Inventor · disambiguated record
Takashi Dokan
Also filed as: DOKAN TAKASHI
17 granted patents·5 pending applications·80 citations·filing 2003–2025
91Inventor score
Top patents by PatentIndex Score
22 records- 0198US11476089B2Control method and plasma processing apparatusTOKYO ELECTRON LTD·Filed 2020·Granted Oct 18, 2022·7 cites·27 claims
- 0297US12165842B2Control method and plasma processing apparatusTOKYO ELECTRON LTD·Filed 2023·Granted Dec 10, 2024·2 cites·26 claims
- 0397US11742182B2Control method and plasma processing apparatusTOKYO ELECTRON LTD·Filed 2022·Granted Aug 29, 2023·3 cites·54 claims
- 0497US11742181B2Control method and plasma processing apparatusTOKYO ELECTRON LTD·Filed 2021·Granted Aug 29, 2023·5 cites·33 claims
- 0597US10553407B2Plasma processing method and plasma processing apparatusTOKYO ELECTRON LTD·Filed 2018·Granted Feb 4, 2020·47 cites·14 claims
- 0695US11871503B2Plasma processing method and plasma processing apparatusTOKYO ELECTRON LTD·Filed 2022·Granted Jan 9, 2024·2 cites·9 claims
- 0790US2025062101A1Control method and plasma processing apparatusTOKYO ELECTRON LTD·Filed 2024·Application pending·0 cites
- 0889US11170979B2Plasma etching method and plasma etching apparatusTOKYO ELECTRON LTD·Filed 2019·Granted Nov 9, 2021·4 cites·17 claims
- 0989US2025308844A1Control method and plasma processing apparatusTOKYO ELECTRON LTD·Filed 2025·Application pending·0 cites
- 1089US2025308843A1Control method and plasma processing apparatusTOKYO ELECTRON LTD·Filed 2025·Application pending·0 cites
- 1181US11337297B2Plasma processing method and plasma processing apparatusTOKYO ELECTRON LTD·Filed 2019·Granted May 17, 2022·2 cites·16 claims
- 1277US10622197B2Plasma processing apparatus and plasma processing methodTOKYO ELECTRON LTD·Filed 2016·Granted Apr 14, 2020·2 cites·8 claims
- 1375US2025112073A1Maintenance device, vacuum processing system, and maintenance methodTOKYO ELECTRON LTD·Filed 2024·Application pending·0 cites
- 1470US12198962B2Maintenance device, vacuum processing system, and maintenance methodTOKYO ELECTRON LTD·Filed 2023·Granted Jan 14, 2025·0 cites·17 claims
- 1558US2024105478A1Substrate processing system and maintenance methodTOKYO ELECTRON LTD·Filed 2023·Application pending·0 cites
- 1653US11087960B2Radio frequency power source and plasma processing apparatusTOKYO ELECTRON LTD·Filed 2020·Granted Aug 10, 2021·0 cites·10 claims
- 1753US6765256B2Semiconductor deviceRENESAS TECH CORP·Filed 2003·Granted Jul 20, 2004·6 cites·9 claims
- 1851US11017985B2Plasma processing apparatus, impedance matching method, and plasma processing methodTOKYO ELECTRON LTD·Filed 2019·Granted May 25, 2021·0 cites·16 claims
- 1948US11282701B2Plasma processing method and plasma processing apparatusTOKYO ELECTRON LTD·Filed 2019·Granted Mar 22, 2022·0 cites·26 claims
- 2046US11764082B2Control method and plasma processing apparatusTOKYO ELECTRON LTD·Filed 2019·Granted Sep 19, 2023·0 cites·12 claims
- 2138US9870901B2Method of producing processing condition of plasma processing apparatus, and plasma processing apparatusTOKYO ELECTRON LTD·Filed 2016·Granted Jan 16, 2018·0 cites·5 claims
- 2227US9218983B2Etching method and deviceDOKAN TAKASHI·Filed 2012·Granted Dec 22, 2015·0 cites·11 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →