Inventor · disambiguated record
Takayuki Katsunuma
Also filed as: KATSUNUMA TAKAYUKI
38 granted patents·10 pending applications·408 citations·filing 2002–2025
96Inventor score
Top patents by PatentIndex Score
48 records- 0197US10090191B2Selective plasma etching method of a first region containing a silicon atom and an oxygen atomTOKYO ELECTRON LTD·Filed 2015·Granted Oct 2, 2018·39 cites·20 claims
- 0297US8703002B2Plasma processing apparatus, plasma processing method and storage mediumTOKYO ELECTRON LTD·Filed 2013·Granted Apr 22, 2014·343 cites·8 claims
- 0392US11664236B2Method of etching film and plasma processing apparatusTOKYO ELECTRON LTD·Filed 2021·Granted May 30, 2023·2 cites·20 claims
- 0492US10923360B2Method of etching film and plasma processing apparatusTOKYO ELECTRON LTD·Filed 2018·Granted Feb 16, 2021·6 cites·28 claims
- 0584US10811274B2Etching method and plasma processing apparatusTOKYO ELECTRON LTD·Filed 2018·Granted Oct 20, 2020·3 cites·16 claims
- 0682US12112954B2Etching method, substrate processing apparatus, and substrate processing systemTOKYO ELECTRON LTD·Filed 2021·Granted Oct 8, 2024·1 cites·20 claims
- 0780US12334343B2Substrate processing method and substrate processing systemTOKYO ELECTRON LTD·Filed 2024·Granted Jun 17, 2025·0 cites·18 claims
- 0879US9735027B2Method for etching organic filmTOKYO ELECTRON LTD·Filed 2016·Granted Aug 15, 2017·3 cites·5 claims
- 0979US9396962B2Etching methodTOKYO ELECTRON LTD·Filed 2015·Granted Jul 19, 2016·3 cites·3 claims
- 1075US10916442B2Etching methodTOKYO ELECTRON LTD·Filed 2018·Granted Feb 9, 2021·1 cites·30 claims
- 1171US9087676B2Plasma processing method and plasma processing apparatusTOKYO ELECTRON LTD·Filed 2014·Granted Jul 21, 2015·2 cites·7 claims
- 1271US9048178B2Plasma etching method and semiconductor device manufacturing methodKUBOTA KAZUHIRO·Filed 2012·Granted Jun 2, 2015·3 cites·12 claims
- 1367US12354837B2Plasma processing method and plasma processing apparatusTOKYO ELECTRON LTD·Filed 2023·Granted Jul 8, 2025·0 cites·18 claims
- 1467US11417527B2Method and device for controlling a thickness of a protective film on a substrateTOKYO ELECTRON LTD·Filed 2020·Granted Aug 16, 2022·0 cites·20 claims
- 1567US9330930B2Plasma etching method and semiconductor device manufacturing methodTOKYO ELECTRON LTD·Filed 2015·Granted May 3, 2016·1 cites·10 claims
- 1667US2022375764A1Method and apparatus for controlling a shape of a pattern over a substrateTOKYO ELECTRON LTD·Filed 2022·Application pending·0 cites
- 1767US2022344158A1Method and device for controlling a thickness of a protective film on a substrateTOKYO ELECTRON LTD·Filed 2022·Application pending·0 cites
- 1866US12154792B2Plasma etching methodTOKYO ELECTRON LTD·Filed 2020·Granted Nov 26, 2024·0 cites·5 claims
- 1965US2021134604A1Etching methodTOKYO ELECTRON LTD·Filed 2021·Application pending·0 cites
- 2062US11955337B2Substrate processing method and substrate processing systemTOKYO ELECTRON LTD·Filed 2019·Granted Apr 9, 2024·0 cites·8 claims
- 2162US8735299B2Semiconductor device manufacturing method and computer-readable storage mediumWATANABE SEIICHI·Filed 2012·Granted May 27, 2014·1 cites·9 claims
- 2262US2024355590A1Plasma processing method and plasma processing apparatusTOKYO ELECTRON LTD·Filed 2024·Application pending·0 cites
- 2362US2020111679A1Etching methodTOKYO ELECTRON LTD·Filed 2019·Application pending·0 cites
- 2460US11443954B2Method and apparatus for controlling a shape of a pattern over a substrateTOKYO ELECTRON LTD·Filed 2019·Granted Sep 13, 2022·0 cites·18 claims
- 2560US10854470B2Plasma etching methodTOKYO ELECTRON LTD·Filed 2018·Granted Dec 1, 2020·0 cites·17 claims
- 2658US12334331B2Substrate processing method and plasma processing apparatusTOKYO ELECTRON LTD·Filed 2021·Granted Jun 17, 2025·0 cites·17 claims
- 2757US11969575B2Medical infusion pump, method of controlling medical infusion pump, and medical infusion pump systemTERUMO CORP·Filed 2022·Granted Apr 30, 2024·0 cites·16 claims
- 2857US11501975B2Substrate processing method and substrate processing apparatusTOKYO ELECTRON LTD·Filed 2020·Granted Nov 15, 2022·0 cites·17 claims
- 2957US2025095991A1Etching method and plasma processing apparatusTOKYO ELECTRON LTD·Filed 2024·Application pending·0 cites
- 3056US11955316B2Substrate processing method, method for manufacturing semiconducor device, and plasma processing apparatusTOKYO ELECTRON LTD·Filed 2020·Granted Apr 9, 2024·0 cites·15 claims
- 3156US9899232B2Etching methodTOKYO ELECTRON LTD·Filed 2016·Granted Feb 20, 2018·0 cites·12 claims
- 3254US11476123B2Etching method, plasma processing apparatus, and substrate processing systemTOKYO ELECTRON LTD·Filed 2020·Granted Oct 18, 2022·0 cites·19 claims
- 3354US10541147B2Etching methodTOKYO ELECTRON LTD·Filed 2016·Granted Jan 21, 2020·0 cites·11 claims
- 3453US2023058079A1Etching method, plasma processing apparatus, and substrate processing systemTOKYO ELECTRON LTD·Filed 2022·Application pending·0 cites
- 3553US2009047795A1Plasma processing apparatus, plasma processing method and storage mediumTOKYO ELECTRON LTD·Filed 2008·Application pending·0 cites
- 3652US11637003B2Method for etching film and plasma processing apparatusTOKYO ELECTRON LTD·Filed 2020·Granted Apr 25, 2023·0 cites·19 claims
- 3752US10854430B2Plasma etching methodTOKYO ELECTRON LTD·Filed 2017·Granted Dec 1, 2020·0 cites·19 claims
- 3851US11264236B2Substrate processing methodTOKYO ELECTRON LTD·Filed 2019·Granted Mar 1, 2022·0 cites·11 claims
- 3951US11114304B2Substrate processing methodTOKYO ELECTRON LTD·Filed 2019·Granted Sep 7, 2021·0 cites·20 claims
- 4050US11617830B2Medical pump, method of controlling medical pump, and medical pump systemTERUMO CORP·Filed 2020·Granted Apr 4, 2023·0 cites·20 claims
- 4150US9318340B2Method of manufacturing a semiconductor deviceTOKYO ELECTRON LTD·Filed 2012·Granted Apr 19, 2016·0 cites·5 claims
- 4250US2025149299A1Plasma processing system, assistance device, assistance method, and assistance programTOKYO ELECTRON LTD·Filed 2025·Application pending·0 cites
- 4348US9881806B2Method of manufacturing a semiconductor deviceTOKYO ELECTRON LTD·Filed 2016·Granted Jan 30, 2018·0 cites·8 claims
- 4446US10195339B2Fluidic pumpTERUMO CORP·Filed 2015·Granted Feb 5, 2019·0 cites·10 claims
- 4544US9147580B2Plasma etching method and plasma processing apparatusTOKYO ELECTRON LTD·Filed 2013·Granted Sep 29, 2015·0 cites·7 claims
- 4639US9460897B2Plasma etching method and plasma etching apparatusTOKYO ELECTRON LTD·Filed 2015·Granted Oct 4, 2016·0 cites·15 claims
- 4738US7189653B2Etching method and etching apparatusTOKYO ELECTRON LTD·Filed 2003·Granted Mar 13, 2007·0 cites·15 claims
- 4836US2003102087A1Plasma processing apparatus and processing methodFiled 2002·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →