Inventor · disambiguated record
Takao Yoshihara
Also filed as: YOSHIHARA TAKAO
12 granted patents·3 pending applications·439 citations·filing 2001–2013
90Inventor score
Top patents by PatentIndex Score
15 records- 0198US7771914B2Resist composition and patterning processSHINETSU CHEMICAL CO·Filed 2007·Granted Aug 10, 2010·90 cites·18 claims
- 0298US7537880B2Polymer, resist composition, and patterning processSHINETSU CHEMICAL CO·Filed 2007·Granted May 26, 2009·258 cites·10 claims
- 0396US7514204B2Resist composition and patterning processSHINETSU CHEMICAL CO·Filed 2007·Granted Apr 7, 2009·40 cites·12 claims
- 0479US6800551B2Chemical amplification type photoresist composition, method for producing a semiconductor device using the composition, and semiconductor substrateNEC ELECTRONICS CORP·Filed 2002·Granted Oct 5, 2004·24 cites·16 claims
- 0577US7666571B2Polymer, resist composition and patterning processSHINETSU CHEMICAL CO·Filed 2006·Granted Feb 23, 2010·4 cites·6 claims
- 0676US7741015B2Patterning process and resist compositionSHINETSU CHEMICAL CO·Filed 2008·Granted Jun 22, 2010·14 cites·14 claims
- 0776US6713612B2Sulfonyldiazomethanes, photoacid generators, resist compositions, and patterning processSHINETSU CHEMICAL CO·Filed 2003·Granted Mar 30, 2004·7 cites·15 claims
- 0866US8105764B2Patterning processHATAKEYAMA JUN·Filed 2008·Granted Jan 31, 2012·2 cites·22 claims
- 0951US9091925B2Method for forming silicon-containing resist underlayer filmSHINETSU CHEMICAL CO·Filed 2013·Granted Jul 28, 2015·0 cites·7 claims
- 1047US8741548B2Patterning processHATAKEYAMA JUN·Filed 2008·Granted Jun 3, 2014·0 cites·9 claims
- 1143US2005019692A1Resist material and method for pattern formationFiled 2004·Application pending·0 cites
- 1241US2005031988A1Resist polymer, resist composition and patterning processFiled 2004·Application pending·0 cites
- 1339US2001055727A1Resist material and method for pattern formationFiled 2001·Application pending·0 cites
- 1437US8945809B2Fluorinated monomer, fluorinated polymer, resist composition, and patterning processHASEGAWA KOJI·Filed 2010·Granted Feb 3, 2015·0 cites·15 claims
- 1537US8192921B2Patterning processHATAKEYAMA JUN·Filed 2010·Granted Jun 5, 2012·0 cites·29 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →