Inventor · disambiguated record
Sven Uwe Rieschl
Also filed as: RIESCHL SVEN · RIESCHL SVEN UWE
4 granted patents·1 pending application·30 citations·filing 2011–2023
74Inventor score
Top patents by PatentIndex Score
5 records- 0193US10388559B2Apparatus for depositing a layer on a substrate in a processing gasEVATEC AG·Filed 2016·Granted Aug 20, 2019·13 cites·15 claims
- 0292US10202682B2Method of sputtering and sputter systemEVATEC AG·Filed 2017·Granted Feb 12, 2019·12 cites·24 claims
- 0371US9624572B2Method of HIPIMS sputtering and HIPIMS sputter systemEVATEC AG·Filed 2014·Granted Apr 18, 2017·2 cites·21 claims
- 0467US9490166B2Apparatus and method for depositing a layer onto a substrateRIESCHL SVEN UWE·Filed 2011·Granted Nov 8, 2016·3 cites·16 claims
- 0543US2023241560A1Device for homogenizing a gas distribution in a process chamberVAT HOLDING AG·Filed 2023·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →