Inventor · disambiguated record
Tadashi Nishioka
Also filed as: NISHIOKA TADASHI
36 granted patents·6 pending applications·834 citations·filing 1980–2022
98Inventor score
Files withMITSUBISHI ELECTRIC CORP32SHARP KK6SHARP DISPLAY TECHNOLOGY CORP2NISHIOKA TADASHI1RYODEN SEMICONDUCTOR SYST ENG1
Top patents by PatentIndex Score
42 records- 0185US4880975AFine adjustment mechanism for a scanning tunneling microscopeMITSUBISHI ELECTRIC CORP·Filed 1988·Granted Nov 14, 1989·48 cites·14 claims
- 0283US5595941AMethod of forming fine patternsMITSUBISHI ELECTRIC CORP·Filed 1995·Granted Jan 21, 1997·62 cites·2 claims
- 0382US5107114AFine scanning mechanism for atomic force microscopeMITSUBISHI ELECTRIC CORP·Filed 1991·Granted Apr 21, 1992·45 cites·16 claims
- 0482US4431967AMethod of mounting a semiconductor element for analyzing failures thereonMITSUBISHI ELECTRIC CORP·Filed 1980·Granted Feb 14, 1984·52 cites·1 claims
- 0581US4947042ATunnel unit and scanning head for scanning tunneling microscopeMITSUBISHI ELECTRIC CORP·Filed 1989·Granted Aug 7, 1990·39 cites·42 claims
- 0680US5652428AMethod of using scanning probe microscope allowing cleaning of probe tip in ambient atmosphereMITSUBISHI ELECTRIC CORP·Filed 1996·Granted Jul 29, 1997·65 cites·11 claims
- 0775US4945235AFine adjustment mechanism for a scanning tunneling microscopeMITSUBISHI ELECTRIC CORP·Filed 1988·Granted Jul 31, 1990·30 cites·14 claims
- 0874US5720814APhotoresist coating apparatusMITSUBISHI ELECTRIC CORP·Filed 1996·Granted Feb 24, 1998·43 cites·9 claims
- 0972US5622787AMask for transferring a pattern for use in a semiconductor device and method of manufacturing the sameMITSUBISHI ELECTRIC CORP·Filed 1994·Granted Apr 22, 1997·24 cites·6 claims
- 1071US5702849AMask for transferring a pattern for use in a semiconductor device and method of manufacturing the sameMITSUBISHI ELECTRIC CORP·Filed 1996·Granted Dec 30, 1997·30 cites·7 claims
- 1171US5469733ACantilever for atomic force microscope and method of manufacturing the cantileverMITSUBISHI ELECTRIC CORP·Filed 1994·Granted Nov 28, 1995·31 cites·9 claims
- 1270US5477732AAdhesion measuring methodMITSUBISHI ELECTRIC CORP·Filed 1994·Granted Dec 26, 1995·45 cites·7 claims
- 1366US5465145ASemiconductor wafer inspection apparatusMITSUBISHI ELECTRIC CORP·Filed 1994·Granted Nov 7, 1995·47 cites·11 claims
- 1465US5688723AMethod of forming fine patternsMITSUBISHI ELECTRIC CORP·Filed 1996·Granted Nov 18, 1997·26 cites·2 claims
- 1565US4853341AProcess for forming electrodes for semiconductor devices using focused ion beamsMITSUBISHI ELECTRIC CORP·Filed 1987·Granted Aug 1, 1989·23 cites·18 claims
- 1663US5710066AMethod of forming fine patternsMITSUBISHI ELECTRIC CORP·Filed 1996·Granted Jan 20, 1998·24 cites·9 claims
- 1760US4962059AProcess for forming electrodes for semiconductor devices using focused ion beam depositionMITSUBISHI ELECTRIC CORP·Filed 1989·Granted Oct 9, 1990·19 cites·65 claims
- 1860US4837445ACoarse adjusting device of scanning tunneling microscopeMITSUBISHI ELECTRIC CORP·Filed 1988·Granted Jun 6, 1989·19 cites·21 claims
- 1959US5193385ACantilever for use in atomic force microscope and manufacturing method thereforMITSUBISHI ELECTRIC CORP·Filed 1991·Granted Mar 16, 1993·19 cites·14 claims
- 2057US5267066ALiquid crystal display device, method of correcting defective pixels, and defective-pixel correcting apparatus used thereinSHARP KK·Filed 1992·Granted Nov 30, 1993·26 cites·12 claims
- 2157US4691078AAluminum circuit to be disconnected and method of cutting the sameMITSUBISHI ELECTRIC CORP·Filed 1986·Granted Sep 1, 1987·14 cites·2 claims
- 2257US2025344582A1Display device and method for manufacturing sameSHARP DISPLAY TECHNOLOGY CORP·Filed 2022·Application pending·0 cites
- 2355US12029100B2Method for manufacturing display deviceSHARP KK·Filed 2019·Granted Jul 2, 2024·0 cites·15 claims
- 2450US5723982AApparatus for analyzing thin film propertyMITSUBISHI ELECTRIC CORP·Filed 1995·Granted Mar 3, 1998·15 cites·4 claims
- 2550US4952421AMethod for repairing a patternMITSUBISHI ELECTRIC CORP·Filed 1988·Granted Aug 28, 1990·16 cites·11 claims
- 2650US2025048558A1Display device and method for producing sameSHARP DISPLAY TECHNOLOGY CORP·Filed 2021·Application pending·0 cites
- 2750US2019280208A1Bonding method and coating deviceSHARP KK·Filed 2017·Application pending·0 cites
- 2849US2019358945A1Film applying apparatusSHARP KK·Filed 2017·Application pending·0 cites
- 2948US4636400AMethod of treating silicon nitride film formed by plasma depositionMITSUBISHI ELECTRIC CORP·Filed 1985·Granted Jan 13, 1987·11 cites·3 claims
- 3046US5656809AAtomic force microscope and measuring head thereof with linearly polarized reflected lightMITSUBISHI ELECTRIC CORP·Filed 1996·Granted Aug 12, 1997·17 cites·20 claims
- 3145US12310226B2Display deviceSHARP KK·Filed 2019·Granted May 20, 2025·0 cites·15 claims
- 3244US5530253ASample stage for scanning probe microscope headMITSUBISHI ELECTRIC CORP·Filed 1994·Granted Jun 25, 1996·6 cites·15 claims
- 3344US4990489ARead only memory device including a superconductive electrodeMITSUBISHI ELECTRIC CORP·Filed 1988·Granted Feb 5, 1991·10 cites·13 claims
- 3443US5792314AMethod of removing photosensitive resin and photosensitive resin removing apparatusRYODEN SEMICONDUCTOR SYST ENG·Filed 1995·Granted Aug 11, 1998·8 cites·10 claims
- 3541US2019207170A1Transport tool and method for manufacturing organic electroluminescent display device using said transport toolSHARP KK·Filed 2017·Application pending·0 cites
- 3638US2012067500A1Device for fabricating liquid crystal display and method for fabricating liquid crystal displayNISHIOKA TADASHI·Filed 2010·Application pending·0 cites
- 3736US4723062AAluminum circuit to be disconnected and method of cutting the sameMITSUBISHI ELECTRIC CORP·Filed 1987·Granted Feb 2, 1988·4 cites·2 claims
- 3834US5130273AMethod for manufacturing a read only memory device using a focused ion beam to alter superconductivityMITSUBISHI ELECTRIC CORP·Filed 1991·Granted Jul 14, 1992·5 cites·12 claims
- 3933US5736745AContamination evaluating apparatusMITSUBISHI ELECTRIC CORP·Filed 1996·Granted Apr 7, 1998·4 cites·12 claims
- 4032US5043290AProcess for forming electrodes for semiconductor devices by focused ion beam technologyMITSUBISHI ELECTRIC CORP·Filed 1989·Granted Aug 27, 1991·2 cites·16 claims
- 4131US4948749AProcess for forming electrodes for semiconductor devicesMITSUBISHI ELECTRIC CORP·Filed 1989·Granted Aug 14, 1990·3 cites·64 claims
- 4231US4843238AMethod for identifying a blistered film in layered filmsMITSUBISHI ELECTRIC CORP·Filed 1988·Granted Jun 27, 1989·2 cites·9 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →