Inventor · disambiguated record
Takenobu Matsuo
Also filed as: MATSUO TAKENOBU
21 granted patents·2 pending applications·520 citations·filing 1992–2004
96Inventor score
Files withTOKYO ELECTRON LTD21
Top patents by PatentIndex Score
23 records- 0194US5718763AResist processing apparatus for a rectangular substrateTOKYO ELECTRON LTD·Filed 1995·Granted Feb 17, 1998·154 cites·7 claims
- 0285US5441076AProcessing apparatus using gasTOKYO ELECTRON LTD·Filed 1994·Granted Aug 15, 1995·51 cites·21 claims
- 0384US6756565B2Thermal insulator having a honeycomb structure and heat recycle system using the thermal insulatorTOKYO ELECTRON LTD·Filed 2001·Granted Jun 29, 2004·24 cites·6 claims
- 0483US5439026AProcessing apparatus and flow control arrangement thereforTOKYO ELECTRON LTD·Filed 1993·Granted Aug 8, 1995·81 cites·7 claims
- 0572US5307568AGas supply systemTOKYO ELECTRON LTD·Filed 1992·Granted May 3, 1994·51 cites·10 claims
- 0670US6716329B2Processing apparatus and processing systemTOKYO ELECTRON LTD·Filed 2001·Granted Apr 6, 2004·6 cites·7 claims
- 0768US6949719B2Thermal insulator having a honeycomb structure and heat recycle system using the thermal insulatorTOKYO ELECTRON LTD·Filed 2004·Granted Sep 27, 2005·10 cites·14 claims
- 0865US5359148AHeat-treating apparatusTOKYO ELECTRON LTD·Filed 1993·Granted Oct 25, 1994·36 cites·16 claims
- 0961US5445521AHeat treating method and deviceTOKYO ELECTRON LTD·Filed 1994·Granted Aug 29, 1995·21 cites·4 claims
- 1057US6634370B2Liquid treatment system and liquid treatment methodTOKYO ELECTRON LTD·Filed 2001·Granted Oct 21, 2003·6 cites·11 claims
- 1157US5514196AAir cleaning apparatusTOKYO ELECTRON LTD·Filed 1994·Granted May 7, 1996·29 cites·15 claims
- 1252US7112268B2Plating device and plating methodTOKYO ELECTRON LTD·Filed 2002·Granted Sep 26, 2006·3 cites·16 claims
- 1350US5853803AResist processing method and apparatusTOKYO ELECTRON LTD·Filed 1997·Granted Dec 29, 1998·12 cites·7 claims
- 1449US5421365AFlow control apparatusTOKYO ELECTRON LTD·Filed 1993·Granted Jun 6, 1995·15 cites·11 claims
- 1547US6740164B2Plating apparatus and method of manufacturing semiconductor deviceTOKYO ELECTRON LTD·Filed 2002·Granted May 25, 2004·1 cites·6 claims
- 1644US6641709B2Mist trap mechanism and method for plating apparatusTOKYO ELECTRON LTD·Filed 2002·Granted Nov 4, 2003·0 cites·6 claims
- 1743US6953522B2Liquid treatment method using alternating electrical contactsTOKYO ELECTRON LTD·Filed 2001·Granted Oct 11, 2005·0 cites·2 claims
- 1843US2004053509A1Fluid treatment systemFiled 2002·Application pending·0 cites
- 1942US5294280AGas measuring device and processing apparatus provided with the gas measuring deviceTOKYO ELECTRON LTD·Filed 1992·Granted Mar 15, 1994·9 cites·10 claims
- 2035US6337365B1Electronic/electric components used in clean room and substrate treatment apparatusTOKYO ELECTRON LTD·Filed 1998·Granted Jan 8, 2002·5 cites·14 claims
- 2135US2001037945A1Liquid treatment equipment and liquid treatment methodFiled 2001·Application pending·0 cites
- 2234US6403498B1Method and device for treating substrateTOKYO ELECTRON LTD·Filed 1998·Granted Jun 11, 2002·4 cites·23 claims
- 2331US6077894AInstrument and mounting equipment used in clean roomTOKYO ELECTRON LTD·Filed 1997·Granted Jun 20, 2000·2 cites·23 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →