Inventor · disambiguated record
Takehiro Kondoh
Also filed as: KONDOH TAKEHIRO
11 granted patents·9 pending applications·37 citations·filing 2001–2020
86Inventor score
Top patents by PatentIndex Score
20 records- 0185US8975178B2Method of manufacturing a memory device using fine patterning techniquesKIKUTANI KEISUKE·Filed 2012·Granted Mar 10, 2015·8 cites·20 claims
- 0279US8097398B2Method for manufacturing semiconductor deviceKONDOH TAKEHIRO·Filed 2009·Granted Jan 17, 2012·8 cites·20 claims
- 0372US7662542B2Pattern forming method and semiconductor device manufacturing methodTOSHIBA KK·Filed 2006·Granted Feb 16, 2010·4 cites·12 claims
- 0471US7527918B2Pattern forming method and method for manufacturing a semiconductor deviceTOSHIBA KK·Filed 2004·Granted May 5, 2009·11 cites·6 claims
- 0567US7851139B2Pattern forming methodTOSHIBA KK·Filed 2008·Granted Dec 14, 2010·2 cites·17 claims
- 0663US9543310B2Semiconductor storage device having communicated air gaps between adjacent memory cellsTOSHIBA KK·Filed 2014·Granted Jan 10, 2017·1 cites·6 claims
- 0759US8148054B2Immersion multiple-exposure method and immersion exposure system for separately performing multiple exposure of micropatterns and non-micropatternsKONDOH TAKEHIRO·Filed 2008·Granted Apr 3, 2012·1 cites·10 claims
- 0855US11373865B2Method for manufacturing semiconductor device having a film with layers of different concentrations of elementsKIOXIA CORP·Filed 2020·Granted Jun 28, 2022·0 cites·16 claims
- 0954US11367624B2Manufacturing method of semiconductor deviceKIOXIA CORP·Filed 2020·Granted Jun 21, 2022·0 cites·19 claims
- 1049US6660455B2Pattern formation material, pattern formation method, and exposure mask fabrication methodTOSHIBA KK·Filed 2001·Granted Dec 9, 2003·2 cites·12 claims
- 1148US9280049B2Pattern formation method and semiconductor deviceTOSHIBA KK·Filed 2014·Granted Mar 8, 2016·0 cites·15 claims
- 1245US2016020099A1Pattern forming method and method of manufacturing semiconductor deviceTOSHIBA KK·Filed 2014·Application pending·0 cites
- 1344US2012154771A1Immersion multiple-exposure method and immersion exposure system for separately performing multiple exposure of micropatterns and non-micropatternsKONDOH TAKEHIRO·Filed 2012·Application pending·0 cites
- 1443US2015056811A1Stacked structure body and pattern formation methodTOSHIBA KK·Filed 2014·Application pending·0 cites
- 1542US2008138746A1Pattern formation method using fine pattern formation material for use in semiconductor fabrication stepKONDOH TAKEHIRO·Filed 2007·Application pending·0 cites
- 1642US2008289656A1Substrate processing method and substrate processing apparatusKONDOH TAKEHIRO·Filed 2008·Application pending·0 cites
- 1741US2004058279A1Pattern formation material, pattern formation method, and exposure mask fabrication methodTOSHIBA KK·Filed 2003·Application pending·0 cites
- 1840US2007010028A1Chemical solution qualification method, semiconductor device fabrication method, and liquid crystal display manufacturing methodKONDOH TAKEHIRO·Filed 2006·Application pending·0 cites
- 1935US2018275519A1Pattern Formation MethodTOSHIBA MEMORY CORP·Filed 2017·Application pending·0 cites
- 2033US2016313644A1Pattern formation methodTOSHIBA KK·Filed 2015·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →