Inventor · disambiguated record
Takehiro Tanikawa
Also filed as: TANIKAWA TAKEHIRO
13 granted patents·6 pending applications·10 citations·filing 2012–2025
84Inventor score
Top patents by PatentIndex Score
19 records- 0185US11257691B2Substrate processing apparatusTOKYO ELECTRON LTD·Filed 2019·Granted Feb 22, 2022·4 cites·15 claims
- 0275US9048070B2Dielectric window for plasma treatment device, and plasma treatment deviceTOKYO ELECTRON LTD·Filed 2012·Granted Jun 2, 2015·3 cites·10 claims
- 0369US10825662B2Method for driving member and processing apparatusTOKYO ELECTRON LTD·Filed 2019·Granted Nov 3, 2020·1 cites·16 claims
- 0467US9111726B2Plasma processing apparatusMOYAMA KAZUKI·Filed 2012·Granted Aug 18, 2015·2 cites·12 claims
- 0563US2022148902A1Cleaning method and substrate processing apparatusTOKYO ELECTRON LTD·Filed 2022·Application pending·0 cites
- 0662US12230483B2Deposition method and processing apparatusTOKYO ELECTRON LTD·Filed 2023·Granted Feb 18, 2025·0 cites·9 claims
- 0760US2025316462A1Plasma processing apparatus and substrate attraction methodTOKYO ELECTRON LTD·Filed 2025·Application pending·0 cites
- 0859US2025006541A1Substrate-processing apparatusTOKYO ELECTRON LTD·Filed 2024·Application pending·0 cites
- 0957US11264260B2Cleaning method and substrate processing apparatusTOKYO ELECTRON LTD·Filed 2019·Granted Mar 1, 2022·0 cites·11 claims
- 1054US2023060329A1Plasma processing apparatus and abnormal discharge control methodTOKYO ELECTRON LTD·Filed 2022·Application pending·0 cites
- 1154US2021020416A1Plasma processing apparatusTOKYO ELECTRON LTD·Filed 2020·Application pending·0 cites
- 1249US11984300B2Plasma processing apparatusTOKYO ELECTRON LTD·Filed 2020·Granted May 14, 2024·0 cites·4 claims
- 1349US11978614B2Substrate processing apparatusTOKYO ELECTRON LTD·Filed 2020·Granted May 7, 2024·0 cites·7 claims
- 1448US2022084800A1Stage, substrate processing apparatus and substrate attraction methodTOKYO ELECTRON LTD·Filed 2021·Application pending·0 cites
- 1543US11869750B2Plasma processing apparatusTOKYO ELECTRON LTD·Filed 2019·Granted Jan 9, 2024·0 cites·12 claims
- 1642US10923328B2Plasma processing method and plasma processing apparatusTOKYO ELECTRON LTD·Filed 2018·Granted Feb 16, 2021·0 cites·10 claims
- 1742US9595425B2Antenna, dielectric window, plasma processing apparatus and plasma processing methodMATSUMOTO NAOKI·Filed 2012·Granted Mar 14, 2017·0 cites·8 claims
- 1841US9728417B2Method for processing base body to be processedTOKYO ELECTRON LTD·Filed 2012·Granted Aug 8, 2017·0 cites·8 claims
- 1940US9892951B2Method of controlling adherence of microparticles to substrate to be processed, and processing apparatusTOKYO ELECTRON LTD·Filed 2012·Granted Feb 13, 2018·0 cites·8 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →