Filed 2011·Granted Dec 4, 2012·0 cites·24 claims
- 3850US8068276B2Projection objective for lithographyFELDMANN HEIKO·Filed 2010·Granted Nov 29, 2011·0 cites·20 claims
- 3948US7710640B2Projection objective of a microlithographic projection exposure apparatusZEISS CARL SMT AG·Filed 2008·Granted May 4, 2010·0 cites·24 claims
- 4047US2009021830A1Projection lens of a microlithographic exposure systemZEISS CARL SMT AG·Filed 2008·Application pending·0 cites
- 4146US9459539B2Imaging optical unit for a projection exposure apparatusZEISS CARL SMT GMBH·Filed 2013·Granted Oct 4, 2016·0 cites·20 claims
- 4245US7474469B2Arrangement of optical elements in a microlithographic projection exposure apparatusZEISS CARL SMT AG·Filed 2005·Granted Jan 6, 2009·0 cites·54 claims
- 4345US2007165198A1Projection objective for a microlithographic projection exposure apparatusZEISS CARL SMT AG·Filed 2004·Application pending·0 cites
- 4437US2005275849A1Method of calibrating an interferometer and method of manufacturing an optical elementZEISS CARL SMT AG·Filed 2005·Application pending·0 cites
- 4536US2005225774A1Method for measuring and manufacturing an optical element and optical apparatusZEISS CARL SMT AG·Filed 2005·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →