Inventor · disambiguated record
Takehisa Saito
Also filed as: SAITO TAKEHISA
8 granted patents·4 pending applications·0 citations·filing 2013–2025
71Inventor score
Files withTOKYO ELECTRON LTD12
Top patents by PatentIndex Score
12 records- 0173US11832373B2Plasma processing apparatusTOKYO ELECTRON LTD·Filed 2022·Granted Nov 28, 2023·0 cites·20 claims
- 0273US2024049379A1Plasma processing apparatusTOKYO ELECTRON LTD·Filed 2023·Application pending·0 cites
- 0366US2025343028A1Plasma processing apparatus and plasma processing methodTOKYO ELECTRON LTD·Filed 2025·Application pending·0 cites
- 0457US11470712B2Plasma processing apparatusTOKYO ELECTRON LTD·Filed 2018·Granted Oct 11, 2022·0 cites·15 claims
- 0557US2015176125A1Substrate processing apparatusTOKYO ELECTRON LTD·Filed 2014·Application pending·0 cites
- 0651US12494344B2Antenna for inductively coupled plasma excitation, antenna unit for inductively coupled plasma excitation, and plasma processing apparatusTOKYO ELECTRON LTD·Filed 2022·Granted Dec 9, 2025·0 cites·20 claims
- 0750US12340975B2Plasma processing apparatusTOKYO ELECTRON LTD·Filed 2021·Granted Jun 24, 2025·0 cites·14 claims
- 0845US9543191B2Wiring structure having interlayer insulating film and wiring line without a barrier layer betweenTOKYO ELECTRON LTD·Filed 2013·Granted Jan 10, 2017·0 cites·3 claims
- 0943US9343270B2Plasma processing apparatusTOKYO ELECTRON LTD·Filed 2014·Granted May 17, 2016·0 cites·9 claims
- 1043US2015255258A1Plasma processing apparatus and substrate processing apparatus provided with sameTOKYO ELECTRON LTD·Filed 2013·Application pending·0 cites
- 1140US9378942B2Deposition method and deposition apparatusTOKYO ELECTRON LTD·Filed 2013·Granted Jun 28, 2016·0 cites·4 claims
- 1231US9765430B2Plasma processing apparatus and film formation methodTOKYO ELECTRON LTD·Filed 2015·Granted Sep 19, 2017·0 cites·11 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →