Inventor · disambiguated record
Taeho Shin
Also filed as: SHIN TAEHO
8 granted patents·10 pending applications·86 citations·filing 1998–2025
86Inventor score
Top patents by PatentIndex Score
18 records- 0189US9905790B2Optoelectronic device including quantum dotSAMSUNG ELECTRONICS CO LTD·Filed 2016·Granted Feb 27, 2018·8 cites·26 claims
- 0283US7374636B2Method and apparatus for providing uniform plasma in a magnetic field enhanced plasma reactorAPPLIED MATERIALS INC·Filed 2002·Granted May 20, 2008·21 cites·16 claims
- 0372US2025357079A1Magnetized inductively coupled plasma processing deviceINNOVATION FOR CREATIVE DEVICES CO LTD·Filed 2025·Application pending·0 cites
- 0471US7316199B2Method and apparatus for controlling the magnetic field intensity in a plasma enhanced semiconductor wafer processing chamberAPPLIED MATERIALS INC·Filed 2002·Granted Jan 8, 2008·9 cites·11 claims
- 0570US7736914B2Plasma control using dual cathode frequency mixing and controlling the level of polymer formationAPPLIED MATERIALS INC·Filed 2007·Granted Jun 15, 2010·3 cites·20 claims
- 0666US7838430B2Plasma control using dual cathode frequency mixingAPPLIED MATERIALS INC·Filed 2004·Granted Nov 23, 2010·8 cites·27 claims
- 0762US6312616B1Plasma etching of polysilicon using fluorinated gas mixturesAPPLIED MATERIALS INC·Filed 1998·Granted Nov 6, 2001·26 cites·11 claims
- 0860US2024234101A1Plasma substrate treatment apparatusINNOVATION FOR CREATIVE DEVICES CO LTD·Filed 2024·Application pending·0 cites
- 0960US2024249919A1Dc pulse plasma substrate treatment apparatusINNOVATION FOR CREATIVE DEVICES CO LTD·Filed 2024·Application pending·0 cites
- 1060US2024258079A1Capacitively coupled plasma substrate processing apparatusINNOVATION FOR CREATIVE DEVICES CO LTD·Filed 2024·Application pending·0 cites
- 1159US2024387153A1Electrostatic device and operation method thereforINNOVATION FOR CREATIVE DEVICES CO LTD·Filed 2024·Application pending·0 cites
- 1253US2008286979A1Method of controlling sidewall profile by using intermittent, periodic introduction of cleaning species into the main plasma etching speciesAPPLIED MATERIALS INC·Filed 2008·Application pending·0 cites
- 1350US2007000611A1Plasma control using dual cathode frequency mixingAPPLIED MATERIALS INC·Filed 2006·Application pending·0 cites
- 1449US2007243714A1Method of controlling silicon-containing polymer build up during etching by using a periodic cleaning stepAPPLIED MATERIALS INC·Filed 2006·Application pending·0 cites
- 1546US10121983B2Light-emitting device including nano particle having core shell structureSAMSUNG ELECTRONICS CO LTD·Filed 2017·Granted Nov 6, 2018·0 cites·18 claims
- 1644US6372151B1Storage poly process without carbon contaminationAPPLIED MATERIALS INC·Filed 1999·Granted Apr 16, 2002·11 cites·21 claims
- 1741US2008102553A1Stabilizing an opened carbon hardmaskAPPLIED MATERIALS INC·Filed 2006·Application pending·0 cites
- 1835US2003192645A1Method and apparatus for creating circumferential process gas flow in a semiconductor wafer plasma reactor chamberAPPLIED MATERIALS INC·Filed 2002·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →