Inventor · disambiguated record
Taku Hirayama
Also filed as: HIRAYAMA TAKU
40 granted patents·14 pending applications·194 citations·filing 1997–2022
96Inventor score
Files withTOKYO OHKA KOGYO CO LTD25HONDA MOTOR CO LTD11HIRAYAMA TAKU8MERCK PATENT GMBH3HIROSAKI TAKAKO2
Top patents by PatentIndex Score
54 records- 0197US7371510B2Material for forming resist protecting film for use in liquid immersion lithography process, composite film, and method for forming resist patternTOKYO OHKA KOGYO CO LTD·Filed 2007·Granted May 13, 2008·44 cites·10 claims
- 0294US7504196B2Positive resist composition, method for resist pattern formation and compoundTOKYO OHKA KOGYO CO LTD·Filed 2006·Granted Mar 17, 2009·21 cites·5 claims
- 0394US7264918B2Resist composition for liquid immersion exposure process and method of forming resist pattern therewithTOKYO OHKA KOGYO CO LTD·Filed 2004·Granted Sep 4, 2007·69 cites·24 claims
- 0492US10101658B2Resist composition and method of forming resist patternTOKYO OHKA KOGYO CO LTD·Filed 2016·Granted Oct 16, 2018·6 cites·20 claims
- 0580US9933065B2Vehicular gear transmission structureHONDA MOTOR CO LTD·Filed 2017·Granted Apr 3, 2018·2 cites·10 claims
- 0679US10324377B2Resist composition and method of forming resist patternTOKYO OHKA KOGYO CO LTD·Filed 2016·Granted Jun 18, 2019·2 cites·8 claims
- 0776US9816003B2Method of producing structure containing phase-separated structureTOKYO OHKA KOGYO CO LTD·Filed 2014·Granted Nov 14, 2017·2 cites·2 claims
- 0874US7527909B2Resist compositionTOKYO OHKA KOGYO CO LTD·Filed 2007·Granted May 5, 2009·9 cites·6 claims
- 0970US9909665B2Gear-shifting mechanism driving deviceHONDA MOTOR CO LTD·Filed 2015·Granted Mar 6, 2018·1 cites·20 claims
- 1069US7862981B2Compound, positive resist composition and method of forming resist patternTOKYO OHKA KOGYO CO LTD·Filed 2006·Granted Jan 4, 2011·1 cites·8 claims
- 1168US7541138B2Resist compositionTOKYO OHKA KOGYO CO LTD·Filed 2007·Granted Jun 2, 2009·6 cites·3 claims
- 1267US10393188B2Vehicle transmission structureHONDA MOTOR CO LTD·Filed 2017·Granted Aug 27, 2019·1 cites·13 claims
- 1367US7851129B2Resist composition, resist pattern forming method and compoundTOKYO OHKA KOGYO CO LTD·Filed 2005·Granted Dec 14, 2010·2 cites·5 claims
- 1467US7673620B2Internal combustion engine with breather chamberHONDA MOTOR CO LTD·Filed 2008·Granted Mar 9, 2010·3 cites·18 claims
- 1565US12242195B2Method for manufacturing cured film and use of the sameMERCK PATENT GMBH·Filed 2020·Granted Mar 4, 2025·0 cites·13 claims
- 1664US9109476B2Lubricating device for power unitHONDA MOTOR CO LTD·Filed 2013·Granted Aug 18, 2015·1 cites·9 claims
- 1762US7923192B2Base material for pattern-forming material, positive resist composition and method of resist pattern formationTOKYO OHKA KOGYO CO LTD·Filed 2005·Granted Apr 12, 2011·1 cites·20 claims
- 1861US7901865B2Resist composition and process for formation of resist patternsTOKYO OHKA KOGYO CO LTD·Filed 2005·Granted Mar 8, 2011·1 cites·15 claims
- 1960US8047167B2Multi-cylinder internal combustion engineHONDA MOTOR CO LTD·Filed 2007·Granted Nov 1, 2011·2 cites·18 claims
- 2057US7501220B2Resist compositionTOKYO OHKA KOGYO CO LTD·Filed 2004·Granted Mar 10, 2009·9 cites·10 claims
- 2153US8051814B2EngineHONDA MOTOR CO LTD·Filed 2008·Granted Nov 8, 2011·1 cites·17 claims
- 2253US2009068586A1Silsesquioxane resin, positive resist composition, resist laminate, and method of forming resist patternTOKYO OHKA KOGYO CO LTD·Filed 2008·Application pending·0 cites
- 2352US10054197B2Shifter gearHONDA MOTOR CO LTD·Filed 2015·Granted Aug 21, 2018·0 cites·16 claims
- 2451US7943284B2Compound, dissolution inhibitor, positive type resist composition, and method of forming resist patternTOKYO OHKA KOGYO CO LTD·Filed 2006·Granted May 17, 2011·0 cites·5 claims
- 2550US10794484B2Transmission structure for vehicleHONDA MOTOR CO LTD·Filed 2017·Granted Oct 6, 2020·0 cites·8 claims
- 2649US8304163B2Compound, dissolution inhibitor, positive type resist composition, and method of forming resist patternSHIONO DAIJU·Filed 2010·Granted Nov 6, 2012·0 cites·1 claims
- 2748US10066096B2Method of producing structure containing phase-separated structure and resin composition for forming phase-separated structureTOKYO OHKA KOGYO CO LTD·Filed 2016·Granted Sep 4, 2018·0 cites·4 claims
- 2847US12281594B2Turbine blade and gas turbineMITSUBISHI HEAVY IND LTD·Filed 2022·Granted Apr 22, 2025·0 cites·8 claims
- 2947US10436320B2Transmission structure for vehicleHONDA MOTOR CO LTD·Filed 2017·Granted Oct 8, 2019·0 cites·20 claims
- 3047US2007281098A1Composition for forming antireflection coatingHIRAYAMA TAKU·Filed 2007·Application pending·0 cites
- 3146US8017300B2Compound, positive resist composition and method for forming resist patternTOKYO OHKA KOGYO CO LTD·Filed 2007·Granted Sep 13, 2011·0 cites·6 claims
- 3244US2022187706A1Thin film resist composition and method for manufacturing resist film using the sameMERCK PATENT GMBH·Filed 2020·Application pending·0 cites
- 3343US9927019B2Power unitHONDA MOTOR CO LTD·Filed 2015·Granted Mar 27, 2018·0 cites·20 claims
- 3443US7960089B2Compound, method for producing same, positive resist composition and method for forming resist patternTOKYO OHKA KOGYO CO LTD·Filed 2006·Granted Jun 14, 2011·0 cites·11 claims
- 3543US5738968APositive photoresist compositionTOKYO OHKA KOGYO CO LTD·Filed 1997·Granted Apr 14, 1998·8 cites·8 claims
- 3643US2006021964A1Composition for forming antireflection coatingHIRAYAMA TAKU·Filed 2005·Application pending·0 cites
- 3742US7981588B2Negative resist composition and method of forming resist patternTOKYO OHKA KOGYO CO LTD·Filed 2006·Granted Jul 19, 2011·0 cites·3 claims
- 3842US7897319B2Positive resist composition and method of forming resist patternTOKYO OHKA KOGYO CO LTD·Filed 2005·Granted Mar 1, 2011·0 cites·9 claims
- 3942US7648816B2Positive resist composition, method for forming resist pattern and compoundTOKYO OHKA KOGYO CO LTD·Filed 2006·Granted Jan 19, 2010·0 cites·5 claims
- 4041US10100221B2Method of producing structure containing phase-separated structure, block copolymer composition, and organic solvent used for block copolymer compositionTOKYO OHKA KOGYO CO LTD·Filed 2016·Granted Oct 16, 2018·0 cites·1 claims
- 4139US2006222866A1Silsesquioxane resin, positive resist composition,layered product including resist and method of forming resist patternNAKAMURA TSUYOSHI·Filed 2004·Application pending·0 cites
- 4239US2007031755A1Material for forming resist-protecting film for immersion exposure process, resist-protecting film made of such material, and method for forming resist pattern using such resist-protec- ting filmTOKO OHKA KOGYO CO LTD·Filed 2004·Application pending·0 cites
- 4338US8389197B2Compound, positive resist composition and resist pattern forming methodHIROSAKI TAKAKO·Filed 2006·Granted Mar 5, 2013·0 cites·8 claims
- 4438US2006110676A1Resist material for liquid immersion lithography process and method for forming resist pattern using the resist materialIWASHITA JYUN·Filed 2004·Application pending·0 cites
- 4537US8206887B2Positive resist composition and resist pattern forming methodHIROSAKI TAKAKO·Filed 2006·Granted Jun 26, 2012·0 cites·10 claims
- 4637US2021263414A1A photoresist composition, a method for manufacturing a photoresist coating, etched photoresist coating, and etched si containing layer(s), and manufacturing a device using thereofMERCK PATENT GMBH·Filed 2019·Application pending·0 cites
- 4737US2007009828A1Positive resist composition, resist laminates and process for forming resist patternsTOKYO OHKA KOGYO CO LTD·Filed 2004·Application pending·0 cites
- 4836US7682770B2Resist composition and method for forming resist patternTOKYO OHKA KOGYO CO LTD·Filed 2004·Granted Mar 23, 2010·2 cites·14 claims
- 4935US2006141400A1Immersion exposure process-use resist protection film forming material, composite film, and resist pattern forming methodHIRAYAMA TAKU·Filed 2004·Application pending·0 cites
- 5034US2009011375A1Immersion liquid for liquid immersion lithography process and method for forming resist pattern using the sameHIRAYAMA TAKU·Filed 2005·Application pending·0 cites
Showing the top 50 of 54 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →