Inventor · disambiguated record
Takashi Takekuma
Also filed as: TAKEKUMA TAKASHI
18 granted patents·1 pending application·1,380 citations·filing 1990–2006
97Inventor score
Technology areasH10P
Files withTOKYO ELECTRON LTD18
Top patents by PatentIndex Score
19 records- 0196US5518542ADouble-sided substrate cleaning apparatusTOKYO ELECTRON LTD·Filed 1994·Granted May 21, 1996·265 cites·23 claims
- 0295US5565034AApparatus for processing substrates having a film formed on a surface of the substrateTOKYO ELECTRON LTD·Filed 1994·Granted Oct 15, 1996·216 cites·38 claims
- 0393US5964954ADouble-sided substrate cleaning apparatus and cleaning method using the sameTOKYO ELECTRON LTD·Filed 1997·Granted Oct 12, 1999·119 cites·4 claims
- 0491US6402400B1Substrate processing apparatusTOKYO ELECTRON LTD·Filed 2000·Granted Jun 11, 2002·60 cites·19 claims
- 0591US6054181AMethod of substrate processing to form a film on multiple target objectsTOKYO ELECTRON LTD·Filed 1996·Granted Apr 25, 2000·106 cites·18 claims
- 0690US6848625B2Process liquid supply mechanism and process liquid supply methodTOKYO ELECTRON LTD·Filed 2003·Granted Feb 1, 2005·58 cites·30 claims
- 0790US6377329B1Substrate processing apparatusTOKYO ELECTRON LTD·Filed 2000·Granted Apr 23, 2002·52 cites·14 claims
- 0889US6432199B1Apparatus and method for processing a substrateTOKYO ELECTRON LTD·Filed 2000·Granted Aug 13, 2002·49 cites·19 claims
- 0989US5725664ASemiconductor wafer processing apparatus including localized humidification between coating and heat treatment sectionsTOKYO ELECTRON LTD·Filed 1996·Granted Mar 10, 1998·87 cites·23 claims
- 1087US5580607ACoating apparatus and methodTOKYO ELECTRON LTD·Filed 1994·Granted Dec 3, 1996·104 cites·4 claims
- 1183US6527861B2Developing apparatus with a porous film nozzleTOKYO ELECTRON LTD·Filed 2001·Granted Mar 4, 2003·24 cites·6 claims
- 1282US7485188B2Coating process method and coating process apparatusTOKYO ELECTRON LTD·Filed 2006·Granted Feb 3, 2009·9 cites·20 claims
- 1375US6284043B1Solution treatment apparatusTOKYO ELECTRON LTD·Filed 1998·Granted Sep 4, 2001·39 cites·13 claims
- 1472US6258167B1Process liquid film forming apparatusTOKYO ELECTRON LTD·Filed 1999·Granted Jul 10, 2001·41 cites·42 claims
- 1571US5686143AResist treating methodTOKYO ELECTRON LTD·Filed 1996·Granted Nov 11, 1997·31 cites·6 claims
- 1667US5416047AMethod for applying process solution to substratesTOKYO ELECTRON LTD·Filed 1993·Granted May 16, 1995·42 cites·10 claims
- 1766US5070813ACoating apparatusTOKYO ELECTRON LTD·Filed 1990·Granted Dec 10, 1991·42 cites·8 claims
- 1865US5665200ASubstrate processing method and substrate processing apparatusTOKYO ELECTRON LTD·Filed 1995·Granted Sep 9, 1997·36 cites·17 claims
- 1938US2003180444A1Coating process method and coating process apparatusFiled 2003·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →