Inventor · disambiguated record
Takashi Sekito
Also filed as: SEKITO TAKASHI
14 granted patents·5 pending applications·24 citations·filing 2011–2024
87Inventor score
Files withMERCK PATENT GMBH10SEKITO TAKASHI2YOKOYAMA DAISHI2AZ ELECTRONIC MAT (LUXEMBOURG) S A R L1AZ ELECTRONIC MAT LUXEMBOURG SARL1
Top patents by PatentIndex Score
19 records- 0189US8883397B2Positive photosensitive siloxane compositionYOKOYAMA DAISHI·Filed 2011·Granted Nov 11, 2014·9 cites·14 claims
- 0276US8906993B2Coating composition containing siloxane resinSEKITO TAKASHI·Filed 2012·Granted Dec 9, 2014·2 cites·16 claims
- 0375US9091920B2Photosensitive siloxane resin compositionSEKITO TAKASHI·Filed 2012·Granted Jul 28, 2015·4 cites·11 claims
- 0474US9411232B2Composition for forming fine resist pattern, and pattern formation method using sameAZ ELECTRONIC MAT (LUXEMBOURG) S A R L·Filed 2014·Granted Aug 9, 2016·3 cites·16 claims
- 0570US2024337945A1Thick film-forming composition and method for manufacturing cured film using the sameMERCK PATENT GMBH·Filed 2024·Application pending·0 cites
- 0667US11914296B2Ethynyl derived composite, a composition comprising thereof, a method for manufacturing a coating by it, and a method for manufacturing a device comprising the coatingMERCK PATENT GMBH·Filed 2023·Granted Feb 27, 2024·0 cites·20 claims
- 0765US12242195B2Method for manufacturing cured film and use of the sameMERCK PATENT GMBH·Filed 2020·Granted Mar 4, 2025·0 cites·13 claims
- 0865US8993214B2Positive photosensitive siloxane compositionYOKOYAMA DAISHI·Filed 2012·Granted Mar 31, 2015·2 cites·20 claims
- 0964US9448485B2Composition for forming fine resist pattern and pattern forming method using sameOKAYASU TETSUO·Filed 2012·Granted Sep 20, 2016·2 cites·7 claims
- 1064US9360756B2Composition for forming fine resist pattern and pattern formation method using sameYAMAMOTO KAZUMA·Filed 2013·Granted Jun 7, 2016·2 cites·12 claims
- 1158US11767398B2Spin-on compositions comprising an inorganic oxide component and an alkynyloxy substituted spin-on carbon component useful as hard masks and filling materials with improved shelf lifeMERCK PATENT GMBH·Filed 2020·Granted Sep 26, 2023·0 cites·8 claims
- 1253US9921481B2Fine resist pattern-forming composition and pattern forming method using sameAZ ELECTRONIC MAT LUXEMBOURG SARL·Filed 2014·Granted Mar 20, 2018·0 cites·12 claims
- 1351US11609498B2Ethynyl derived composite, a composition comprising thereof, a method for manufacturing a coating by it, and a method for manufacturing a device comprising the coatingMERCK PATENT GMBH·Filed 2018·Granted Mar 21, 2023·0 cites·20 claims
- 1451US2024166947A1Substrate treating solution, and using the same, method for manufacturing substrate and method for manufacturing deviceMERCK PATENT GMBH·Filed 2022·Application pending·0 cites
- 1550US2025014899A1Method for removing upper part of sacrificial layer, and sacrificial solution and acidic aqueous solution used thereforMERCK PATENT GMBH·Filed 2021·Application pending·0 cites
- 1647US2016327867A1Composition for forming fine resist pattern and pattern forming method using sameMERCK PATENT GMBH·Filed 2016·Application pending·0 cites
- 1744US11366389B2Allyloxy derivative, resist underlayer forming composition using the same, and method of manufacturing resist underlayer and semiconductor device using the sameMERCK PATENT GMBH·Filed 2018·Granted Jun 21, 2022·0 cites·20 claims
- 1841US11450805B2Compound, semiconductor material, and methods for manufacturing coating and semiconductor using the sameMERCK PATENT GMBH·Filed 2017·Granted Sep 20, 2022·0 cites·14 claims
- 1937US2023236509A1A spin coating composition comprising a carbon material, a metal organic compound, and solvent, and a manufacturing method of a metal oxide film above a substrateMERCH PATENT GMBH·Filed 2021·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →