Inventor · disambiguated record
Takuo Oowada
Also filed as: OOWADA TAKUO
6 granted patents·2 pending applications·135 citations·filing 2002–2008
84Inventor score
Top patents by PatentIndex Score
8 records- 0195US6864044B2Photoresist residue removing liquid compositionKANTO KAGAKU·Filed 2002·Granted Mar 8, 2005·87 cites·10 claims
- 0286US7563754B2Composition for removing photoresist residue and polymer residueKANTO KAGAKU·Filed 2005·Granted Jul 21, 2009·11 cites·6 claims
- 0376US7816312B2Composition for photoresist stripping solution and process of photoresist strippingKANTO KAGAKU·Filed 2006·Granted Oct 19, 2010·5 cites·11 claims
- 0474US7087562B2Post-CMP washing liquid compositionNEC ELECTRONICS CORP·Filed 2003·Granted Aug 8, 2006·16 cites·5 claims
- 0572US6787293B2Photoresist residue remover compositionKANTO KAGAKU·Filed 2003·Granted Sep 7, 2004·15 cites·6 claims
- 0662US7816313B2Photoresist residue remover composition and semiconductor circuit element production process employing the sameKANTO KAGAKU·Filed 2008·Granted Oct 19, 2010·1 cites·20 claims
- 0739US2006046944A1Composition for removing a photoresist residue and polymer residue, and residue removal process using sameKANTO KAGAKU·Filed 2005·Application pending·0 cites
- 0839US2005209118A1Photoresist residue remover composition and semiconductor circuit element production process employing the sameKAWAMOTO HIROSHI·Filed 2004·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →