Inventor · disambiguated record
Takashi Hiroi
Also filed as: HIROI TAKASHI · USAMI YASUTSUGU
82 granted patents·13 pending applications·2,429 citations·filing 1985–2021
99Inventor score
Top patents by PatentIndex Score
95 records- 0199US7692144B2Electron beam exposure or system inspection or measurement apparatus and its method and height detection apparatusHITACHI LTD·Filed 2007·Granted Apr 6, 2010·42 cites·15 claims
- 0299US6172363B1Method and apparatus for inspecting integrated circuit patternHITACHI LTD·Filed 1997·Granted Jan 9, 2001·185 cites·20 claims
- 0399US6107637AElectron beam exposure or system inspection or measurement apparatus and its method and height detection apparatusHITACHI LTD·Filed 1998·Granted Aug 22, 2000·147 cites·34 claims
- 0499US5986263AElectron beam inspection method and apparatus and semiconductor manufacturing method and its manufacturing line utilizing the sameHITACHI LTD·Filed 1997·Granted Nov 16, 1999·164 cites·21 claims
- 0597US6329826B1Method and apparatus for inspecting integrated circuit patternHITACHI LTD·Filed 2000·Granted Dec 11, 2001·95 cites·4 claims
- 0696US7417444B2Method and apparatus for inspecting integrated circuit patternHITACHI LTD·Filed 2005·Granted Aug 26, 2008·25 cites·7 claims
- 0796US6388747B2Inspection method, apparatus and system for circuit patternHITACHI LTD·Filed 2001·Granted May 14, 2002·62 cites·2 claims
- 0896US6333510B1Electron beam exposure or system inspection of measurement apparatus and its method and height detection apparatusHITACHI LTD·Filed 2000·Granted Dec 25, 2001·44 cites·12 claims
- 0995US7329889B2Electron beam apparatus and method with surface height calculator and a dual projection optical unitHITACHI LTD·Filed 2005·Granted Feb 12, 2008·17 cites·6 claims
- 1095US6759655B2Inspection method, apparatus and system for circuit patternHITACHI LTD·Filed 2001·Granted Jul 6, 2004·74 cites·4 claims
- 1194US8212227B2Electron beam exposure or system inspection or measurement apparatus and its method and height detection apparatusWATANABE MASAHIRO·Filed 2010·Granted Jul 3, 2012·12 cites·10 claims
- 1294US6753518B2Electron beam exposure or system inspection or measurement apparatus and its method and height detection apparatusHITACHI LTD·Filed 2001·Granted Jun 22, 2004·35 cites·17 claims
- 1393US7728294B2Semiconductor wafer inspection tool and semiconductor wafer inspection methodHITACHI HIGH TECH CORP·Filed 2007·Granted Jun 1, 2010·18 cites·12 claims
- 1493US6567168B2Inspection method, apparatus and system for circuit patternHITACHI LTD·Filed 2001·Granted May 20, 2003·38 cites·4 claims
- 1592US6919577B2Electron beam exposure or system inspection or measurement apparatus and its method and height detection apparatusHITACHI LTD·Filed 2004·Granted Jul 19, 2005·25 cites·17 claims
- 1692US6587581B1Visual inspection method and apparatus thereforHITACHI LTD·Filed 1998·Granted Jul 1, 2003·118 cites·59 claims
- 1792US6172365B1Electron beam inspection method and apparatus and semiconductor manufacturing method and its manufacturing line utilizing the sameHITACHI LTD·Filed 1999·Granted Jan 9, 2001·48 cites·10 claims
- 1891US8421010B2Charged particle beam device for scanning a sample using a charged particle beam to inspect the sampleHIROI TAKASHI·Filed 2009·Granted Apr 16, 2013·16 cites·10 claims
- 1991US7521676B2Method and apparatus for inspecting pattern defects and mirror electron projection type or multi-beam scanning type electron beam apparatusHITACHI HIGH TECH CORP·Filed 2006·Granted Apr 21, 2009·16 cites·19 claims
- 2091US6493082B2Inspection method, apparatus and system for circuit patternHITACHI LTD·Filed 2002·Granted Dec 10, 2002·35 cites·4 claims
- 2191US6373054B2Electron beam inspection method and apparatus and semiconductor manufacturing method and its manufacturing line utilizing the sameHITACHI LTD·Filed 2001·Granted Apr 16, 2002·23 cites·22 claims
- 2290US7952074B2Method and apparatus for inspecting integrated circuit patternHITACHI LTD·Filed 2008·Granted May 31, 2011·8 cites·18 claims
- 2390US5153444AMethod and apparatus for detecting patternsHITACHI LTD·Filed 1991·Granted Oct 6, 1992·92 cites·26 claims
- 2489US6476913B1Inspection method, apparatus and system for circuit patternHITACHI LTD·Filed 1999·Granted Nov 5, 2002·59 cites·11 claims
- 2588US9858659B2Pattern inspecting and measuring device and programHITACHI HIGH TECH CORP·Filed 2013·Granted Jan 2, 2018·9 cites·16 claims
- 2688US6614923B1Pattern inspecting method and apparatus thereof, and pattern inspecting method on basis of electron beam images and apparatus thereofHITACHI LTD·Filed 1999·Granted Sep 2, 2003·49 cites·30 claims
- 2788US6480279B2Inspection method, apparatus and system for circuit patternHITACHI LTD·Filed 2001·Granted Nov 12, 2002·23 cites·2 claims
- 2888US4772125AApparatus and method for inspecting soldered portionsHITACHI LTD·Filed 1986·Granted Sep 20, 1988·82 cites·6 claims
- 2987US6919564B2Inspection method, apparatus and system for circuit patternHITACHI LTD·Filed 2002·Granted Jul 19, 2005·23 cites·1 claims
- 3087US6717142B2Electron beam inspection method and apparatus and semiconductor manufacturing method and its manufacturing line utilizing the sameHITACHI LTD·Filed 2002·Granted Apr 6, 2004·16 cites·15 claims
- 3187US6335532B1Convergent charged particle beam apparatus and inspection method using sameHITACHI LTD·Filed 1999·Granted Jan 1, 2002·38 cites·3 claims
- 3287US5649022APattern checking method and checking apparatusHITACHI LTD·Filed 1992·Granted Jul 15, 1997·79 cites·43 claims
- 3387US5430548AMethod and apparatus for pattern detectionHITACHI LTD·Filed 1993·Granted Jul 4, 1995·70 cites·7 claims
- 3486US7133550B2Pattern inspection method and apparatusHITACHI LTD·Filed 2001·Granted Nov 7, 2006·19 cites·15 claims
- 3586US6898305B2Circuit pattern inspection method and apparatusHITACHI LTD·Filed 2001·Granted May 24, 2005·40 cites·24 claims
- 3686US6087673AMethod of inspecting pattern and apparatus thereofHITACHI LTD·Filed 1998·Granted Jul 11, 2000·58 cites·29 claims
- 3785US8853628B2Defect inspection method, and device thereofHOSOYA NAOKI·Filed 2011·Granted Oct 7, 2014·8 cites·10 claims
- 3885US7116816B2Method of inspecting a pattern and an apparatus thereof and a method of processing a specimenHITACHI LTD·Filed 2001·Granted Oct 3, 2006·41 cites·23 claims
- 3985US6657221B2Image classification method, observation method, and apparatus thereof with different stage moving velocitiesHITACHI LTD·Filed 2001·Granted Dec 2, 2003·24 cites·8 claims
- 4085US6559663B2Method and apparatus for inspecting integrated circuit patternHITACHI LTD·Filed 2001·Granted May 6, 2003·20 cites·10 claims
- 4184US9188554B2Pattern inspection device and pattern inspection methodHITACHI HIGH TECH CORP·Filed 2013·Granted Nov 17, 2015·6 cites·18 claims
- 4284US7439504B2Pattern inspection method and apparatus using electron beamHITACHI LTD·Filed 2005·Granted Oct 21, 2008·6 cites·4 claims
- 4384US7026830B2Method and apparatus for inspecting integrated circuit patternHITACHI LTD·Filed 2003·Granted Apr 11, 2006·19 cites·6 claims
- 4484US6559459B2Convergent charged particle beam apparatus and inspection method using sameHITACHI LTD·Filed 2001·Granted May 6, 2003·14 cites·11 claims
- 4583US11788973B2Defect inspection device and defect inspection methodHITACHI HIGH TECH CORP·Filed 2019·Granted Oct 17, 2023·2 cites·10 claims
- 4683US7957579B2Pattern inspection method and apparatusHITACHI LTD·Filed 2007·Granted Jun 7, 2011·5 cites·11 claims
- 4783US7894658B2Pattern inspection method and apparatusHITACHI LTD·Filed 2007·Granted Feb 22, 2011·4 cites·17 claims
- 4883US6828554B2Electron beam inspection method and apparatus and semiconductor manufacturing method and its manufacturing line utilizing the sameHITACHI LTD·Filed 2004·Granted Dec 7, 2004·11 cites·8 claims
- 4982US7532328B2Circuit-pattern inspection apparatusHITACHI HIGH TECH CORP·Filed 2007·Granted May 12, 2009·7 cites·3 claims
- 5082US6903821B2Inspection method, apparatus and system for circuit patternHITACHI LTD·Filed 2002·Granted Jun 7, 2005·15 cites·6 claims
Showing the top 50 of 95 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →