Inventor · disambiguated record
Tamotsu Morimoto
Also filed as: MORIMOTO TAMOTSU
17 granted patents·21 pending applications·174 citations·filing 1995–2024
92Inventor score
Top patents by PatentIndex Score
38 records- 0196US6514377B1Apparatus for and method of processing an object to be processedTOKYO ELECTRON LTD·Filed 2000·Granted Feb 4, 2003·98 cites·10 claims
- 0292US12444606B2Methods for forming vertically layered ionic liquid crystal (ILC) structures on a semiconductor substrateTOKYO ELECTRON LTD·Filed 2023·Granted Oct 14, 2025·2 cites·20 claims
- 0391US12398324B1Methods for controlling the pitch of self-assembled ionic liquid crystal (ILC) structuresTOKYO ELECTRON LTD·Filed 2024·Granted Aug 26, 2025·5 cites·22 claims
- 0482US6322662B1Plasma treatment systemTOKYO ELECTRON LTD·Filed 2000·Granted Nov 27, 2001·19 cites·6 claims
- 0579US7740946B2Electroconductive laminate, and electromagnetic wave shielding film for plasma display and protective plate for plasma displayASAHI GLASS CO LTD·Filed 2007·Granted Jun 22, 2010·9 cites·10 claims
- 0673US8040062B2Electroconductive laminate, and electromagnetic wave shielding film and protective plate for plasma displayASAHI GLASS CO LTD·Filed 2007·Granted Oct 18, 2011·3 cites·10 claims
- 0766US8574446B2Apparatus and method for plasma processingMORIMOTO TAMOTSU·Filed 2009·Granted Nov 5, 2013·2 cites·9 claims
- 0865US5567152AHeat processing apparatusTOKYO ELECTRON LTD·Filed 1995·Granted Oct 22, 1996·31 cites·14 claims
- 0964US9025248B2Antireflection stackASAHI GLASS CO LTD·Filed 2013·Granted May 5, 2015·2 cites·9 claims
- 1064US2025368898A1Methods for controlling the phase of self-assembled ionic liquid crystal (ilc) structuresTOKYO ELECTRON LTD·Filed 2024·Application pending·0 cites
- 1161US2025093552A1Antiglare layer-equipped transparent substrate, production method for antiglare layer-equipped transparent substrate, and image display deviceAGC INC·Filed 2024·Application pending·0 cites
- 1260US7771850B2Electromagnetic wave shielding laminate and display device employing itASAHI GLASS CO LTD·Filed 2008·Granted Aug 10, 2010·1 cites·32 claims
- 1359US2023150245A1Anti-reflective film-attached transparent substrate and image display deviceAGC INC·Filed 2023·Application pending·0 cites
- 1457US2015030761A1Apparatus and process for producing fluorinated organosilicon compound thin filmASAHI GLASS CO LTD·Filed 2014·Application pending·0 cites
- 1554US9911596B2Modification processing method and method of manufacturing semiconductor deviceTOKYO ELECTRON LTD·Filed 2016·Granted Mar 6, 2018·0 cites·9 claims
- 1652US9443724B2Modification processing method and method of manufacturing semiconductor deviceTOKYO ELECTRON LTD·Filed 2015·Granted Sep 13, 2016·0 cites·17 claims
- 1752US2014057051A1Process and apparatus for producing fluorinated organosilicon compound thin filmASAHI GLASS CO LTD·Filed 2013·Application pending·0 cites
- 1852US2008057264A1Electromagnetic wave shielding laminate and display device using itASAHI GLASS CO LTD·Filed 2007·Application pending·0 cites
- 1951US2008118762A1Electromagnetic wave shielding film and protective plate for plasma display panelASAHI GLASS CO LTD·Filed 2008·Application pending·0 cites
- 2051US2024420970A1Liquid circulation system, substrate processing apparatus, and liquid circulation methodTOKYO ELECTRON LTD·Filed 2022·Application pending·0 cites
- 2147US2013128342A1Infrared reflecting substrate and laminated glassASAHI GLASS CO LTD·Filed 2013·Application pending·0 cites
- 2246US2012250146A1Laminated glassTAMAI KAZUHIRO·Filed 2012·Application pending·0 cites
- 2345US2010014163A1Antireflector and display deviceASAHI GLASS CO LTD·Filed 2009·Application pending·0 cites
- 2445US2007045242A1Plasma processing apparatus and processing method, and flat panel display manufacturing methodTOKYO ELECTRON LTD·Filed 2005·Application pending·0 cites
- 2544US2005000654A1Apparatus and method for plasma processingTOKYO ELECTRON LTD·Filed 2004·Application pending·0 cites
- 2643US10910229B2Substrate treatment methodTOKYO ELECTRON LTD·Filed 2016·Granted Feb 2, 2021·0 cites·6 claims
- 2743US6793834B2Apparatus for and method of processing an object to be processedTOKYO ELECTRON LTD·Filed 2002·Granted Sep 21, 2004·0 cites·6 claims
- 2843US2008112051A1Reflection mirror and its production processASAHI GLASS CO LTD·Filed 2008·Application pending·0 cites
- 2942US2007243327A1Film forming method and apparatusKANG SONG Y·Filed 2006·Application pending·0 cites
- 3042US2005095449A1Electromagnetic wave shielding laminate and display device employing itASAHI GLASS CO LTD·Filed 2004·Application pending·0 cites
- 3142US2008174872A1Electroconductive laminate, electromagnetic wave shielding film for plasma display and protective plate for plasma displayASAHI GLASS CO LTD·Filed 2007·Application pending·0 cites
- 3240US2018047787A1Nonvolatile Storage Device and Method of Fabricating Nonvolatile Storage DeviceTOKYO ELECTRON LTD·Filed 2017·Application pending·0 cites
- 3339US9947864B2Method for etching object to be processedTOKYO ELECTRON LTD·Filed 2015·Granted Apr 17, 2018·0 cites·12 claims
- 3439US2010171406A1Electroconductive laminateASAHI GLASS CO LTD·Filed 2010·Application pending·0 cites
- 3539US2020142105A1Front plate for display apparatusAGC INC·Filed 2020·Application pending·0 cites
- 3639US2008174895A1High reflection mirror and process for its productionASAHI GLASS CO LTD·Filed 2007·Application pending·0 cites
- 3736US10790152B2Method for etching multilayer filmTOKYO ELECTRON LTD·Filed 2016·Granted Sep 29, 2020·0 cites·7 claims
- 3816US6812151B1Method of etchingKENICHI NANBU·Filed 1999·Granted Nov 2, 2004·2 cites·34 claims
Join the waitlist — get patent alerts
Get an alert when Tamotsu Morimoto files or is granted a new patent.
We store only your email — no account needed. See our privacy policy.
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →