Inventor · disambiguated record
Taku Gohira
Also filed as: GOHIRA TAKU
15 granted patents·5 pending applications·45 citations·filing 2014–2025
87Inventor score
Files withTOKYO ELECTRON LTD20
Top patents by PatentIndex Score
20 records- 0196US10410877B2Etching methodTOKYO ELECTRON LTD·Filed 2016·Granted Sep 10, 2019·40 cites·15 claims
- 0292US11804379B2Etching method and plasma processing apparatusTOKYO ELECTRON LTD·Filed 2021·Granted Oct 31, 2023·2 cites·20 claims
- 0373US12080521B2Plasma processing methodTOKYO ELECTRON LTD·Filed 2023·Granted Sep 3, 2024·0 cites·19 claims
- 0471US10714370B2Mounting table and plasma processing apparatusTOKYO ELECTRON LTD·Filed 2014·Granted Jul 14, 2020·3 cites·13 claims
- 0567US11404281B2Method of etching silicon containing films selectively against each otherTOKYO ELECTRON LTD·Filed 2020·Granted Aug 2, 2022·0 cites·5 claims
- 0662US11749508B2Plasma processing methodTOKYO ELECTRON LTD·Filed 2021·Granted Sep 5, 2023·0 cites·16 claims
- 0760US10903084B2Method of etching silicon containing films selectively against each otherTOKYO ELECTRON LTD·Filed 2019·Granted Jan 26, 2021·0 cites·5 claims
- 0859US10304691B2Method of etching silicon oxide and silicon nitride selectively against each otherTOKYO ELECTRON LTD·Filed 2017·Granted May 28, 2019·0 cites·5 claims
- 0958US12272526B2Substrate processing method and substrate processing apparatusTOKYO ELECTRON LTD·Filed 2022·Granted Apr 8, 2025·0 cites·18 claims
- 1058US2024234163A1Etching method and plasma processing apparatusTOKYO ELECTRON LTD·Filed 2024·Application pending·0 cites
- 1157US11342167B2Plasma processing method including cleaning of inside of chamber main body of plasma processing apparatusTOKYO ELECTRON LTD·Filed 2020·Granted May 24, 2022·0 cites·18 claims
- 1255US2025210371A1Substrate processing method and substrate processing apparatusTOKYO ELECTRON LTD·Filed 2025·Application pending·0 cites
- 1349US10714320B2Plasma processing method including cleaning of inside of chamber main body of plasma processing apparatusTOKYO ELECTRON LTD·Filed 2018·Granted Jul 14, 2020·0 cites·7 claims
- 1448US11631590B2Substrate processing method, substrate processing apparatus and cleaning apparatusTOKYO ELECTRON LTD·Filed 2020·Granted Apr 18, 2023·0 cites·14 claims
- 1547US2022059361A1Etching method and plasma processing apparatusTOKYO ELECTRON LTD·Filed 2021·Application pending·0 cites
- 1646US11251049B2Etching method and plasma processing apparatusTOKYO ELECTRON LTD·Filed 2020·Granted Feb 15, 2022·0 cites·11 claims
- 1746US10811275B2Plasma etching method and plasma etching apparatusTOKYO ELECTRON LTD·Filed 2019·Granted Oct 20, 2020·0 cites·15 claims
- 1839US2019043721A1Method of etching multilayered filmTOKYO ELECTRON LTD·Filed 2018·Application pending·0 cites
- 1938US10361070B2Method of processing target objectTOKYO ELECTRON LTD·Filed 2018·Granted Jul 23, 2019·0 cites·13 claims
- 2035US2017330759A1Etching methodTOKYO ELECTRON LTD·Filed 2017·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →