Inventor · disambiguated record
Takashi Futatsuki
Also filed as: FUTATSUKI TAKASHI
13 granted patents·2 pending applications·428 citations·filing 1995–2020
93Inventor score
Files withORGANO CORP6JAPAN ATOMIC ENERGY AGENCY2NEC CORP2SONY SEMICONDUCTOR SOLUTIONS CORP2JAPAN ATOMIC ENERGY RES INST1
Top patents by PatentIndex Score
15 records- 0192US5616221AElectrolytic ionized water producing apparatusNEC CORP·Filed 1995·Granted Apr 1, 1997·91 cites·14 claims
- 0289US8016916B2Apparatus and method for separating gasJAPAN ATOMIC ENERGY AGENCY·Filed 2008·Granted Sep 13, 2011·23 cites·14 claims
- 0389US7892322B2Apparatus and method for separating gasJAPAN ATOMIC ENERGY AGENCY·Filed 2006·Granted Feb 22, 2011·23 cites·16 claims
- 0489US5720869AEquipment and process for producing high-purity waterORGANO CORP·Filed 1995·Granted Feb 24, 1998·104 cites·23 claims
- 0587US5635053AMethod and apparatus for cleaning electronic partsNEC CORP·Filed 1995·Granted Jun 3, 1997·90 cites·21 claims
- 0683US5593554AElectrolytic ionized water producing apparatusORGANO CORP·Filed 1995·Granted Jan 14, 1997·62 cites·13 claims
- 0763US7938031B2Flow cell, flow cell manufacturing method and particle measurement instrumentRION CO·Filed 2008·Granted May 10, 2011·1 cites·5 claims
- 0861US6530980B2Gas separation apparatusJAPAN ATOMIC ENERGY RES INST·Filed 2001·Granted Mar 11, 2003·9 cites·29 claims
- 0958US7527676B2Unit for separating gasORGANO CORP·Filed 2004·Granted May 5, 2009·7 cites·9 claims
- 1058US6551387B2Gas separation apparatusORGANO CORP·Filed 2001·Granted Apr 22, 2003·9 cites·11 claims
- 1156US6884344B2Hydrogen-dissolved water production apparatusORGANO CORP·Filed 2002·Granted Apr 26, 2005·5 cites·9 claims
- 1248US12218237B2Semiconductor device, and method for manufacturing semiconductor deviceSONY SEMICONDUCTOR SOLUTIONS CORP·Filed 2019·Granted Feb 4, 2025·0 cites·5 claims
- 1348US6702874B2Gas separation apparatus and gas separation methodORGANO CORP·Filed 2001·Granted Mar 9, 2004·4 cites·21 claims
- 1447US2022359706A1Semiconductor device and method of manufacturing semiconductor deviceSONY SEMICONDUCTOR SOLUTIONS CORP·Filed 2020·Application pending·0 cites
- 1535US2003094610A1Wash water or immersion water used during semiconductor manufacturingFiled 2002·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →