Inventor · disambiguated record
Takahiro Miyahara
Also filed as: MIYAHARA TAKAHIRO
13 granted patents·4 pending applications·18 citations·filing 2008–2020
85Inventor score
Top patents by PatentIndex Score
17 records- 0188US10312078B2Nitride film forming method and storage mediumTOKYO ELECTRON LTD·Filed 2017·Granted Jun 4, 2019·6 cites·11 claims
- 0274US8808452B2Silicon film formation apparatus and method for using sameNORO NAOTAKA·Filed 2010·Granted Aug 19, 2014·6 cites·9 claims
- 0373US9293323B2Method of forming silicon filmTOKYO ELECTRON LTD·Filed 2013·Granted Mar 22, 2016·3 cites·9 claims
- 0470US10304676B2Method and apparatus for forming nitride filmTOKYO ELECTRON LTD·Filed 2017·Granted May 28, 2019·1 cites·24 claims
- 0567US9777366B2Thin film forming methodTOKYO ELECTRON LTD·Filed 2015·Granted Oct 3, 2017·1 cites·1 claims
- 0665US9145604B2Thin film forming method and film forming apparatusTOKYO ELECTRON LTD·Filed 2012·Granted Sep 29, 2015·1 cites·22 claims
- 0755US10672617B2Etching method and etching apparatusTOKYO ELECTRON LTD·Filed 2018·Granted Jun 2, 2020·0 cites·6 claims
- 0851US10475665B2Heating method, film forming method, semiconductor device manufacturing method, and film forming apparatusTOKYO ELECTRON LTD·Filed 2018·Granted Nov 12, 2019·0 cites·9 claims
- 0949US9985309B2High-molecular-weight electrolyte and use thereofKANEKA CORP·Filed 2012·Granted May 29, 2018·0 cites·14 claims
- 1046US7923357B2Method for forming poly-silicon filmTOKYO ELECTRON LTD·Filed 2008·Granted Apr 12, 2011·0 cites·11 claims
- 1145US9972486B2Nitride film forming method and storage mediumTOKYO ELECTRON LTD·Filed 2017·Granted May 15, 2018·0 cites·11 claims
- 1243US9263256B2Method of forming seed layer, method of forming silicon film, and film forming apparatusTOKYO ELECTRON LTD·Filed 2013·Granted Feb 16, 2016·0 cites·11 claims
- 1343US2017117145A1Boron nitride film forming method and semiconductor device manufacturing methodTOKYO ELECTRON LTD·Filed 2016·Application pending·0 cites
- 1439US2020263295A1Film forming method, method for cleaning processing chamber for film formation, and film forming apparatusTOKYO ELECTRON LTD·Filed 2020·Application pending·0 cites
- 1537US2018090319A1Hard mask and manufacturing method thereofTOKYO ELECTRON LTD·Filed 2017·Application pending·0 cites
- 1637US2018090311A1Boron film, boron film forming method, hard mask, and hard mask manufacturing methodTOKYO ELECTRON LTD·Filed 2017·Application pending·0 cites
- 1734US9390907B2Film forming method of SiCN filmTOKYO ELECTRON LTD·Filed 2015·Granted Jul 12, 2016·0 cites·6 claims
Join the waitlist — get patent alerts
Get an alert when Takahiro Miyahara files or is granted a new patent.
We store only your email — no account needed. See our privacy policy.
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →