Inventor · disambiguated record
Takamasa Satoh
Also filed as: SATOH TAKAMASA
26 granted patents·1 pending application·596 citations·filing 1994–2008
97Inventor score
Top patents by PatentIndex Score
27 records- 0191US6646275B2Charged particle beam exposure system and methodFUJITSU LTD·Filed 2002·Granted Nov 11, 2003·43 cites·7 claims
- 0288US5841145AMethod of and system for exposing pattern on object by charged particle beamFUJITSU LTD·Filed 1996·Granted Nov 24, 1998·60 cites·45 claims
- 0385US7777202B2Electron beam exposure apparatus involving the position and velocity calculationADVANTEST CORP·Filed 2007·Granted Aug 17, 2010·9 cites·5 claims
- 0485US5401974ACharged particle beam exposure apparatus and method of cleaning the sameFUJITSU LTD·Filed 1994·Granted Mar 28, 1995·47 cites·25 claims
- 0584US6242751B1Charged-particle-beam exposure device and charged-particle-beam exposure methodFUJITSU LTD·Filed 1999·Granted Jun 5, 2001·33 cites·62 claims
- 0683US5719402AMethod of and system for charged particle beam exposureFUJITSU LTD·Filed 1996·Granted Feb 17, 1998·32 cites·11 claims
- 0783US5528048ACharged particle beam exposure system and methodFUJITSU LTD·Filed 1995·Granted Jun 18, 1996·47 cites·21 claims
- 0882US7919750B2Electron gun, electron beam exposure apparatus, and exposure methodADVANTEST CORP·Filed 2008·Granted Apr 5, 2011·6 cites·16 claims
- 0979US5757015ACharged-particle-beam exposure device and charged-particle-beam exposure methodFUJITSU LTD·Filed 1996·Granted May 26, 1998·25 cites·22 claims
- 1079US5614725ACharged particle beam exposure system and methodFUJITSU LTD·Filed 1996·Granted Mar 25, 1997·36 cites·12 claims
- 1176US6118129AMethod and system for exposing an exposure pattern on an object by a charged particle beam which is shaped into a plurality of beam elementsFUJITSU LTD·Filed 1999·Granted Sep 12, 2000·30 cites·15 claims
- 1276US5866300AMethod of and system for exposing pattern on object by charged particle beamFUJITSU LTD·Filed 1996·Granted Feb 2, 1999·25 cites·15 claims
- 1376US5546319AMethod of and system for charged particle beam exposureFUJITSU LTD·Filed 1995·Granted Aug 13, 1996·21 cites·34 claims
- 1475US6188074B1Charged particle beam exposure apparatusADVANTEST CORP·Filed 1998·Granted Feb 13, 2001·29 cites·22 claims
- 1575US5969365ACharged-particle-beam exposure device and charged-particle-beam exposure methodFUJITSU LTD·Filed 1997·Granted Oct 19, 1999·20 cites·18 claims
- 1674US5977548ACharged particle beam exposure system and methodFUJITSU LTD·Filed 1996·Granted Nov 2, 1999·28 cites·11 claims
- 1769US5721432AMethod of and system for charged particle beam exposureFUJITSU LTD·Filed 1996·Granted Feb 24, 1998·16 cites·5 claims
- 1867US5920077ACharged particle beam exposure systemFUJITSU LTD·Filed 1998·Granted Jul 6, 1999·21 cites·17 claims
- 1965US5965895AMethod of providing changed particle beam exposure in which representative aligning marks on an object are detected to calculate an actual position to perform exposureFUJITSU LTD·Filed 1997·Granted Oct 12, 1999·13 cites·9 claims
- 2061US6727658B2Electron beam generating apparatus and electron beam exposure apparatusADVANTEST CORP·Filed 2003·Granted Apr 27, 2004·4 cites·19 claims
- 2160US6057907AMethod of and system for exposing pattern on object by charged particle beamFUJITSU LTD·Filed 1998·Granted May 2, 2000·12 cites·3 claims
- 2259US6252344B1Electron gun used in an electron beam exposure apparatusADVANTEST CORP·Filed 1999·Granted Jun 26, 2001·13 cites·7 claims
- 2354US5744810AMethod and system for exposing pattern on object by charged particle beamFUJITSU LTD·Filed 1996·Granted Apr 28, 1998·11 cites·11 claims
- 2451US5444257AElectron-beam exposure system for reduced distortion of electron beam spotFUJITSU LTD·Filed 1994·Granted Aug 22, 1995·8 cites·5 claims
- 2548US5631113AElectron-beam exposure system for reduced distortion of electron beam spotFUJITSU LTD·Filed 1995·Granted May 20, 1997·7 cites·6 claims
- 2637US2003071231A1Electron beam exposing method and exposure apparatusFiled 2002·Application pending·0 cites
- 2732US7557357B2D/A conversion device and method and charged particle beam exposure apparatus and methodADVANTEST CORP·Filed 2007·Granted Jul 7, 2009·0 cites·9 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →