Inventor · disambiguated record
Suk-Joo Lee
Also filed as: LEE SUK · LEE SUK H · LEE SUK-JOO
25 granted patents·19 pending applications·120 citations·filing 2001–2023
94Inventor score
Files withSAMSUNG ELECTRONICS CO LTD26NEOLAB CONVERGENCE INC4LEE SANG GYU3SUH SUNG-SOO2CHOI SUNG-WON1
Top patents by PatentIndex Score
44 records- 0191US7892982B2Method for forming fine patterns of a semiconductor device using a double patterning processSAMSUNG ELECTRONICS CO LTD·Filed 2007·Granted Feb 22, 2011·19 cites·20 claims
- 0289US8026044B2Method of forming fine patterns of semiconductor deviceSAMSUNG ELECTRONICS CO LTD·Filed 2007·Granted Sep 27, 2011·22 cites·20 claims
- 0387US8338310B2Method of forming line/space patternsJUNG SUNG-GON·Filed 2010·Granted Dec 25, 2012·11 cites·16 claims
- 0483US8952423B2Semiconductor device having decoupling capacitors and dummy transistorsSAMSUNG ELECTRONICS CO LTD·Filed 2013·Granted Feb 10, 2015·7 cites·15 claims
- 0583US8174865B2Memory devices and wireless devices including the sameRHIE HYOUNG-SEUB·Filed 2010·Granted May 8, 2012·12 cites·13 claims
- 0677US8778598B2Method of forming fine patterns of semiconductor device by using double patterning process which uses acid diffusionSAMSUNG ELECTRONICS CO LTD·Filed 2012·Granted Jul 15, 2014·3 cites·10 claims
- 0777US7452825B2Method of forming a mask structure and method of forming a minute pattern using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2006·Granted Nov 18, 2008·5 cites·12 claims
- 0875US7787301B2Flash memory device using double patterning technology and method of manufacturing the sameSAMSUNG ELECTRONICS CO LTD·Filed 2006·Granted Aug 31, 2010·4 cites·12 claims
- 0974US7807318B2Reflective photomask and method of fabricating the sameSAMSUNG ELECTRONICS CO LTD·Filed 2007·Granted Oct 5, 2010·3 cites·20 claims
- 1074US6571384B2Method of forming fine patterns on semiconductor deviceSAMSUNG ELECTRONICS CO LTD·Filed 2001·Granted May 27, 2003·19 cites·13 claims
- 1172US8431331B2Method of forming fine patterns of semiconductor device by using double patterning process which uses acid diffusionKANG YOOL·Filed 2008·Granted Apr 30, 2013·4 cites·20 claims
- 1272US2024053882A1Electronic device, method for driving electronic device, and method for controlling data recording applicationNEOLAB CONVERGENCE INC·Filed 2023·Application pending·0 cites
- 1370US9557637B2Method of designing patterns of semiconductor devices in consideration of pattern densitySAMSUNG ELECTRONICS CO LTD·Filed 2014·Granted Jan 31, 2017·2 cites·17 claims
- 1469US11853544B2Electronic device, method for driving electronic device, and method for controlling data recording applicationNEOLAB CONVERGENCE INC·Filed 2022·Granted Dec 26, 2023·0 cites·9 claims
- 1566US8563197B2Methods, apparatus and computer program products for fabricating masks and semiconductor devices using model-based optical proximity effect correction and lithography-friendly layoutSUH SUNG-SOO·Filed 2008·Granted Oct 22, 2013·3 cites·13 claims
- 1666US7940373B2Compensating masks, multi-optical systems using the masks, and methods of compensating for 3-D mask effect using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2007·Granted May 10, 2011·2 cites·5 claims
- 1760US9941172B2Method for fabricating semiconductor device including a via hole in a mask patternSAMSUNG ELECTRONICS CO LTD·Filed 2016·Granted Apr 10, 2018·1 cites·19 claims
- 1859US9111185B2Method and apparatus to manage contents in network and web server used theretoLEE SANG-GYU·Filed 2011·Granted Aug 18, 2015·2 cites·18 claims
- 1953US10763510B2Alumina powder, alumina slurry, alumina-containing coating layer, multilayer separation membrane and secondary batterySUMITOMO CHEMICAL CO·Filed 2017·Granted Sep 1, 2020·0 cites·17 claims
- 2052US2020333953A1Electronic device, method for driving electronic device, and method for controlling data recording applicationNEOLAB CONVERGENCE INC·Filed 2018·Application pending·0 cites
- 2151US7799490B2Optical masks and methods for measuring aberration of a beamSAMSUNG ELECTRONICS CO LTD·Filed 2010·Granted Sep 21, 2010·0 cites·11 claims
- 2251US7670725B2Optical masks and methods for measuring aberration of a beamSAMSUNG ELECTRONICS CO LTD·Filed 2005·Granted Mar 2, 2010·0 cites·18 claims
- 2347US7403276B2Photomask for measuring lens aberration, method of its manufacture, and method of its useSAMSUNG ELECTRONICS CO LTD·Filed 2006·Granted Jul 22, 2008·0 cites·28 claims
- 2447US2010090332A1Ceramic chip assemblyJOINSET CO LTD·Filed 2009·Application pending·0 cites
- 2545US2009013303A1Method of creating mask layout image and imaging systemSAMSUNG ELECTRONIES CO LTD·Filed 2008·Application pending·0 cites
- 2644US7842450B2Method of forming a semiconductor deviceSAMSUNG ELECTRONICS CO LTD·Filed 2007·Granted Nov 30, 2010·0 cites·18 claims
- 2744US2008230929A1Overlay mark of semiconductor device and semiconductor device including the overlay markSAMSUNG ELECTRONICS CO LTD·Filed 2008·Application pending·0 cites
- 2844US2015014553A1Film with codes, reader used for reading the film and electronic device with a display device with the filmNEOLAB CONVERGENCE INC·Filed 2014·Application pending·0 cites
- 2942US2007116815A1Cooking apparatus and method of the sameSAMSUNG ELECTRONICS CO LTD·Filed 2006·Application pending·0 cites
- 3041US2007264584A1Pattern arrangement method of semiconductor deviceSAMSUNG ELECTRONICS CO LTD·Filed 2007·Application pending·0 cites
- 3141US2006127816A1Double photolithography methods with reduced intermixing of solventsSAMSUNG ELECTRONICS CO LTD·Filed 2005·Application pending·0 cites
- 3240US2006079067A1Methods for aligning patterns on a substrate based on optical properties of a mask layer and related devicesSAMSUNG ELECTRONICS CO LTD·Filed 2005·Application pending·0 cites
- 3340US2011177437A1Compensating Masks, Multi-Optical Systems Using the Masks, and Methods of Compensating for 3-D Mask Effect Using the SameSUH SUNG-SOO·Filed 2011·Application pending·0 cites
- 3439US9470972B2Mask for photolithography, method for fabricating the same and method for manufacturing semiconductor device using the maskSAMSUNG ELECTRONICS CO LTD·Filed 2015·Granted Oct 18, 2016·0 cites·20 claims
- 3539US6673706B2Method of forming a pattern using a photoresist without exposing the photoresist and silicidation method incorporating the sameSAMSUNG ELECTRONICS CO LTD·Filed 2001·Granted Jan 6, 2004·1 cites·20 claims
- 3639US2006147835A1Chemically amplified photoresists and related methodsLEE SOOK·Filed 2005·Application pending·0 cites
- 3738US9570364B2Method of detecting focus shift in lithography process, method of analyzing error of transferred pattern using the same and method of manufacturing semiconductor device using the methodsSAMSUNG ELECTRONICS CO LTD·Filed 2015·Granted Feb 14, 2017·0 cites·8 claims
- 3838US2008076047A1Method of forming image contour for predicting semiconductor device patternSAMSUNG ELECTRONICS CO LTD·Filed 2006·Application pending·0 cites
- 3937US2010290285A1Flash Memory Device Using Double Patterning Technology and Method of Manufacturing the SameLEE DOO-YOUL·Filed 2010·Application pending·0 cites
- 4037US2006115746A1Focus monitoring masks having multiple phase shifter units and methods for fabricating the sameCHOI SUNG-WON·Filed 2005·Application pending·0 cites
- 4136US2014051055A1Method for providing correction and teaching services over network and web server used in said methodLEE SANG-GYU·Filed 2012·Application pending·0 cites
- 4236US2011029936A1Method of generating layout of semiconductor deviceSAMSUNG ELECTRONICS CO LTD·Filed 2010·Application pending·0 cites
- 4333US2010248155A1Illumination Control Module, and Diffraction Illumination System and Photolithography System Including the Same, and Methods of Fabricating Semiconductors Using the SameSAMSUNG ELECTRONICS CO LTD·Filed 2010·Application pending·0 cites
- 4432US2014001268A1Film on which a code is recorded, reader used for recognizing the film on which a code is recorded, and electronic equipment including a display device to which the film on which a code is recorded is attachedLEE SANG-GYU·Filed 2012·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →