Inventor · disambiguated record
Takanao Touya
Also filed as: TOUYA TAKANAO
22 granted patents·3 pending applications·88 citations·filing 2009–2025
94Inventor score
Top patents by PatentIndex Score
25 records- 0193US8816276B2Electron beam writing apparatus and electron beam writing methodNUFLARE TECHNOLOGY INC·Filed 2013·Granted Aug 26, 2014·17 cites·13 claims
- 0292US9373424B2Electron beam writing apparatus and electron beam writing methodNUFLARE TECHNOLOGY INC·Filed 2013·Granted Jun 21, 2016·17 cites·9 claims
- 0389US9036896B2Inspection system and method for inspecting line width and/or positional errors of a patternTOUYA TAKANAO·Filed 2011·Granted May 19, 2015·11 cites·10 claims
- 0486US9236223B2Charged particle beam writing apparatus, method of adjusting beam incident angle to target object surface, and charged particle beam writing methodNUFLARE TECHNOLOGY INC·Filed 2014·Granted Jan 12, 2016·5 cites·3 claims
- 0585US9824849B2Charged particle beam writing apparatus, method of adjusting beam incident angle to target object surface, and charged particle beam writing methodNUFLARE TECHNOLOGY INC·Filed 2015·Granted Nov 21, 2017·3 cites·4 claims
- 0684US8927941B2Multi charged particle beam writing apparatus and multi charged particle beam writing method with fixed voltage ratio einzel lensNUFLARE TECHNOLOGY INC·Filed 2013·Granted Jan 6, 2015·6 cites·8 claims
- 0783US10998164B2Charged particle beam writing apparatus and charged particle beam writing methodNUFLARE TECHNOLOGY INC·Filed 2019·Granted May 4, 2021·2 cites·11 claims
- 0882US8067753B2Electron beam writing apparatus and methodTOUYA TAKANAO·Filed 2009·Granted Nov 29, 2011·7 cites·15 claims
- 0981US9406117B2Inspection system and method for inspecting line width and/or positional errors of a patternNUFLARE TECHNOLOGY INC·Filed 2015·Granted Aug 2, 2016·3 cites·6 claims
- 1079US8610096B2Charged particle beam writing apparatus and methodTOUYA TAKANAO·Filed 2011·Granted Dec 17, 2013·4 cites·18 claims
- 1178US9916962B2Multi charged particle beam irradiation apparatus, multi charged particle beam irradiation method, and multi charged particle beam adjustment methodNUFLARE TECHNOLOGY INC·Filed 2017·Granted Mar 13, 2018·2 cites·10 claims
- 1277US9343266B2Charged particle beam pattern writing method and charged particle beam writing apparatus that corrects beam rotation utilizing a correlation tableNUFLARE TECHNOLOGY INC·Filed 2013·Granted May 17, 2016·3 cites·14 claims
- 1376US8884254B2Charged particle beam writing apparatusNUFLARE TECHNOLOGY INC·Filed 2013·Granted Nov 11, 2014·3 cites·9 claims
- 1474US8835868B2Multi charged particle beam writing apparatusNUFLARE TECHNOLOGY INC·Filed 2013·Granted Sep 16, 2014·2 cites·11 claims
- 1573US10504686B2Charged particle beam writing method and charged particle beam writing apparatusNUFLARE TECHNOLOGY INC·Filed 2018·Granted Dec 10, 2019·1 cites·10 claims
- 1669US10224171B2Blanking device for multi charged particle beams, and multi charged particle beam irradiation apparatusNUFLARE TECHNOLOGY INC·Filed 2017·Granted Mar 5, 2019·1 cites·10 claims
- 1768US8791422B2Charged particle beam writing apparatus and charged particle beam writing methodNUFLARE TECHNOLOGY INC·Filed 2012·Granted Jul 29, 2014·1 cites·16 claims
- 1867US12009175B2Charged particle beam writing apparatusNUFLARE TECHNOLOGY INC·Filed 2022·Granted Jun 11, 2024·0 cites·13 claims
- 1966US11908659B2Multi charged particle beam writing apparatusNUFLARE TECHNOLOGY INC·Filed 2022·Granted Feb 20, 2024·0 cites·16 claims
- 2066US2025379021A1Charged particle beam irradiation apparatus and charged particle beam irradiation methodNUFLARE TECHNOLOGY INC·Filed 2025·Application pending·0 cites
- 2166US2025323010A1Multi charged particle beam irradiation apparatus and adjusting method thereofNUFLARE TECHNOLOGY INC·Filed 2025·Application pending·0 cites
- 2264US11145483B2Charged particle beam writing apparatus, method of adjusting beam incident angle to target object surface, and charged particle beam writing methodNUFLARE TECHNOLOGY INC·Filed 2018·Granted Oct 12, 2021·0 cites·2 claims
- 2361US10192712B2Charged particle beam writing apparatus, method of adjusting beam incident angle to target object surface, and charged particle beam writing methodNUFLARE TECHNOLOGY INC·Filed 2017·Granted Jan 29, 2019·0 cites·2 claims
- 2459US2024013999A1Mounting substrate, blanking aperture array chip, blanking aperture array system and multi charged particle beam irradiation apparatusNUFLARE TECHNOLOGY INC·Filed 2023·Application pending·0 cites
- 2553US11804360B2Multi charged particle beam adjustment method, multi charged particle beam irradiation method, and multi charged particle beam irradiation apparatusNUFLARE TECHNOLOGY INC·Filed 2020·Granted Oct 31, 2023·0 cites·9 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →