Inventor · disambiguated record
Takafumi Ueda
Also filed as: UEDA TAKAFUMI
53 granted patents·10 pending applications·407 citations·filing 1999–2024
98Inventor score
Top patents by PatentIndex Score
63 records- 0196US8951917B2Composition for forming resist underlayer film and patterning process using the sameOGIHARA TSUTOMU·Filed 2012·Granted Feb 10, 2015·16 cites·24 claims
- 0296US7541134B2Antireflective film-forming composition, method for manufacturing the same, and antireflective film and pattern formation method using the sameIBM·Filed 2005·Granted Jun 2, 2009·34 cites·8 claims
- 0395US8759220B1Patterning processSHINETSU CHEMICAL CO·Filed 2013·Granted Jun 24, 2014·13 cites·46 claims
- 0495US8501386B2Silicon-containing film-forming composition, silicon-containing film-formed substrate, and patterning processOGIHARA TSUTOMU·Filed 2011·Granted Aug 6, 2013·14 cites·14 claims
- 0594US8835102B2Patterning process and composition for forming silicon-containing film usable thereforOGIHARA TSUTOMU·Filed 2012·Granted Sep 16, 2014·9 cites·15 claims
- 0693US8852844B2Composition for forming silicon-containing film, silicon-containing film-formed substrate and patterning processOGIHARA TSUTOMU·Filed 2009·Granted Oct 7, 2014·18 cites·24 claims
- 0793US8029974B2Metal oxide-containing film-forming composition, metal oxide-containing film-formed substrate, and patterning processSHINETSU CHEMICAL CO·Filed 2009·Granted Oct 4, 2011·19 cites·27 claims
- 0892US8999625B2Silicon-containing antireflective coatings including non-polymeric silsesquioxanesIBM·Filed 2013·Granted Apr 7, 2015·8 cites·17 claims
- 0992US8026038B2Metal oxide-containing film-forming composition, metal oxide-containing film, metal oxide-containing film-bearing substrate, and patterning methodSHINETSU CHEMICAL CO·Filed 2008·Granted Sep 27, 2011·19 cites·20 claims
- 1091US11572823B2Variable capacity turbochargerIHI CORP·Filed 2021·Granted Feb 7, 2023·2 cites·20 claims
- 1191US7585613B2Antireflection film composition, substrate, and patterning processSHINETSU CHEMICAL CO·Filed 2007·Granted Sep 8, 2009·12 cites·22 claims
- 1290US8329376B2Silicon-containing film-forming composition, silicon-containing film, silicon-containing film-bearing substrate, and patterning methodOGIHARA TSUTOMU·Filed 2007·Granted Dec 11, 2012·17 cites·14 claims
- 1388US8932953B2Composition for forming a silicon-containing resist underlayer film and patterning process using the sameOGIHARA TSUTOMU·Filed 2012·Granted Jan 13, 2015·6 cites·30 claims
- 1488US7855043B2Silicon-containing film-forming composition, silicon-containing film, silicon-containing film-bearing substrate, and patterning methodSHINETSU CHEMICAL CO·Filed 2007·Granted Dec 21, 2010·10 cites·15 claims
- 1588US7417104B2Porous film-forming composition, patterning process, and porous sacrificial filmSHINETSU CHEMICAL CO·Filed 2005·Granted Aug 26, 2008·9 cites·2 claims
- 1687US10907496B2TurbochargerIHI CORP·Filed 2018·Granted Feb 2, 2021·5 cites·2 claims
- 1787US7163778B2Anti-reflection film material and a substrate having an anti-reflection film and a method for forming a patternSHINETSU CHEMICAL CO·Filed 2004·Granted Jan 16, 2007·28 cites·16 claims
- 1887US6590010B2Organosiloxane polymer, photo-curable resin composition, patterning process, and substrate protective coatingSHIN ETSU CHEMICALS CO LTD·Filed 2001·Granted Jul 8, 2003·38 cites·4 claims
- 1985US7910283B2Silicon-containing antireflective coating forming composition, silicon-containing antireflective coating, substrate processing intermediate, and substrate processing methodSHINETSU CHEMICAL CO·Filed 2006·Granted Mar 22, 2011·8 cites·4 claims
- 2084US6440646B2Positive resist composition suitable for lift-off technique and pattern forming methodSHINETSU CHEMICAL CO·Filed 2001·Granted Aug 27, 2002·21 cites·20 claims
- 2183US12025012B2Variable capacity turbochargerIHI CORP·Filed 2023·Granted Jul 2, 2024·1 cites·20 claims
- 2283US8951711B2Patterning process and composition for forming silicon-containing film usable thereforSHINETSU CHEMICAL CO·Filed 2014·Granted Feb 10, 2015·3 cites·4 claims
- 2382US7485690B2Sacrificial film-forming composition, patterning process, sacrificial film and removal methodSHINETSU CHEMICAL CO·Filed 2005·Granted Feb 3, 2009·8 cites·17 claims
- 2481US7385021B2Sacrificial film-forming composition, patterning process, sacrificial film and removal methodSHINETSU CHEMICAL CO·Filed 2005·Granted Jun 10, 2008·6 cites·15 claims
- 2580US10030576B2Variable geometry system turbochargerIHI CORP·Filed 2015·Granted Jul 24, 2018·4 cites·6 claims
- 2679US10309248B2Variable geometry system turbochargerIHI CORP·Filed 2016·Granted Jun 4, 2019·3 cites·8 claims
- 2778US10895166B2TurbochargerIHI CORP·Filed 2018·Granted Jan 19, 2021·2 cites·12 claims
- 2878US8945820B2Silicon-containing resist underlayer film-forming composition and patterning processSHINETSU CHEMICAL CO·Filed 2012·Granted Feb 3, 2015·4 cites·11 claims
- 2978US6210855B1Positive resist composition suitable for lift-off technique and pattern forming methodSHINETSU CHEMICAL CO·Filed 1999·Granted Apr 3, 2001·35 cites·3 claims
- 3077US7868407B2Substrate comprising a lower silicone resin film and an upper silicone resin filmSHINETSU CHEMICAL CO·Filed 2006·Granted Jan 11, 2011·4 cites·8 claims
- 3174US8859189B2Patterning processOGIHARA TSUTOMU·Filed 2012·Granted Oct 14, 2014·3 cites·17 claims
- 3271US11913373B2Variable capacity turbochargerIHI CORP·Filed 2022·Granted Feb 27, 2024·0 cites·20 claims
- 3370US9075309B2Silicon-containing surface modifier, resist underlayer film composition containing this, and patterning processSHINETSU CHEMICAL CO·Filed 2013·Granted Jul 7, 2015·2 cites·22 claims
- 3470US8715913B2Silicon-containing resist underlayer film-forming composition and patterning processSHINETSU CHEMICAL CO·Filed 2012·Granted May 6, 2014·2 cites·26 claims
- 3570US7642043B2Rework process for photoresist filmSHINETSU CHEMICAL CO·Filed 2006·Granted Jan 5, 2010·2 cites·21 claims
- 3668US8343711B2Patterning processSHINETSU CHEMICAL CO·Filed 2010·Granted Jan 1, 2013·2 cites·17 claims
- 3768US8043610B2Freeze-dried composition of inactivated virus envelope with membrane fusion activityISHIHARA SANGYO KAISHA·Filed 2009·Granted Oct 25, 2011·0 cites·12 claims
- 3868US7638268B2Rework process for photoresist filmSHIN ESTU CHEMICAL CO LTD·Filed 2006·Granted Dec 29, 2009·2 cites·12 claims
- 3968US2025011578A1Electromagnetic wave shielding molded articleDAICEL MIRAIZU LTD·Filed 2024·Application pending·0 cites
- 4068US2025011579A1Electromagnetic wave shielding molded articleDAICEL MIRAIZU LTD·Filed 2024·Application pending·0 cites
- 4166US12122900B2Electromagnetic wave shielding molded articleDAICEL POLYMER LTD·Filed 2018·Granted Oct 22, 2024·1 cites·3 claims
- 4265US9627204B2Composition for forming a coating type BPSG film, substrate formed a film by said composition, and patterning process using said compositionSHINETSU CHEMICAL CO·Filed 2014·Granted Apr 18, 2017·1 cites·21 claims
- 4365US7678529B2Silicon-containing film forming composition, silicon-containing film serving as etching mask, substrate processing intermediate, and substrate processing methodSHINETSU CHEMICAL CO·Filed 2006·Granted Mar 16, 2010·8 cites·30 claims
- 4464US6451496B2Heat-curable photosensitive compositionsSHINETSU CHEMICAL CO·Filed 2001·Granted Sep 17, 2002·7 cites·1 claims
- 4562US8697330B2Composition for forming a silicon-containing antireflection film, substrate having the silicon-containing antireflection film from the composition and patterning process using the sameOGIHARA TSUTOMU·Filed 2010·Granted Apr 15, 2014·1 cites·10 claims
- 4653US8652267B2Coated-type silicon-containing film stripping processOGIHARA TSUTOMU·Filed 2009·Granted Feb 18, 2014·0 cites·8 claims
- 4752US2008102524A1Freeze-Dried Composition of Inactivated Virus Envelope with Membrane Fusion ActivityISHIHARA SANGYO KAISHA·Filed 2005·Application pending·0 cites
- 4852US2007134916A1Antireflection film composition, patterning process and substrate using the sameSHINETSU CHEMICAL CO·Filed 2006·Application pending·0 cites
- 4951US11162381B2TurbochargerIHI CORP·Filed 2020·Granted Nov 2, 2021·0 cites·20 claims
- 5050US11515644B2Electromagnetic wave shielding and absorbing molded articleDAICEL POLYMER LTD·Filed 2018·Granted Nov 29, 2022·0 cites·14 claims
Showing the top 50 of 63 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →