Inventor · disambiguated record
Tadahito Fujisawa
Also filed as: FUJISAWA TADAHITO
38 granted patents·9 pending applications·1,128 citations·filing 1995–2015
98Inventor score
Top patents by PatentIndex Score
47 records- 0196US7230680B2Wafer flatness evaluation method, wafer flatness evaluation apparatus carrying out the evaluation method, wafer manufacturing method using the evaluation method, wafer quality assurance method using the evaluation method, semiconductor device manufacturing method using the evaluation method and semiconductor device manufacturing method using a wafer evaluated by the evaluation methodNIKON CORP·Filed 2003·Granted Jun 12, 2007·109 cites·20 claims
- 0295US7669172B2Pattern creation method, mask manufacturing method and semiconductor device manufacturing methodTOSHIBA KK·Filed 2008·Granted Feb 23, 2010·25 cites·20 claims
- 0395US6376139B1Control method for exposure apparatus and control method for semiconductor manufacturing apparatusTOSHIBA KK·Filed 2000·Granted Apr 23, 2002·70 cites·4 claims
- 0495US5673103AExposure apparatus and methodTOSHIBA KK·Filed 1996·Granted Sep 30, 1997·199 cites·27 claims
- 0594US6440616B1Mask and method for focus monitoringTOSHIBA KK·Filed 2000·Granted Aug 27, 2002·63 cites·26 claims
- 0694US5627626AProjectin exposure apparatusTOSHIBA KK·Filed 1995·Granted May 6, 1997·102 cites·12 claims
- 0794US5621498AProjection exposure apparatusTOSHIBA KK·Filed 1995·Granted Apr 15, 1997·101 cites·5 claims
- 0893US5707501AFilter manufacturing apparatusTOSHIBA KK·Filed 1995·Granted Jan 13, 1998·81 cites·5 claims
- 0992US7396621B2Exposure control method and method of manufacturing a semiconductor deviceTOSHIBA KK·Filed 2007·Granted Jul 8, 2008·13 cites·5 claims
- 1091US7474386B2Wafer flatness evaluation method, wafer flatness evaluation apparatus carrying out the evaluation method, wafer manufacturing method using the evaluation method, wafer quality assurance method using the evaluation method, semiconductor device manufacturing method using the evaluation method and semiconductor device manufacturing method using a wafer evaluated by the evaluation methodTOSHIBA KK·Filed 2007·Granted Jan 6, 2009·14 cites·12 claims
- 1191US6226074B1Exposure monitor mask, exposure adjusting method and method of manufacturing semiconductor devicesTOSHIBA KK·Filed 2000·Granted May 1, 2001·41 cites·15 claims
- 1288US6701512B2Focus monitoring method, exposure apparatus, and exposure maskTOSHIBA KK·Filed 2002·Granted Mar 2, 2004·43 cites·43 claims
- 1387US6741334B2Exposure method, exposure system and recording mediumTOSHIBA KK·Filed 2001·Granted May 25, 2004·28 cites·14 claims
- 1486US7700997B2Semiconductor memory deviceTOSHIBA KK·Filed 2006·Granted Apr 20, 2010·15 cites·9 claims
- 1585US8373845B2Exposure control apparatus, manufacturing method of semiconductor device, and exposure apparatusTOSHIBA KK·Filed 2010·Granted Feb 12, 2013·4 cites·20 claims
- 1685US6667139B2Method of manufacturing semiconductor deviceTOSHIBA KK·Filed 2002·Granted Dec 23, 2003·35 cites·20 claims
- 1782US6317198B1Method of examining an exposure toolTOSHIBA KK·Filed 1999·Granted Nov 13, 2001·48 cites·17 claims
- 1880US7682757B2Pattern layout for forming integrated circuitTOSHIBA KK·Filed 2006·Granted Mar 23, 2010·6 cites·20 claims
- 1978US7636910B2Photomask quality estimation system and method for use in manufacturing of semiconductor device, and method for manufacturing the semiconductor deviceTOSHIBA KK·Filed 2006·Granted Dec 22, 2009·4 cites·13 claims
- 2078US7365830B2Wafer flatness evaluation method, wafer flatness evaluation apparatus carrying out the evaluation method, wafer manufacturing method using the evaluation method, wafer quality assurance method using the evaluation method, semiconductor device manufacturing method using the evaluation method and semiconductor device manufacturing method using a wafer evaluated by the evaluation methodTOSHIBA KK·Filed 2007·Granted Apr 29, 2008·4 cites·6 claims
- 2177US7250235B2Focus monitor method and maskTOSHIBA KK·Filed 2004·Granted Jul 31, 2007·15 cites·24 claims
- 2277US6813001B2Exposure method and apparatusTOSHIBA KK·Filed 2002·Granted Nov 2, 2004·20 cites·19 claims
- 2375US7716617B2Semiconductor device, method for making pattern layout, method for making mask pattern, method for making layout, method for manufacturing photo mask, photo mask, and method for manufacturing semiconductor deviceTOSHIBA KK·Filed 2005·Granted May 11, 2010·7 cites·9 claims
- 2474US7510341B2Temperature calibration method for baking processing apparatus, adjustment method for development processing apparatus, and method of manufacturing semiconductor apparatusTOSHIBA KK·Filed 2004·Granted Mar 31, 2009·14 cites·32 claims
- 2574US7108945B2Photomask having a focus monitor patternTOSHIBA KK·Filed 2003·Granted Sep 19, 2006·16 cites·25 claims
- 2673US7175943B2Reticle set, method for designing a reticle set, exposure monitoring method, inspection method for reticle set and manufacturing method for a semiconductor deviceTOSHIBA KK·Filed 2003·Granted Feb 13, 2007·9 cites·9 claims
- 2765US7655369B2Reticle set, method for designing a reticle set, exposure monitoring method, inspection method for reticle set and manufacturing method for a semiconductor deviceTOSHIBA KK·Filed 2006·Granted Feb 2, 2010·1 cites·7 claims
- 2862US7426711B2Mask pattern data forming method, photomask and method of manufacturing semiconductor deviceTOSHIBA KK·Filed 2006·Granted Sep 16, 2008·1 cites·3 claims
- 2961US7855047B2Reticle set, method for designing a reticle set, exposure monitoring method, inspection method for reticle set and manufacturing method for a semiconductor deviceTOSHIBA KK·Filed 2009·Granted Dec 21, 2010·0 cites·5 claims
- 3060US6919153B2Dose monitoring method and manufacturing method of semiconductor deviceKABUSHIKI KAISAHA TOSHIBA·Filed 2003·Granted Jul 19, 2005·7 cites·18 claims
- 3156US7794899B2Photo mask, exposure method using the same, and method of generating dataTOSHIBA KK·Filed 2008·Granted Sep 14, 2010·0 cites·4 claims
- 3256US7662523B2Photo mask, exposure method using the same, and method of generating dataTOSHIBA KK·Filed 2008·Granted Feb 16, 2010·0 cites·7 claims
- 3356US2010112812A1Photomask quality estimation system and method for use in manufacturing of semiconductor device, and method for manufacturing the semiconductor deviceTOSHIBA KK·Filed 2009·Application pending·0 cites
- 3454US7368209B2Method for evaluating sensitivity of photoresist, method for preparation of photoresist and manufacturing method of semiconductor deviceTOSHIBA KK·Filed 2004·Granted May 6, 2008·3 cites·28 claims
- 3551US5733687APhotomask, exposing method using photomask, and manufacturing method of photomaskTOSHIBA KK·Filed 1995·Granted Mar 31, 1998·12 cites·14 claims
- 3650US6252651B1Exposure method and exposure apparatus using itTOSHIBA KK·Filed 1999·Granted Jun 26, 2001·10 cites·9 claims
- 3746US6107013AExposure method and exposure apparatus using itTOSHIBA KK·Filed 1997·Granted Aug 22, 2000·8 cites·12 claims
- 3846US2010193960A1Semiconductor device, method for making pattern layout, method for making mask pattern, method for making layout, method for manufacturing photo mask, photo mask, and method for manufacturing semiconductor deviceTOSHIBA KK·Filed 2010·Application pending·0 cites
- 3943US7585597B2Mask pattern data generating method, photo mask manufacturing method, and semiconductor device manufacturing methodTOSHIBA KK·Filed 2005·Granted Sep 8, 2009·0 cites·20 claims
- 4043US7384712B2Photo mask, exposure method using the same, and method of generating dataTOSHIBA KK·Filed 2004·Granted Jun 10, 2008·0 cites·3 claims
- 4143US2008014510A1Photomask designing apparatus, photomask, photomask designing method, photomask designing program and computer-readable storage medium on which the photomask designing program is storedTOSHIBA KK·Filed 2007·Application pending·0 cites
- 4243US2008131599A1Method and apparatus for making coating filmTOSHIBA KK·Filed 2007·Application pending·0 cites
- 4343US2005030502A1Photomask, exposure control method and method of manufacturing a semiconductor deviceFiled 2004·Application pending·0 cites
- 4442US2008303115A1Semiconductor memory device and method of fabricating the sameTOSHIBA KK·Filed 2008·Application pending·0 cites
- 4540US2005123858A1Method for forming pattern and method for manufacturing semiconductor deviceFiled 2004·Application pending·0 cites
- 4635US2016064214A1Template manufacturing method and manufacturing method of semiconductor deviceTOSHIBA KK·Filed 2015·Application pending·0 cites
- 4734US2011047518A1Pattern determining methodAIBA ISSUI·Filed 2010·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →