Inventor · disambiguated record
Tatsuro Ohshita
Also filed as: OHSHITA TATSURO
12 granted patents·5 pending applications·71 citations·filing 2007–2025
87Inventor score
Top patents by PatentIndex Score
17 records- 0197US10553407B2Plasma processing method and plasma processing apparatusTOKYO ELECTRON LTD·Filed 2018·Granted Feb 4, 2020·47 cites·14 claims
- 0289US11170979B2Plasma etching method and plasma etching apparatusTOKYO ELECTRON LTD·Filed 2019·Granted Nov 9, 2021·4 cites·17 claims
- 0387US8636871B2Plasma processing apparatus, plasma processing method and storage mediumSAWADA IKUO·Filed 2007·Granted Jan 28, 2014·14 cites·18 claims
- 0478US2025273446A1Exhaust device, processing apparatus, and exhausting methodTOKYO ELECTRON LTD·Filed 2025·Application pending·0 cites
- 0576US2025022684A1Plasma processing apparatus and plasma processing methodTOKYO ELECTRON LTD·Filed 2024·Application pending·0 cites
- 0675US9978566B2Plasma etching methodTOKYO ELECTRON LTD·Filed 2016·Granted May 22, 2018·2 cites·6 claims
- 0774US11133157B2Plasma processing apparatusTOKYO ELECTRON LTD·Filed 2019·Granted Sep 28, 2021·1 cites·14 claims
- 0872US9252001B2Plasma processing apparatus, plasma processing method and storage mediumTOKYO ELECTRON LTD·Filed 2014·Granted Feb 2, 2016·2 cites·4 claims
- 0970US2023411128A1Plasma processing apparatus and power supply control methodTOKYO ELECTRON LTD·Filed 2023·Application pending·0 cites
- 1069US12322578B2Exhaust device, processing apparatus, and exhausting methodTOKYO ELECTRON LTD·Filed 2021·Granted Jun 3, 2025·0 cites·15 claims
- 1168US12136535B2Plasma processing apparatus and plasma processing methodTOKYO ELECTRON LTD·Filed 2021·Granted Nov 5, 2024·0 cites·16 claims
- 1264US9343295B2Vaporizing unit, film forming apparatus, film forming method, computer program and storage mediumTOKYO ELECTRON LTD·Filed 2014·Granted May 17, 2016·1 cites·6 claims
- 1359US11315770B2Exhaust device for processing apparatus provided with multiple bladesTOKYO ELECTRON LTD·Filed 2018·Granted Apr 26, 2022·0 cites·11 claims
- 1455US11776795B2Plasma processing apparatus and power supply control methodTOKYO ELECTRON LTD·Filed 2019·Granted Oct 3, 2023·0 cites·12 claims
- 1551US2010297346A1Vaporizing unit, film forming apparatus, film forming method, computer program and storage mediumTOKYO ELECTRON LTD·Filed 2008·Application pending·0 cites
- 1650US10297428B2Plasma processing apparatusTOKYO ELECTRON LTD·Filed 2015·Granted May 21, 2019·0 cites·11 claims
- 1737US2019122863A1Plasma processing apparatusTOKYO ELECTRON LTD·Filed 2017·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →