Inventor · disambiguated record
Tae Kyung Won
Also filed as: WON TAE K · WON TAE KYUNG
54 granted patents·37 pending applications·1,211 citations·filing 1999–2025
98Inventor score
Top patents by PatentIndex Score
91 records- 0198US8083853B2Plasma uniformity control by gas diffuser hole designCHOI SOO YOUNG·Filed 2004·Granted Dec 27, 2011·753 cites·106 claims
- 0297US7183197B2Water-barrier performance of an encapsulating filmAPPLIED MATERIALS INC·Filed 2005·Granted Feb 27, 2007·73 cites·35 claims
- 0395US7214600B2Method to improve transmittance of an encapsulating filmAPPLIED MATERIALS INC·Filed 2005·Granted May 8, 2007·37 cites·35 claims
- 0494US12362149B2Film stress control for plasma enhanced chemical vapor depositionAPPLIED MATERIALS INC·Filed 2023·Granted Jul 15, 2025·1 cites·20 claims
- 0592US7504332B2Water-barrier performance of an encapsulating filmAPPLIED MATERIALS INC·Filed 2007·Granted Mar 17, 2009·18 cites·20 claims
- 0691US10262837B2Plasma uniformity control by gas diffuser hole designAPPLIED MATERIALS INC·Filed 2015·Granted Apr 16, 2019·5 cites·14 claims
- 0791US7754294B2Method of improving the uniformity of PECVD-deposited thin filmsAPPLIED MATERIALS INC·Filed 2008·Granted Jul 13, 2010·14 cites·17 claims
- 0891US6355108B1Film deposition using a finger type shadow frameAPPLIED KOMATSU TECHNOLOGY INC·Filed 1999·Granted Mar 12, 2002·90 cites·27 claims
- 0990US8883269B2Thin film deposition using microwave plasmaWON TAE KYUNG·Filed 2011·Granted Nov 11, 2014·6 cites·5 claims
- 1090US7951620B2Water-barrier encapsulation methodAPPLIED MATERIALS INC·Filed 2009·Granted May 31, 2011·16 cites·20 claims
- 1190US7125758B2Controlling the properties and uniformity of a silicon nitride film by controlling the film forming precursorsAPPLIED MATERIALS INC·Filed 2004·Granted Oct 24, 2006·47 cites·23 claims
- 1288US9200368B2Plasma uniformity control by gas diffuser hole designCHOI SOO YOUNG·Filed 2011·Granted Dec 1, 2015·6 cites·95 claims
- 1387US11854771B2Film stress control for plasma enhanced chemical vapor depositionAPPLIED MATERIALS INC·Filed 2021·Granted Dec 26, 2023·1 cites·15 claims
- 1487US11094508B2Film stress control for plasma enhanced chemical vapor depositionAPPLIED MATERIALS INC·Filed 2018·Granted Aug 17, 2021·3 cites·20 claims
- 1587US9634039B2SiON gradient conceptAPPLIED MATERIALS INC·Filed 2016·Granted Apr 25, 2017·3 cites·21 claims
- 1687US8906813B2SiOx process chemistry development using microwave plasma CVDWON TAE KYUNG·Filed 2013·Granted Dec 9, 2014·8 cites·13 claims
- 1787US8225496B2Automated integrated solar cell production line composed of a plurality of automated modules and tools including an autoclave for curing solar devices that have been laminatedBACHRACH ROBERT Z·Filed 2008·Granted Jul 24, 2012·29 cites·4 claims
- 1885US10991916B2Thin-film encapsulationAPPLIED MATERIALS INC·Filed 2018·Granted Apr 27, 2021·2 cites·20 claims
- 1985US10134878B2Oxygen vacancy of IGZO passivation by fluorine treatmentAPPLIED MATERIALS INC·Filed 2016·Granted Nov 20, 2018·5 cites·20 claims
- 2085US9502242B2Indium gallium zinc oxide layers for thin film transistorsAPPLIED MATERIALS INC·Filed 2015·Granted Nov 22, 2016·5 cites·19 claims
- 2185US7884035B2Method of controlling film uniformity and composition of a PECVD-deposited A-SiNx : H gate dielectric film deposited over a large substrate surfaceAPPLIED MATERIALS INC·Filed 2008·Granted Feb 8, 2011·8 cites·20 claims
- 2284US10312058B2Plasma uniformity control by gas diffuser hole designAPPLIED MATERIALS INC·Filed 2017·Granted Jun 4, 2019·3 cites·20 claims
- 2384US8142606B2Apparatus for depositing a uniform silicon film and methods for manufacturing the sameCHOI SOO YOUNG·Filed 2007·Granted Mar 27, 2012·7 cites·12 claims
- 2482US8404502B2Water-barrier encapsulation methodWON TAE K·Filed 2011·Granted Mar 26, 2013·7 cites·15 claims
- 2581US10312475B2CVD thin film stress control method for display applicationAPPLIED MATERIALS INC·Filed 2017·Granted Jun 4, 2019·3 cites·19 claims
- 2681US8203071B2Multi-junction solar cells and methods and apparatuses for forming the sameSHENG SHURAN·Filed 2008·Granted Jun 19, 2012·8 cites·17 claims
- 2774US7955890B2Methods for forming an amorphous silicon film in display devicesAPPLIED MATERIALS INC·Filed 2009·Granted Jun 7, 2011·4 cites·19 claims
- 2873US7220687B2Method to improve water-barrier performance by changing film surface morphologyAPPLIED MATERIALS INC·Filed 2004·Granted May 22, 2007·14 cites·32 claims
- 2973US6962732B2Process for controlling thin film uniformity and products produced therebyAPPLIED MATERIALS INC·Filed 2001·Granted Nov 8, 2005·10 cites·39 claims
- 3072US12394595B2Multi-antenna unit for large area inductively coupled plasma processing apparatusAPPLIED MATERIALS INC·Filed 2022·Granted Aug 19, 2025·0 cites·20 claims
- 3172US12237406B2Plasma treatment on metal-oxide TFTAPPLIED MATERIALS INC·Filed 2020·Granted Feb 25, 2025·0 cites·21 claims
- 3271US11770964B2Thin-film encapsulationAPPLIED MATERIALS INC·Filed 2021·Granted Sep 26, 2023·0 cites·20 claims
- 3368US8114484B2Plasma enhanced chemical vapor deposition technology for large-size processingYANG YA-TANG·Filed 2007·Granted Feb 14, 2012·3 cites·24 claims
- 3467US10381454B2Interface engineering for high capacitance capacitor for liquid crystal displayAPPLIED MATERIALS INC·Filed 2017·Granted Aug 13, 2019·1 cites·19 claims
- 3567US2009000551A1Methods and apparatus for depositing a uniform silicon film with flow gradient designsCHOI SOO YOUNG·Filed 2008·Application pending·0 cites
- 3667US2025372347A1Low profile and embedded gas diffusers in an inductively coupled plasma chamber employing antenna arraysAPPLIED MATERIALS INC·Filed 2025·Application pending·0 cites
- 3766US8901015B2Method for depositing an inorganic encapsulating filmAPPLIED MATERIALS INC·Filed 2013·Granted Dec 2, 2014·1 cites·34 claims
- 3866US7833885B2Microcrystalline silicon thin film transistorAPPLIED MATERIALS INC·Filed 2008·Granted Nov 16, 2010·2 cites·20 claims
- 3965US7879409B2Repeatability of CVD film deposition during sequential processing of substrates in a deposition chamberAPPLIED MATERIALS INC·Filed 2004·Granted Feb 1, 2011·8 cites·7 claims
- 4065US2012103264A1Methods and apparatus for depositing a uniform silicon film with flow gradient designsCHOI SOO YOUNG·Filed 2012·Application pending·0 cites
- 4163US2013068161A1Gas delivery and distribution for uniform process in linear-type large-area plasma reactorWHITE JOHN M·Filed 2012·Application pending·0 cites
- 4261US10854737B2Plasma treatment on metal-oxide TFTAPPLIED MATERIALS INC·Filed 2018·Granted Dec 1, 2020·0 cites·20 claims
- 4361US2016208380A1Gas delivery and distribution for uniform process in linear-type large-area plasma reactorAPPLIED MATERIALS INC·Filed 2016·Application pending·0 cites
- 4459US2008302303A1Methods and apparatus for depositing a uniform silicon film with flow gradient designsAPPLIED MATERIALS INC·Filed 2007·Application pending·0 cites
- 4558US6858548B2Application of carbon doped silicon oxide film to flat panel industryAPPLIED MATERIALS INC·Filed 2002·Granted Feb 22, 2005·7 cites·28 claims
- 4658US2025052928A1Improved adhesion layer in flexible coverlensAPPLIED MATERIALS INC·Filed 2021·Application pending·0 cites
- 4757US11929236B2Methods of tuning to improve plasma stabilityAPPLIED MATERIALS INC·Filed 2019·Granted Mar 12, 2024·0 cites·20 claims
- 4857US9887277B2Plasma treatment on metal-oxide TFTAPPLIED MATERIALS INC·Filed 2016·Granted Feb 6, 2018·0 cites·14 claims
- 4957US9590113B2Multilayer passivation or etch stop TFTAPPLIED MATERIALS INC·Filed 2014·Granted Mar 7, 2017·0 cites·8 claims
- 5057US2006236934A1Plasma uniformity control by gas diffuser hole designCHOI SOO Y·Filed 2006·Application pending·0 cites
Showing the top 50 of 91 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →