Inventor · disambiguated record
Takanobu Hotta
Also filed as: HOTTA TAKANOBU
16 granted patents·8 pending applications·35 citations·filing 2011–2025
89Inventor score
Top patents by PatentIndex Score
24 records- 0192US12188125B2Showerhead and substrate processing apparatusTOKYO ELECTRON LTD·Filed 2022·Granted Jan 7, 2025·2 cites·8 claims
- 0291US9536782B2Tungsten film forming method, semiconductor device manufacturing method, and storage mediumTOKYO ELECTRON LTD·Filed 2015·Granted Jan 3, 2017·9 cites·7 claims
- 0385US10026616B2Method of reducing stress in metal film and metal film forming methodTOKYO ELECTRON LTD·Filed 2016·Granted Jul 17, 2018·4 cites·21 claims
- 0485US9472454B2Tungsten film forming methodTOKYO ELECTRON LTD·Filed 2015·Granted Oct 18, 2016·5 cites·10 claims
- 0584US9640404B2Method of forming tungsten filmTOKYO ELECTRON LTD·Filed 2016·Granted May 2, 2017·4 cites·13 claims
- 0684US9536745B2Tungsten film forming methodTOKYO ELECTRON LTD·Filed 2016·Granted Jan 3, 2017·5 cites·18 claims
- 0783US10872814B2Film forming method and film forming apparatusTOKYO ELECTRON LTD·Filed 2019·Granted Dec 22, 2020·3 cites·8 claims
- 0874US9938620B2Gas supply mechanism, gas supplying method, film forming apparatus and film forming method using the sameTOKYO ELECTRON LTD·Filed 2015·Granted Apr 10, 2018·1 cites·9 claims
- 0970US12221693B2Stress reducing methodTOKYO ELECTRON LTD·Filed 2023·Granted Feb 11, 2025·0 cites·8 claims
- 1067US10131986B2Method of forming metal filmTOKYO ELECTRON LTD·Filed 2016·Granted Nov 20, 2018·1 cites·11 claims
- 1166US10400330B2Tungsten film forming method and storage mediumTOKYO ELECTRON LTD·Filed 2017·Granted Sep 3, 2019·1 cites·18 claims
- 1266US2025354259A1Film formation apparatus, film formation method, and substrate support memberTOKYO ELECTRON LTD·Filed 2025·Application pending·0 cites
- 1365US12227843B2Film forming method and tungsten filmTOKYO ELECTRON LTD·Filed 2023·Granted Feb 18, 2025·0 cites·17 claims
- 1453US2023062123A1Apparatus for forming film on substrate and method for forming film on substrateTOKYO ELECTRON LTD·Filed 2022·Application pending·0 cites
- 1549US10910225B2Film forming methodTOKYO ELECTRON LTD·Filed 2018·Granted Feb 2, 2021·0 cites·6 claims
- 1646US11629404B2Method of forming tungsten film and controllerTOKYO ELECTRON LTD·Filed 2019·Granted Apr 18, 2023·0 cites·11 claims
- 1745US11984319B2Substrate processing method and film forming systemTOKYO ELECTRON LTD·Filed 2020·Granted May 14, 2024·0 cites·16 claims
- 1845US2021010130A1Substrate processing method and substrate processing apparatusTOKYO ELECTRON LTD·Filed 2020·Application pending·0 cites
- 1945US2023212738A1Method and device for forming tungsten film, and device for forming intermediate film before forming tungsten filmTOKYO ELECTRON LTD·Filed 2021·Application pending·0 cites
- 2043US2016379879A1Tungsten film forming methodTOKYO ELECTRON LTD·Filed 2014·Application pending·0 cites
- 2143US2022356581A1Gas supply device and gas supply methodTOKYO ELECTRON LTD·Filed 2020·Application pending·0 cites
- 2242US2016040287A1Tungsten Film Forming MethodTOKYO ELECTRON LTD·Filed 2015·Application pending·0 cites
- 2340US11753719B2Flow rate control method, flow rate control device, and film forming apparatusTOKYO ELECTRON LTD·Filed 2019·Granted Sep 12, 2023·0 cites·8 claims
- 2435US2012034793A1Method for forming metal nitride filmNARUSHIMA KENSAKU·Filed 2011·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →