Inventor · disambiguated record
Takashi Akahori
Also filed as: AKAHORI TAKASHI
18 granted patents·3 pending applications·401 citations·filing 1988–2007
95Inventor score
Top patents by PatentIndex Score
21 records- 0189US6720659B1Semiconductor device having an adhesion layerTOKYO ELECTRON LTD·Filed 2000·Granted Apr 13, 2004·48 cites·7 claims
- 0286US6355902B2Plasma film forming method and plasma film forming apparatusTOKYO ELECTRON LTD·Filed 2001·Granted Mar 12, 2002·23 cites·6 claims
- 0385US6215087B1Plasma film forming method and plasma film forming apparatusTOKYO ELECTRON LTD·Filed 1997·Granted Apr 10, 2001·57 cites·7 claims
- 0478US6949829B2Semiconductor device and fabrication method thereforTOKYO ELECTRON LTD·Filed 2001·Granted Sep 27, 2005·22 cites·40 claims
- 0576US6218299B1Semiconductor device and method for producing the sameTOKYO ELECTRON LTD·Filed 1997·Granted Apr 17, 2001·47 cites·8 claims
- 0675US6737350B1Method of manufacturing semiconductor deviceTOKYO ELECTRON LTD·Filed 2000·Granted May 18, 2004·22 cites·9 claims
- 0774US6767829B2Plasma deposition method and systemTOKYO ELECTRON LTD·Filed 2001·Granted Jul 27, 2004·18 cites·6 claims
- 0871US5508066AMethod for forming a thin filmSUMITOMO METAL IND·Filed 1994·Granted Apr 16, 1996·48 cites·12 claims
- 0969US5296404AMethod for forming a thin film for a semiconductor deviceSUMITOMO METAL IND·Filed 1991·Granted Mar 22, 1994·51 cites·8 claims
- 1067US8394231B2Plasma process device and plasma process methodTAKATSUKI KOICHI·Filed 2007·Granted Mar 12, 2013·3 cites·18 claims
- 1159US6443165B1Method for cleaning plasma treatment device and plasma treatment systemTOKYO ELECTRON LTD·Filed 1997·Granted Sep 3, 2002·24 cites·3 claims
- 1258US4960071AThin film forming apparatusSUMITOMO METAL IND·Filed 1988·Granted Oct 2, 1990·17 cites·11 claims
- 1354US6479897B2Semiconductor device having fluorine-added carbon dielectric film and method of fabricating the sameTOKYO ELECTRON LTD·Filed 2001·Granted Nov 12, 2002·3 cites·6 claims
- 1450US6337290B1Semiconductor device having fluorine-added carbon dielectric film and method of fabricating the sameTOKYO ELECTRON LTD·Filed 2000·Granted Jan 8, 2002·2 cites·13 claims
- 1548US2007113787A1Plasma process apparatusTOKYO ELECTRON LTD·Filed 2007·Application pending·0 cites
- 1640US4884051ASemiconductor diffusion type force sensing apparatusRICOH KK·Filed 1988·Granted Nov 28, 1989·8 cites·43 claims
- 1738US5386408AOptical recording carrier and optical recording processRICOH KK·Filed 1993·Granted Jan 31, 1995·3 cites·17 claims
- 1838US2004255863A1Plasma process apparatusFiled 2002·Application pending·0 cites
- 1937US2004127033A1Plasma processing device and plasma processing methodFiled 2002·Application pending·0 cites
- 2032US6727182B2Process for the production of semiconductor deviceTOKYO ELECTRON LTD·Filed 1997·Granted Apr 27, 2004·2 cites·3 claims
- 2132US6320154B1Plasma processing methodTOKYO ELECTRON LTD·Filed 1997·Granted Nov 20, 2001·3 cites·5 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →