Inventor · disambiguated record
Suigen Kyoh
Also filed as: KYOH SUIGEN
22 granted patents·9 pending applications·231 citations·filing 1999–2018
95Inventor score
Top patents by PatentIndex Score
31 records- 0192US8227151B2Flare correction method, method for manufacturing mask for lithography, and method for manufacturing semiconductor deviceINANAMI RYOICHI·Filed 2010·Granted Jul 24, 2012·10 cites·12 claims
- 0291US7194704B2Design layout preparing methodTOSHIBA KK·Filed 2004·Granted Mar 20, 2007·61 cites·16 claims
- 0387US7797068B2Defect probability calculating method and semiconductor device manufacturing methodTOSHIBA KK·Filed 2007·Granted Sep 14, 2010·9 cites·17 claims
- 0484US8285412B2Semiconductor device production control methodKYOH SUIGEN·Filed 2009·Granted Oct 9, 2012·13 cites·20 claims
- 0583US8234596B2Pattern data creating method, pattern data creating program, and semiconductor device manufacturing methodOGAWA RYUJI·Filed 2009·Granted Jul 31, 2012·8 cites·15 claims
- 0680US7266801B2Design pattern correction method and mask pattern producing methodTOSHIBA KK·Filed 2004·Granted Sep 4, 2007·31 cites·20 claims
- 0777US6340542B1Method of manufacturing a semiconductor device, method of manufacturing a photomask, and a master maskTOSHIBA KK·Filed 1999·Granted Jan 22, 2002·36 cites·15 claims
- 0876US7917871B2Method and program for pattern data generation using a modification guideTOSHIBA KK·Filed 2008·Granted Mar 29, 2011·8 cites·16 claims
- 0974US8883373B2Method for manufacturing photo mask, method for manufacturing semiconductor device, and programMIMOTOGI AKIKO·Filed 2012·Granted Nov 11, 2014·2 cites·12 claims
- 1073US8230379B2Layout generating method for semiconductor integrated circuitsKOBAYASHI SACHIKO·Filed 2007·Granted Jul 24, 2012·7 cites·12 claims
- 1171US6635549B2Method of producing exposure maskTOSHIBA KK·Filed 2001·Granted Oct 21, 2003·11 cites·14 claims
- 1269US6319637B1Method for forming patternTOSHIBA KK·Filed 2000·Granted Nov 20, 2001·10 cites·20 claims
- 1366US7673258B2Design data creating method, design data creating program product, and manufacturing method of semiconductor deviceTOSHIBA KK·Filed 2007·Granted Mar 2, 2010·3 cites·18 claims
- 1465US7523437B2Pattern-producing method for semiconductor deviceTOSHIBA KK·Filed 2004·Granted Apr 21, 2009·6 cites·14 claims
- 1562US7539962B2Pattern data correcting method, photo mask manufacturing method, semiconductor device manufacturing method, program and semiconductor deviceTOSHIBA KK·Filed 2005·Granted May 26, 2009·2 cites·16 claims
- 1661US7029799B2Exposure method for forming pattern for IC chips on reticle by use of master masksDAINIPPON PRINTING CO LTD·Filed 2002·Granted Apr 18, 2006·7 cites·28 claims
- 1759US6542237B1Exposure method for making precision patterns on a substrateTOSHIBA KK·Filed 2000·Granted Apr 1, 2003·5 cites·10 claims
- 1859US2019146334A1Template substrate, manufacturing method, and pattern forming methodTOSHIBA MEMORY CORP·Filed 2018·Application pending·0 cites
- 1958US7966584B2Pattern-producing method for semiconductor deviceTOSHIBA KK·Filed 2009·Granted Jun 21, 2011·0 cites·10 claims
- 2057US2003074274A1Mask trading system and methodFiled 2002·Application pending·0 cites
- 2153US9217918B2Photomask, photomask manufacturing apparatus, and photomask manufacturing methodTOSHIBA KK·Filed 2013·Granted Dec 22, 2015·0 cites·18 claims
- 2250US2016320696A1Template substrate, template substrate manufacturing method, and pattern forming methodTOSHIBA KK·Filed 2015·Application pending·0 cites
- 2349US7499582B2Method for inspecting a defect in a photomask, method for manufacturing a semiconductor device and method for producing a photomaskTOSHIBA KK·Filed 2004·Granted Mar 3, 2009·2 cites·15 claims
- 2447US2009293038A1Method and correction apparatus for correcting process proximity effect and computer program productMAEDA SHIMON·Filed 2009·Application pending·0 cites
- 2546US2009031262A1Mask pattern formation method, mask pattern formation apparatus, and lithography maskMAEDA SHIMON·Filed 2008·Application pending·0 cites
- 2644US2010037193A1Method of correcting pattern layoutKYOH SUIGEN·Filed 2009·Application pending·0 cites
- 2743US2010067777A1Evaluation pattern generating method, computer program product, and pattern verifying methodKODERA KATSUYOSHI·Filed 2009·Application pending·0 cites
- 2842US8118585B2Pattern formation method and a method for manufacturing a semiconductor deviceHATANO MASAYUKI·Filed 2010·Granted Feb 21, 2012·0 cites·18 claims
- 2941US8728711B2Cleaning reticle, method for cleaning reticle stage, and method for manufacturing semiconductor deviceNAKAJIMA YUMI·Filed 2010·Granted May 20, 2014·0 cites·8 claims
- 3041US2008148198A1Hotspot totalization method, pattern correction method, and programKYOH SUIGEN·Filed 2007·Application pending·0 cites
- 3135US2012002181A1Exposure control system and exposure control methodKYOH SUIGEN·Filed 2011·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →