Inventor · disambiguated record
Takamitsu Nagai
Also filed as: NAGAI TAKAMITSU
22 granted patents·849 citations·filing 1993–2020
97Inventor score
Top patents by PatentIndex Score
22 records- 0198US9368314B2Inspection system by charged particle beam and method of manufacturing devices using the systemEBARA CORP·Filed 2014·Granted Jun 14, 2016·38 cites·10 claims
- 0298US6992290B2Electron beam inspection system and inspection method and method of manufacturing devices using the systemTOSHIBA KK·Filed 2001·Granted Jan 31, 2006·97 cites·5 claims
- 0397US7351969B2Electron beam inspection system and inspection method and method of manufacturing devices using the systemEBARA CORP·Filed 2005·Granted Apr 1, 2008·37 cites·5 claims
- 0496US7569838B2Electron beam inspection system and inspection method and method of manufacturing devices using the systemEBARA CORP·Filed 2008·Granted Aug 4, 2009·23 cites·5 claims
- 0596US6265719B1Inspection method and apparatus using electron beamTOSHIBA KK·Filed 1998·Granted Jul 24, 2001·121 cites·15 claims
- 0695US7973281B2Semiconductor substrate, substrate inspection method, semiconductor device manufacturing method, and inspection apparatusTOSHIBA KK·Filed 2009·Granted Jul 5, 2011·57 cites·18 claims
- 0795US7573066B2Semiconductor substrate, substrate inspection method, semiconductor device manufacturing method, and inspection apparatusTOSHIBA KK·Filed 2007·Granted Aug 11, 2009·59 cites·2 claims
- 0895US7411191B2Inspection system by charged particle beam and method of manufacturing devices using the systemEBARA CORP·Filed 2007·Granted Aug 12, 2008·20 cites·4 claims
- 0994US7241993B2Inspection system by charged particle beam and method of manufacturing devices using the systemTOSHIBA KK·Filed 2001·Granted Jul 10, 2007·54 cites·12 claims
- 1094US6563114B1Substrate inspecting system using electron beam and substrate inspecting method using electron beamTOSHIBA KK·Filed 2000·Granted May 13, 2003·103 cites·21 claims
- 1194US6259094B1Electron beam inspection method and apparatusTOSHIBA KK·Filed 1998·Granted Jul 10, 2001·92 cites·6 claims
- 1291US8053726B2Inspection system by charged particle beam and method of manufacturing devices using the systemEBARA CORP·Filed 2008·Granted Nov 8, 2011·11 cites·11 claims
- 1391US5371371AMagnetic immersion field emission electron gun systems capable of reducing aberration of electrostatic lensTOSHIBA KK·Filed 1993·Granted Dec 6, 1994·67 cites·14 claims
- 1490US8803103B2Inspection system by charged particle beam and method of manufacturing devices using the systemEBARA CORP·Filed 2013·Granted Aug 12, 2014·6 cites·7 claims
- 1583US8368031B2Inspection system by charged particle beam and method of manufacturing devices using the systemEBARA CORP·Filed 2011·Granted Feb 5, 2013·3 cites·7 claims
- 1681US7462829B2Substrate inspection apparatus, substrate inspection method and method of manufacturing semiconductor deviceTOSHIBA KK·Filed 2007·Granted Dec 9, 2008·4 cites·10 claims
- 1780US5444256AElectrostatic lens and method for producing the sameTOSHIBA KK·Filed 1993·Granted Aug 22, 1995·29 cites·10 claims
- 1870US7211796B2Substrate inspection apparatus, substrate inspection method and method of manufacturing semiconductor deviceTOSHIBA KK·Filed 2004·Granted May 1, 2007·6 cites·15 claims
- 1963US7847250B2Substrate inspection apparatus, substrate inspection method and method of manufacturing semiconductor deviceTOSHIBA KK·Filed 2008·Granted Dec 7, 2010·0 cites·2 claims
- 2059US7302091B2Method and apparatus for determining defect detection sensitivity data, control method of defect detection apparatus, and method and apparatus for detecting defect of semiconductor devicesTOSHIBA KK·Filed 2003·Granted Nov 27, 2007·14 cites·26 claims
- 2157US11562883B2Electron microscope and beam irradiation methodKIOXIA CORP·Filed 2020·Granted Jan 24, 2023·0 cites·1 claims
- 2253US5535508AMethod for producing an electrostatic lensTOSHIBA KK·Filed 1995·Granted Jul 16, 1996·8 cites·1 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →