Inventor · disambiguated record
Takeharu Motokawa
Also filed as: MOTOKAWA TAKEHARU
10 granted patents·12 pending applications·6 citations·filing 2006–2025
79Inventor score
Top patents by PatentIndex Score
22 records- 0177US2025013146A1Template and manufacturing method thereofKIOXIA CORP·Filed 2024·Application pending·0 cites
- 0272US10811252B2Pattern-forming methodTOSHIBA MEMORY CORP·Filed 2018·Granted Oct 20, 2020·1 cites·20 claims
- 0372US8834674B2Plasma etching apparatusMOTOKAWA TAKEHARU·Filed 2010·Granted Sep 16, 2014·5 cites·8 claims
- 0468US2025216774A1Template and manufacturing method of semiconductor deviceKIOXIA CORP·Filed 2025·Application pending·0 cites
- 0567US2022291581A1Template and manufacturing method thereofKIOXIA CORP·Filed 2021·Application pending·0 cites
- 0663US2023296979A1Template and manufacturing method of semiconductor deviceKIOXIA CORP·Filed 2022·Application pending·0 cites
- 0760US11493846B2Pattern forming method and template manufacturing methodKIOXIA CORP·Filed 2020·Granted Nov 8, 2022·0 cites·14 claims
- 0855US2024096601A1Target processing device and target processing methodKIOXIA CORP·Filed 2023·Application pending·0 cites
- 0954US2022206382A1Pattern formation method and template manufacturing methodKIOXIA CORP·Filed 2021·Application pending·0 cites
- 1052US11789365B2Substrate processing method and substrate processing apparatusKIOXIA CORP·Filed 2020·Granted Oct 17, 2023·0 cites·26 claims
- 1151US9507251B2Method for manufacturing reflective mask and apparatus for manufacturing reflective maskSHIBAURA MECHATRONICS CORP·Filed 2014·Granted Nov 29, 2016·0 cites·10 claims
- 1250US11931923B2Method of manufacturing template and method of forming patternKIOXIA CORP·Filed 2020·Granted Mar 19, 2024·0 cites·15 claims
- 1345US9976948B2Phase separation observation method, phase separation observation apparatus, annealing apparatus, and producing method for substrateTOSHIBA MEMORY CORP·Filed 2015·Granted May 22, 2018·0 cites·6 claims
- 1444US2021238739A1Processing apparatus and processing methodKIOXIA CORP·Filed 2020·Application pending·0 cites
- 1542US2008283500A1Plasma processing apparatus and plasma processing methodMOTOKAWA TAKEHARU·Filed 2008·Application pending·0 cites
- 1639US10111313B2Plasma processing apparatus and plasma processing methodSHIBAURA MECHATRONICS CORP·Filed 2013·Granted Oct 23, 2018·0 cites·9 claims
- 1739US9841674B2Patterning method, and template for nanoimprint and producing method thereofTOSHIBA MEMORY CORP·Filed 2015·Granted Dec 12, 2017·0 cites·21 claims
- 1839US8702901B2Method for manufacturing reflective mask and apparatus for manufacturing reflective maskYOSHIMORI TOMOAKI·Filed 2011·Granted Apr 22, 2014·0 cites·12 claims
- 1934US2006292727A1Photomask plasma etching apparatus, etching method, and photomask forming methodMOTOKAWA TAKEHARU·Filed 2006·Application pending·0 cites
- 2033US2016068430A1Patterning methodTOSHIBA KK·Filed 2015·Application pending·0 cites
- 2133US2016068429A1Pattern forming method, photomask, and template for nanoimprintTOSHIBA KK·Filed 2015·Application pending·0 cites
- 2229US2016240411A1Multi-processing apparatus and method for manufacturing semiconductor deviceTOSHIBA KK·Filed 2015·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →