Inventor · disambiguated record
Takanori Miyazaki
Also filed as: MIYAZAKI TAKANORI
21 granted patents·9 pending applications·523 citations·filing 1992–2023
95Inventor score
Files withTOKYO ELECTRON LTD12TOSOH CORP7MITSUBISHI ELECTRIC CORP6ISHIKAWA SHINICHI1MATSUMOTO NAOKI1
Top patents by PatentIndex Score
30 records- 0195US6589338B1Device for processing substrateTOKYO ELECTRON LTD·Filed 2000·Granted Jul 8, 2003·110 cites·17 claims
- 0291US9172045B24-aminocarbazole compound and use thereofTOSOH CORP·Filed 2012·Granted Oct 27, 2015·10 cites·15 claims
- 0388US9698352B2Amine compound and use thereofTOSOH CORP·Filed 2013·Granted Jul 4, 2017·5 cites·6 claims
- 0488US6827814B2Processing apparatus, processing system and processing methodTOKYO ELECTRON LTD·Filed 2001·Granted Dec 7, 2004·45 cites·27 claims
- 0585US5370142ASubstrate washing deviceTOKYO ELECTRON LTD·Filed 1993·Granted Dec 6, 1994·99 cites·15 claims
- 0684US6115867AApparatus for cleaning both sides of substrateTOKYO ELECTRON LTD·Filed 1998·Granted Sep 12, 2000·68 cites·12 claims
- 0782US8344284B2Laser machining nozzleMITSUBISHI ELECTRIC CORP·Filed 2008·Granted Jan 1, 2013·8 cites·9 claims
- 0877US9650565B2Carbazole compound and use thereofMATSUMOTO NAOKI·Filed 2010·Granted May 16, 2017·2 cites·1 claims
- 0977US6554010B1Substrate cleaning tool, having permeable cleaning headTOKYO ELECTRON LTD·Filed 2000·Granted Apr 29, 2003·23 cites·21 claims
- 1074US2025376559A1Halogenated polymer and method for producing sameTOSOH CORP·Filed 2023·Application pending·0 cites
- 1170US5299584ACleaning deviceTOKYO ELECTRON LTD·Filed 1992·Granted Apr 5, 1994·59 cites·9 claims
- 1268US8993805B2Benzofluorene compound and use thereofNISHIYAMA MASAKAZU·Filed 2007·Granted Mar 31, 2015·4 cites·18 claims
- 1361US2024278352A1Laser machining apparatus and laser machining methodMITSUBISHI ELECTRIC CORP·Filed 2021·Application pending·0 cites
- 1461US2024375214A1Laser machining apparatus and laser machining methodMITSUBISHI ELECTRIC CORP·Filed 2021·Application pending·0 cites
- 1560US6491760B2Scrub washing methodTOKYO ELECTRON LTD·Filed 2001·Granted Dec 10, 2002·6 cites·5 claims
- 1656US2023201958A1Laser processing apparatus and laser processing methodMITSUBISHI ELECTRIC CORP·Filed 2020·Application pending·0 cites
- 1755US2011147351A1Laser processing apparatus and laser processing methodMITSUBISHI ELECTRIC CORP·Filed 2009·Application pending·0 cites
- 1854US6292972B1Scrub washing apparatus and scrub washing methodTOKYO ELECTRON LTD·Filed 1999·Granted Sep 25, 2001·17 cites·11 claims
- 1952US7803953B2Catalyst for producing arylamine and process for producing arylamine by means thereofTOSOH CORP·Filed 2007·Granted Sep 28, 2010·0 cites·3 claims
- 2051US6178580B1Processing apparatusTOKYO ELECTRON LTD·Filed 1999·Granted Jan 30, 2001·17 cites·16 claims
- 2151US2024001334A1Active hydrogen-containing organic compound scavenger, composition, and applications thereofTOSOH CORP·Filed 2021·Application pending·0 cites
- 2250US5431179AWafer drying apparatus and fire-extinguishing method thereforTOKYO ELECTRON LTD·Filed 1994·Granted Jul 11, 1995·21 cites·10 claims
- 2349US10246393B2Method for producing aromatic compoundTOSOH CORP·Filed 2017·Granted Apr 2, 2019·0 cites·3 claims
- 2449US5361787ACleaning apparatusTOKYO ELECTRON LTD·Filed 1993·Granted Nov 8, 1994·19 cites·4 claims
- 2544US2006186797A1Pi-conjugated compound having cardo structure, process for preparing same and use of sameTOSOH CORP·Filed 2006·Application pending·0 cites
- 2643US8846214B2Amine derivative and organic electroluminescent elementISHIKAWA SHINICHI·Filed 2010·Granted Sep 30, 2014·0 cites·4 claims
- 2743US6652662B1Substrate surface processing apparatus and methodTOKYO ELECTRON LTD·Filed 1999·Granted Nov 25, 2003·10 cites·18 claims
- 2843US2012160818A1Laser machining apparatus and laser machining methodMIYAZAKI TAKANORI·Filed 2011·Application pending·0 cites
- 2942US9095953B2Apparatus for polishing rear surface of substrate, system for polishing rear surface of substrate, method for polishing rear surface of substrate and recording medium having program for polishing rear surface of substrateNAKAMORI MITSUNORI·Filed 2011·Granted Aug 4, 2015·0 cites·9 claims
- 3040US2018093348A1Laser beam machine, machining facility, setting apparatus, program and setting methodMITSUBISHI ELECTRIC CORP·Filed 2016·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →