Inventor · disambiguated record
Sukrant Dhawan
Also filed as: DHAWAN SUKRANT
0 granted patents·5 pending applications·0 citations·filing 2023–2024
Files withAPPLIED MATERIALS INC5
Top patents by PatentIndex Score
5 records- 0160US2025369113A1Nested-loop atomic layer deposition with inhibition and/or etchAPPLIED MATERIALS INC·Filed 2024·Application pending·0 cites
- 0255US2025357109A1Bottom-up gap fill using non-conformal poisoningAPPLIED MATERIALS INC·Filed 2024·Application pending·0 cites
- 0354US2024332000A1Doped silicon-containing materials with increased electrical, mechanical, and etch characteristicsAPPLIED MATERIALS INC·Filed 2023·Application pending·0 cites
- 0453US2025372385A1Methods for gap filling vertical and lateral features with plasma inhibitionAPPLIED MATERIALS INC·Filed 2024·Application pending·0 cites
- 0553US2025329529A1Volumetric expansion deposition of silicon based dielectric filmAPPLIED MATERIALS INC·Filed 2024·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →