Inventor · disambiguated record
Takao Utsumi
Also filed as: UTSUMI TAKAO
8 granted patents·4 pending applications·92 citations·filing 1997–2020
85Inventor score
Top patents by PatentIndex Score
12 records- 0185US5831272ALow energy electron beam lithographyFiled 1997·Granted Nov 3, 1998·61 cites·18 claims
- 0266US6444374B1Manufacturing method of mask for electron beam proximity exposure and maskLEEPL CORPORATIN·Filed 2000·Granted Sep 3, 2002·10 cites·12 claims
- 0365US6727507B2Electron beam proximity exposure apparatus and methodLEEPL CORP·Filed 2001·Granted Apr 27, 2004·7 cites·5 claims
- 0461US6894295B2Electron beam proximity exposure apparatus and mask unit thereforLEEPL CORP·Filed 2000·Granted May 17, 2005·5 cites·7 claims
- 0561US6717157B2Mask inspecting apparatusLEEPL CORP·Filed 2002·Granted Apr 6, 2004·5 cites·12 claims
- 0658US9557658B2Low energy electron beam lithographyUTSUMI TAKAO·Filed 2015·Granted Jan 31, 2017·1 cites·19 claims
- 0750US6703623B1Electron beam proximity exposure apparatusLEEPL CORP·Filed 2000·Granted Mar 9, 2004·3 cites·29 claims
- 0847US10950441B1Low energy e-beam contact printing lithographyUTSUMI TAKAO·Filed 2020·Granted Mar 16, 2021·0 cites·36 claims
- 0937US2021060924A1Low energy e-beam contact printing lithographyUTSUMI TAKAO·Filed 2019·Application pending·0 cites
- 1033US2002070354A1Manufacturing method of mask for electron beam proximity exposure and maskFiled 2000·Application pending·0 cites
- 1130US2015146179A1Low energy electron beam lithographyUTSUMI TAKAO·Filed 2013·Application pending·0 cites
- 1228US2004026634A1Electron beam proximity exposure apparatusFiled 2002·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →