Inventor · disambiguated record
Takafumi Nogami
Also filed as: NOGAMI TAKAFUMI
5 granted patents·9 pending applications·81 citations·filing 1996–2025
79Inventor score
Top patents by PatentIndex Score
14 records- 0173US7016957B2Distributed data processing system and error analysis information saving method appropriate thereforHITACHI LTD·Filed 2002·Granted Mar 21, 2006·21 cites·16 claims
- 0268US10930477B2Plasma processing apparatusTOKYO ELECTRON LTD·Filed 2018·Granted Feb 23, 2021·1 cites·3 claims
- 0365US2024240307A1Method of forming silicon nitride filmTOKYO ELECTRON LTD·Filed 2024·Application pending·0 cites
- 0454US6397244B1Distributed data processing system and error analysis information saving method appropriate thereforHITACHI LTD·Filed 1999·Granted May 28, 2002·33 cites·14 claims
- 0551US2025069854A1Modification method and modification deviceTOKYO ELECTRON LTD·Filed 2024·Application pending·0 cites
- 0650US2025308887A1Method of embedding recess and plasma processing apparatusTOKYO ELECTRON LTD·Filed 2025·Application pending·0 cites
- 0750US2025299924A1Substrate processing method and substrate processing apparatusTOKYO ELECTRON LTD·Filed 2025·Application pending·0 cites
- 0847US5729736AAccess analysis method and system in parallel data base systemHITACHI LTD·Filed 1996·Granted Mar 17, 1998·26 cites·23 claims
- 0947US2023317421A1Plasma processing apparatusTOKYO ELECTRON LTD·Filed 2023·Application pending·0 cites
- 1040US2025154649A1Silicon nitride film formation method and plasma processing apparatusTOKYO ELECTRON LTD·Filed 2025·Application pending·0 cites
- 1140US2024047194A1Substrate processing method and substrate processing apparatusTOKYO ELECTRON LTD·Filed 2022·Application pending·0 cites
- 1237US2017372877A1Support apparatus for plasma adjustment, method for adjusting plasma, and storage mediumTOKYO ELECTRON LTD·Filed 2017·Application pending·0 cites
- 1337US2017358835A1Microwave plasma processing apparatus and microwave plasma processing methodTOKYO ELECTRON LTD·Filed 2017·Application pending·0 cites
- 1435US11488813B2Cleaning methodTOKYO ELECTRON LTD·Filed 2019·Granted Nov 1, 2022·0 cites·12 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →