Compensating Masks, Multi-Optical Systems Using the Masks, and Methods of Compensating for 3-D Mask Effect Using the Same

Abstract

Provided are a compensating mask, a multi-optical system using the compensating mask, and a method of compensating for a 3-dimensional (3-D) mask effect using the compensating mask. Methods of compensating for a 3-D mask effect using a compensating mask may include generating a first kernel corresponding to a normal mask used for forming a minute pattern, generating a second kernel corresponding to a compensating mask, mixing the first kernel corresponding to the normal mask with the second kernel corresponding to the compensating mask, and generating a multi-optical system kernel corresponding to mixing the first kernel and the second kernel.

1 . A mask comprising:
 a compensating mask in a thin mask pattern configured to compensate for a 3-D (3-dimensional) effect caused by a thickness of a normal mask used for forming a minute pattern, the compensating mask comprising:   a light transmitting layer formed of a light transmitting material; and   a light blocking layer patterned underneath the light transmitting layer and formed of a light blocking material.   
     
     
         2 . The mask of  claim 1 , wherein a weighting function of the compensating mask corresponds to a scattering coefficient α of a near field image of the normal mask. 
     
     
         3 . The mask of  claim 2 , wherein the weighting function is used to mix a first kernel of the normal mask with a second kernel of the compensating mask so as to generate a multi-optical system kernel. 
     
     
         4 . The mask of  claim 3 , wherein the multi-optical system kernel is applied on a wafer and a result measured on the wafer is compared with a desired pattern specification to calibrate the scattering coefficient α and the weighting function. 
     
     
         5 . The mask of  claim 3 , wherein standard optical parameters and a pupil surface function of a projection lens positioned under a mask of an optical system are calibrated to generate the first kernel of the normal mask and the second kernel of the compensating mask. 
     
     
         6 . The mask of  claim 5 , wherein the standard optical parameters comprise an illumination condition, an NA (numeral aperture), and a wavelength, and the pupil surface function comprises a magnitude and a phase of light as factors.